Shuichi Nagamine

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Nozzle cleaning device, nozzle cleaning method, and substrate proce...
- Patent number 10,700,166
- Issue date Jun 30, 2020
- Tokyo Electron Limited
- Yoshihiro Kai
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 9,484,230
- Issue date Nov 1, 2016
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus for separating processing sol...
- Patent number 9,355,871
- Issue date May 31, 2016
- Tokyo Electron Limited
- Jiro Higashijima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 9,346,084
- Issue date May 24, 2016
- Tokyo Electron Limited
- Shuichi Nagamine
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus, liquid processing method, and storage...
- Patent number 9,275,881
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Shuichi Nagamine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,266,153
- Issue date Feb 23, 2016
- Tokyo Electron Limited
- Shuichi Nagamine
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus, liquid processing method, and recordin...
- Patent number 9,073,103
- Issue date Jul 7, 2015
- Tokyo Electron Limited
- Satoshi Morita
- B08 - CLEANING
Information Patent Grant
Substrate liquid treatment apparatus with lift pin plate
- Patent number 9,048,269
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid cleaning apparatus with controlled liquid port eje...
- Patent number 9,022,045
- Issue date May 5, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus, method of controlling substr...
- Patent number 8,881,751
- Issue date Nov 11, 2014
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,869,811
- Issue date Oct 28, 2014
- Tokyo Electron Limited
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Grant
Flow passage switching apparatus, processing apparatus, flow passag...
- Patent number 8,840,752
- Issue date Sep 23, 2014
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method and storage m...
- Patent number 8,671,875
- Issue date Mar 18, 2014
- Tokyo Electron Limited
- Shuichi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 8,539,906
- Issue date Sep 24, 2013
- Tokyo Electron Limited
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developing apparatus, developing method and storage medium
- Patent number 7,665,918
- Issue date Feb 23, 2010
- Tokyo Electron Limited
- Taro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coater cup
- Patent number D610176
- Issue date Feb 16, 2010
- Tokyo Electron Limited
- Shuichi Nagamine
- D15 - Machines not elsewhere specified
Information Patent Grant
Solution treatment unit
- Patent number 6,843,259
- Issue date Jan 18, 2005
- Tokyo Electron Limited
- Shuichi Nagamine
- B08 - CLEANING
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 6,730,599
- Issue date May 4, 2004
- Tokyo Electron Limited
- Hiroichi Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution treatment method and solution treatment unit
- Patent number 6,715,943
- Issue date Apr 6, 2004
- Tokyo Electron Limited
- Shuichi Nagamine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution processing apparatus
- Patent number 6,602,382
- Issue date Aug 5, 2003
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 6,541,376
- Issue date Apr 1, 2003
- Tokyo Electron Limited
- Hiroichi Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution processing apparatus and method
- Patent number 6,533,864
- Issue date Mar 18, 2003
- Tokyo Electron Limited
- Yuji Matsuyama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Solution processing apparatus and method
- Patent number 6,514,570
- Issue date Feb 4, 2003
- Tokyo Electron Limited
- Yuji Matsuyama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Developing method and developing unit
- Patent number 6,384,894
- Issue date May 7, 2002
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution processing apparatus
- Patent number 6,364,547
- Issue date Apr 2, 2002
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and method
- Patent number 6,332,723
- Issue date Dec 25, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing apparatus and developing nozzle
- Patent number 6,267,516
- Issue date Jul 31, 2001
- Tokyo Electron Limited
- Shuichi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing apparatus and method thereof
- Patent number 6,241,402
- Issue date Jun 5, 2001
- Tokyo Electron Limited
- Kazuo Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140290701
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Shuichi Nagamine
- B08 - CLEANING
Information Patent Application
NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCE...
- Publication number 20130319470
- Publication date Dec 5, 2013
- TOKYO ELECTRON LIMITED
- Yoshihiro Kai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20130125931
- Publication date May 23, 2013
- TOKYO ELECTRON LIMITED
- Shuichi Nagamine
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...
- Publication number 20130104940
- Publication date May 2, 2013
- TOKYO ELECTRON LIMITED
- Shuichi Nagamine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20130008872
- Publication date Jan 10, 2013
- TOKYO ELECTRON LIMITED
- Jiro Higashuima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Liquid Processing Apparatus, Liquid Processing Method, and Recordin...
- Publication number 20120227768
- Publication date Sep 13, 2012
- TOKYO ELECTRON LIMITED
- Satoshi MORITA
- B08 - CLEANING
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120160278
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120160275
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20120153044
- Publication date Jun 21, 2012
- TOKYO ELECTRON LIMITED
- Nobuhiro OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flow Passage Switching Apparatus, Processing Apparatus, Flow Passag...
- Publication number 20110308626
- Publication date Dec 22, 2011
- TOKYO ELECTRON LIMITED
- Nobuhiro Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20110297192
- Publication date Dec 8, 2011
- TOKYO ELECTRON LIMITED
- Nobuhiro OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTR...
- Publication number 20110297257
- Publication date Dec 8, 2011
- TOKYO ELECTRON LIMITED
- Nobuhiro OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20110048469
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Nobuhiro OGATA
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE M...
- Publication number 20100040779
- Publication date Feb 18, 2010
- TOKYO ELECTRON LIMITED
- Shuichi NAGAMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM
- Publication number 20090033898
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Taro Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film forming method and film forming apparatus
- Publication number 20030099776
- Publication date May 29, 2003
- TOKYO ELECTRON LIMITED
- Hiroichi Inada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Solution treatment unit
- Publication number 20020144719
- Publication date Oct 10, 2002
- TOKYO ELECTRON LIMITED
- Shuichi Nagamine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Solution treatment method and solution treatment unit
- Publication number 20020053319
- Publication date May 9, 2002
- Shuichi Nagamine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film forming method and film forming apparatus
- Publication number 20020022377
- Publication date Feb 21, 2002
- TOKYO ELECTRON LIMITED
- Hiroichi Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treatment solution discharge apparatus
- Publication number 20010047753
- Publication date Dec 6, 2001
- TOKYO ELECTRON LIMITED
- Shuichi Nagamine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Developing method and developing unit
- Publication number 20010009452
- Publication date Jul 26, 2001
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shuichi Nagamine

Person

Patents Grantslast 30 patents

Nozzle cleaning device, nozzle cleaning method, and substrate proce...

Substrate liquid processing apparatus

Substrate liquid processing apparatus for separating processing sol...

Liquid processing apparatus and liquid processing method

Liquid processing apparatus, liquid processing method, and storage...

Substrate processing apparatus and substrate processing method

Liquid processing apparatus, liquid processing method, and recordin...

Substrate liquid treatment apparatus with lift pin plate

Substrate liquid cleaning apparatus with controlled liquid port eje...

Substrate liquid processing apparatus, method of controlling substr...

Liquid processing apparatus and liquid processing method

Flow passage switching apparatus, processing apparatus, flow passag...

Liquid processing apparatus, liquid processing method and storage m...

Substrate liquid processing apparatus

Developing apparatus, developing method and storage medium

Coater cup

Solution treatment unit

Film forming method and film forming apparatus

Solution treatment method and solution treatment unit

Solution processing apparatus

Film forming method and film forming apparatus

Solution processing apparatus and method

Solution processing apparatus and method

Developing method and developing unit

Solution processing apparatus

Substrate processing apparatus and method

Developing apparatus and developing nozzle

Developing apparatus and method thereof

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCE...

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

Liquid Processing Apparatus, Liquid Processing Method, and Recordin...

LIQUID TREATMENT APPARATUS AND METHOD

LIQUID TREATMENT APPARATUS AND METHOD

SUBSTRATE LIQUID PROCESSING APPARATUS

Flow Passage Switching Apparatus, Processing Apparatus, Flow Passag...

SUBSTRATE LIQUID PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTR...

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE M...

DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM

Film forming method and film forming apparatus

Solution treatment unit

Solution treatment method and solution treatment unit

Film forming method and film forming apparatus

Treatment solution discharge apparatus

Developing method and developing unit