Shuhei SHIGAKI

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Coating composition for pattern inversion
- Patent number 12,084,592
- Issue date Sep 10, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroaki Yaguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Silicon-containing coating agent for pattern reversal
- Patent number 11,609,499
- Issue date Mar 21, 2023
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing resist pattern coating composition with use of...
- Patent number 11,531,269
- Issue date Dec 20, 2022
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming composition containing fluorine-containing surfactant
- Patent number 11,479,627
- Issue date Oct 25, 2022
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Film forming composition containing fluorine-containing surfactant
- Patent number 11,459,414
- Issue date Oct 4, 2022
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treating composition and method for fabricating a semicon...
- Patent number 11,215,927
- Issue date Jan 4, 2022
- Samsung Electronics Co., Ltd.
- Ju-Young Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Planarization method for a semiconductor substrate using a silicon-...
- Patent number 10,910,220
- Issue date Feb 2, 2021
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing EUV resist underlayer film-forming composition c...
- Patent number 10,613,440
- Issue date Apr 7, 2020
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for coating resist pattern
- Patent number 10,558,119
- Issue date Feb 11, 2020
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing coating agent for reversing planarization pattern
- Patent number 10,508,174
- Issue date Dec 17, 2019
- Nissan Chemical Industries, Ltd.
- Shuhei Shigaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating liquid for resist pattern coating
- Patent number 10,133,178
- Issue date Nov 20, 2018
- Nissan Chemical Industries, Ltd.
- Tokio Nishita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 10,082,735
- Issue date Sep 25, 2018
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer-containing coating liquid applied to resist pattern
- Patent number 10,025,191
- Issue date Jul 17, 2018
- Nissan Chemical Industries, Ltd.
- Shuhei Shigaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning fluid for semiconductor, and cleaning method using the same
- Patent number 9,834,745
- Issue date Dec 5, 2017
- Nissan Chemical Industries, Ltd.
- Suguru Sassa
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Coating liquid to be applied to resist pattern and method for formi...
- Patent number 9,632,414
- Issue date Apr 25, 2017
- Nissan Chemical Industries, Ltd.
- Yasushi Sakaida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing EUV resist underlayer film-forming composition i...
- Patent number 9,627,217
- Issue date Apr 18, 2017
- Nissan Chemical Industries, Ltd.
- Shuhei Shigaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing EUV resist underlayer film forming composition
- Patent number 9,337,052
- Issue date May 10, 2016
- Nissan Chemical Industries, Ltd.
- Shuhei Shigaki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film h...
- Patent number 9,290,623
- Issue date Mar 22, 2016
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Thin film forming composition for lithography containing titanium a...
- Patent number 9,093,279
- Issue date Jul 28, 2015
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...
- Publication number 20240419073
- Publication date Dec 19, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20240385521
- Publication date Nov 21, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND S...
- Publication number 20240377745
- Publication date Nov 14, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...
- Publication number 20240302744
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240295819
- Publication date Sep 5, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240295815
- Publication date Sep 5, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240231230
- Publication date Jul 11, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240201593
- Publication date Jun 20, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE
- Publication number 20240162086
- Publication date May 16, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLYING FILM FORMATION
- Publication number 20240069441
- Publication date Feb 29, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230176481
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLYING FILM
- Publication number 20230168582
- Publication date Jun 1, 2023
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152700
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152699
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Kodai KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS
- Publication number 20220206395
- Publication date Jun 30, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220187709
- Publication date Jun 16, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220177653
- Publication date Jun 9, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING COMPOSITION
- Publication number 20220100092
- Publication date Mar 31, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...
- Publication number 20220057715
- Publication date Feb 24, 2022
- Samsung Electronics Co., Ltd.
- JU-YOUNG KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20210124266
- Publication date Apr 29, 2021
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT
- Publication number 20210102088
- Publication date Apr 8, 2021
- Nissan Chemical Industries, Ltd.
- Makiko UMEZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING COATING AGENT FOR PATTERN REVERSAL
- Publication number 20190339618
- Publication date Nov 7, 2019
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...
- Publication number 20190317406
- Publication date Oct 17, 2019
- Samsung Electronics Co., Ltd.
- JU-YOUNG KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING COMPOSITION FOR PATTERN INVERSION
- Publication number 20190292403
- Publication date Sep 26, 2019
- NISSAN CHEMICAL CORPORATION
- Hiroaki YAGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING RESIST PATTERN COATING COMPOSITION WITH USE OF...
- Publication number 20190250512
- Publication date Aug 15, 2019
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLANARIZATION METHOD FOR A SEMICONDUCTOR SUBSTRATE USING A SILICON-...
- Publication number 20190051518
- Publication date Feb 14, 2019
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING COATING AGENT FOR REVERSING PLANARIZATION PATTERN
- Publication number 20190040207
- Publication date Feb 7, 2019
- Nissan Chemical Industries, Ltd.
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN COATING COMPOSITION INCLUDING VINYL GROUP- OR (METH)...
- Publication number 20180197731
- Publication date Jul 12, 2018
- Nissan Chemical Industries, Ltd.
- Shuhei SHIGAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR COATING RESIST PATTERN
- Publication number 20180149977
- Publication date May 31, 2018
- Nissan Chemical Industries, Ltd.
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Shuhei SHIGAKI

Person

Patents Grantslast 30 patents

Coating composition for pattern inversion

Silicon-containing coating agent for pattern reversal

Method for producing resist pattern coating composition with use of...

Film forming composition containing fluorine-containing surfactant

Film forming composition containing fluorine-containing surfactant

Substrate treating composition and method for fabricating a semicon...

Planarization method for a semiconductor substrate using a silicon-...

Silicon-containing EUV resist underlayer film-forming composition c...

Composition for coating resist pattern

Silicon-containing coating agent for reversing planarization pattern

Coating liquid for resist pattern coating

Silicon-containing resist underlayer film-forming composition havin...

Polymer-containing coating liquid applied to resist pattern

Cleaning fluid for semiconductor, and cleaning method using the same

Coating liquid to be applied to resist pattern and method for formi...

Silicon-containing EUV resist underlayer film-forming composition i...

Silicon-containing EUV resist underlayer film forming composition

Composition for forming silicon-containing resist underlayer film h...

Thin film forming composition for lithography containing titanium a...

Patents Applicationslast 30 patents

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND S...

COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE

COMPOSITION FOR RESIST UNDERLYING FILM FORMATION

FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING RESIST UNDERLYING FILM

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

FILM FORMING COMPOSITION

SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT

SILICON-CONTAINING COATING AGENT FOR PATTERN REVERSAL

SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...

COATING COMPOSITION FOR PATTERN INVERSION

METHOD FOR PRODUCING RESIST PATTERN COATING COMPOSITION WITH USE OF...

PLANARIZATION METHOD FOR A SEMICONDUCTOR SUBSTRATE USING A SILICON-...

SILICON-CONTAINING COATING AGENT FOR REVERSING PLANARIZATION PATTERN

RESIST PATTERN COATING COMPOSITION INCLUDING VINYL GROUP- OR (METH)...

COMPOSITION FOR COATING RESIST PATTERN