Membership
Tour
Register
Log in
Shuang Meng
Follow
Person
Shanghai, CN
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Method to deposit conformal low temperature SiO2
Patent number
8,129,289
Issue date
Mar 6, 2012
Micron Technology, Inc.
John A. Smythe
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
Publication number
20140083452
Publication date
Mar 27, 2014
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Gerald Zheyao Yin
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
Publication number
20140083451
Publication date
Mar 27, 2014
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Gerald Zheyao Yin
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
Publication number
20140083453
Publication date
Mar 27, 2014
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Gerald Zheyao Yin
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method to deposit conformal low temperature SiO2
Publication number
20080085612
Publication date
Apr 10, 2008
Micron Technology, Inc.
John A. Smythe
H01 - BASIC ELECTRIC ELEMENTS