Shu-jin WANG

Person

Breugel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,710,668
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring a parameter of interest using im...
- Patent number 10,983,445
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,811,323
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining focus, inspection apparatus, patterning devic...
- Patent number 9,939,735
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Paul Christiaan Hinnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining focus, inspection apparatus, patterning devic...
- Patent number 9,594,299
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Paul Christiaan Hinnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240361702
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20220066330
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210035871
- Publication date Feb 4, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...
- Publication number 20190250094
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20190155173
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255112
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
Method of Determining Focus, Inspection Apparatus, Patterning Devic...
- Publication number 20170153554
- Publication date Jun 1, 2017
- ASML NETHERLANDS B.V.
- Paul Christiaan HINNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Determining Focus, Inspection Apparatus, Patterning Devic...
- Publication number 20150338749
- Publication date Nov 26, 2015
- ASML NETHERLANDS B.V.
- Paul Christiaan HINNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shu-jin WANG

Person

Patents Grantslast 30 patents

Method and apparatus to determine a patterning process parameter

Method and apparatus for measuring a parameter of interest using im...

Method and apparatus to determine a patterning process parameter

Method of determining focus, inspection apparatus, patterning devic...

Method of determining focus, inspection apparatus, patterning devic...

Patents Applicationslast 30 patents

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Method of Determining Focus, Inspection Apparatus, Patterning Devic...

Method of Determining Focus, Inspection Apparatus, Patterning Devic...