Shrinivas Govindarajan

Person

Niskayuna, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a dielectric material on a semiconductor devic...
- Patent number 8,049,264
- Issue date Nov 1, 2011
- Qimonda AG
- Harald Seidl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High dielectric constant materials
- Patent number 7,863,202
- Issue date Jan 4, 2011
- Qimonda AG
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacture thereof
- Patent number 7,611,972
- Issue date Nov 3, 2009
- Qimonda North America Corp.
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacture thereof
- Patent number 7,564,114
- Issue date Jul 21, 2009
- Qimonda North America Corp.
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High dielectric constant materials
- Patent number 7,316,962
- Issue date Jan 8, 2008
- Infineon Technologies AG
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid deposition of borosilicate glass films
- Patent number 6,812,162
- Issue date Nov 2, 2004
- Infineon Technologies Richmond, LP
- Shrinivas Govindarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method of a low pressure, two-step nucleation tungste...
- Patent number 6,309,966
- Issue date Oct 30, 2001
- Motorola, Inc.
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidation resistance coating system for refractory metals
- Patent number 6,200,691
- Issue date Mar 13, 2001
- Colorado School of Mines
- John J. Moore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Methods of controlling film deposition using atomic layer deposition
- Publication number 20080305561
- Publication date Dec 11, 2008
- Shrinivas Govindarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor devices and methods of manufacture thereof
- Publication number 20080211065
- Publication date Sep 4, 2008
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor devices and methods of manufacture thereof
- Publication number 20080164582
- Publication date Jul 10, 2008
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor devices and methods of manufacture thereof
- Publication number 20080149980
- Publication date Jun 26, 2008
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor devices and methods of manufacture thereof
- Publication number 20080121963
- Publication date May 29, 2008
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor devices and methods of manufacture thereof
- Publication number 20080116543
- Publication date May 22, 2008
- Shrinivas Govindarajan
- B82 - NANO-TECHNOLOGY
Information Patent Application
High Dielectric Constant Materials
- Publication number 20080096363
- Publication date Apr 24, 2008
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM with high K dielectric storage capacitor and method of making...
- Publication number 20060205143
- Publication date Sep 14, 2006
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for producing a dielectric material on a semiconductor devic...
- Publication number 20060172489
- Publication date Aug 3, 2006
- Infineon Technologies AG
- Harald Seidl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRAM with high K dielectric storage capacitor and method of making...
- Publication number 20060151822
- Publication date Jul 13, 2006
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to control interfacial properties for capacitors using a met...
- Publication number 20060151845
- Publication date Jul 13, 2006
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High dielectric constant materials
- Publication number 20060151823
- Publication date Jul 13, 2006
- Shrinivas Govindarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rapid deposition of borosilicate glass films
- Publication number 20040058559
- Publication date Mar 25, 2004
- Infineon Technologies Richmond, LP
- Shrinivas Govindarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for in-situ cleaning of borosilicate (BSG) and...
- Publication number 20040055708
- Publication date Mar 25, 2004
- Infineon Technologies Richmond, LP
- Shrinivas Govindarajan
- B08 - CLEANING

Shrinivas Govindarajan

Person

Patents Grantslast 30 patents

Method for producing a dielectric material on a semiconductor devic...

High dielectric constant materials

Semiconductor devices and methods of manufacture thereof

Semiconductor devices and methods of manufacture thereof

High dielectric constant materials

Rapid deposition of borosilicate glass films

Apparatus and method of a low pressure, two-step nucleation tungste...

Oxidation resistance coating system for refractory metals

Patents Applicationslast 30 patents

Methods of controlling film deposition using atomic layer deposition

Semiconductor devices and methods of manufacture thereof

Semiconductor devices and methods of manufacture thereof

Semiconductor devices and methods of manufacture thereof

Semiconductor devices and methods of manufacture thereof

Semiconductor devices and methods of manufacture thereof

High Dielectric Constant Materials

DRAM with high K dielectric storage capacitor and method of making...

Method for producing a dielectric material on a semiconductor devic...

DRAM with high K dielectric storage capacitor and method of making...

Method to control interfacial properties for capacitors using a met...

High dielectric constant materials

Rapid deposition of borosilicate glass films

Apparatus and method for in-situ cleaning of borosilicate (BSG) and...