Shu KUSANO

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection method and plasma processing apparatus
- Patent number 11,705,313
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wastage determination method and plasma processing apparatus
- Patent number 11,183,374
- Issue date Nov 23, 2021
- Tokyo Electron Limited
- Shu Kusano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,133,157
- Issue date Sep 28, 2021
- Tokyo Electron Limited
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wastage determination method and plasma processing apparatus
- Patent number 10,763,089
- Issue date Sep 1, 2020
- Tokyo Electron Limited
- Shu Kusano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,297,428
- Issue date May 21, 2019
- Tokyo Electron Limited
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 9,978,566
- Issue date May 22, 2018
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method of multilayer film
- Patent number 8,895,454
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240212996
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Toshiyuki ARAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210280401
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Yusuke HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200350148
- Publication date Nov 5, 2020
- TOKYO ELECTRON LIMITED
- Shu KUSANO
- B08 - CLEANING
Information Patent Application
WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190378698
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Shu KUSANO
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190244794
- Publication date Aug 8, 2019
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20170103877
- Publication date Apr 13, 2017
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150332898
- Publication date Nov 19, 2015
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD OF MULTILAYER FILM
- Publication number 20150072534
- Publication date Mar 12, 2015
- TOKYO ELECTRON LIMITED
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD OF MULTILAYER FILM
- Publication number 20140206199
- Publication date Jul 24, 2014
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Inspection method and plasma processing apparatus

Wastage determination method and plasma processing apparatus

Plasma processing apparatus

Wastage determination method and plasma processing apparatus

Plasma processing apparatus

Plasma etching method

Etching method of multilayer film

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

INSPECTION METHOD AND PLASMA PROCESSING APPARATUS

WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS

WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD

PLASMA PROCESSING APPARATUS

ETCHING METHOD OF MULTILAYER FILM

ETCHING METHOD OF MULTILAYER FILM