Shuichi Tamamushi

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection system and method for inspecting line width and/or posit...
- Patent number 9,406,117
- Issue date Aug 2, 2016
- NuFlare Technology, Inc.
- Takanao Touya
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system and method for inspecting line width and/or posit...
- Patent number 9,036,896
- Issue date May 19, 2015
- Nuflare Technology, Inc.
- Takanao Touya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 8,927,941
- Issue date Jan 6, 2015
- Nuflare Technology, Inc.
- Takanao Touya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for pattern inspection
- Patent number 8,452,074
- Issue date May 28, 2013
- Nuflare Technology, Inc.
- Shuichi Tamamushi
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for pattern inspection
- Patent number 8,306,310
- Issue date Nov 6, 2012
- Nuflare Technology, Inc.
- Shuichi Tamamushi
- G01 - MEASURING TESTING
Information Patent Grant
Move mechanism for moving target object and charged particle beam w...
- Patent number 8,277,603
- Issue date Oct 2, 2012
- NuFlare Technology, Inc.
- Shuichi Tamamushi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask inspection apparatus and mask inspection method
- Patent number 8,229,207
- Issue date Jul 24, 2012
- Nuflare Technology, Inc.
- Shuichi Tamamushi
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam drawing apparatus and proximity effect correc...
- Patent number 8,207,514
- Issue date Jun 26, 2012
- Nuflare Technology, Inc.
- Shigehiro Hara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Correcting substrate for charged particle beam lithography apparatus
- Patent number 8,183,544
- Issue date May 22, 2012
- Nuflare Technology, Inc.
- Kaoru Tsuruta
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography system and method for evaluating...
- Patent number 7,834,333
- Issue date Nov 16, 2010
- Nuflare Technology, Inc.
- Rieko Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System and method for charged-particle beam lithography
- Patent number 7,800,084
- Issue date Sep 21, 2010
- Nuflare Technology, Inc.
- Shuichi Tamamushi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of calculating deflection aberration correcting voltage and...
- Patent number 7,679,068
- Issue date Mar 16, 2010
- Nuflare Technology, Inc.
- Takashi Kamikubo
- G01 - MEASURING TESTING
Information Patent Grant
Position measuring apparatus and positional deviation measuring method
- Patent number 7,643,130
- Issue date Jan 5, 2010
- Nuflare Technology, Inc.
- Shusuke Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Writing method and writing apparatus of charged particle beam, posi...
- Patent number 7,554,107
- Issue date Jun 30, 2009
- Nuflare Technology, Inc.
- Shusuke Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing apparatus and writing method
- Patent number 7,485,879
- Issue date Feb 3, 2009
- Nuflare Technology, Inc.
- Hitoshi Sunaoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus
- Patent number 6,319,642
- Issue date Nov 20, 2001
- Kabushiki Kaisha Toshiba
- Shigehiro Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged beam drawing method
- Patent number 5,894,057
- Issue date Apr 13, 1999
- Kabushiki Kaisha Toshiba
- Toshio Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged beam lithography method
- Patent number 5,885,747
- Issue date Mar 23, 1999
- Kabushiki Kaisha Toshiba
- Satoshi Yamasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam lithograph apparatus
- Patent number 5,850,083
- Issue date Dec 15, 1998
- Kabushiki Kaisha Toshiba
- Souji Koikari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting astigmatism and focusing in charged particle...
- Patent number 5,793,041
- Issue date Aug 11, 1998
- Kabushiki Kaisha Toshiba
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography apparatus and method
- Patent number 5,760,410
- Issue date Jun 2, 1998
- Kabushiki Kaisha Toshiba
- Kazuto Matsuki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Filter manufacturing apparatus
- Patent number 5,707,501
- Issue date Jan 13, 1998
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projectin exposure apparatus
- Patent number 5,627,626
- Issue date May 6, 1997
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 5,621,498
- Issue date Apr 15, 1997
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting astigmatism of variable shaped beam
- Patent number 5,047,646
- Issue date Sep 10, 1991
- Kabushiki Kaisha Toshiba
- Kiyoshi Hattori
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INSPECTION SYSTEM AND METHOD FOR INSPECTING LINE WIDTH AND/OR POSIT...
- Publication number 20150193918
- Publication date Jul 9, 2015
- NuFlare Technology, Inc.
- Takanao Touya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20130240750
- Publication date Sep 19, 2013
- NuFlare Technology, Inc.
- Takanao Touya
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR PATTERN INSPECTION
- Publication number 20130010291
- Publication date Jan 10, 2013
- NuFlare Technology, Inc.
- Shuichi TAMAMUSHI
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM AND METHOD FOR INSPECTING LINE WIDTH AND/OR POSIT...
- Publication number 20110255770
- Publication date Oct 20, 2011
- Kabushiki Kaisha Toshiba
- Takanao Touya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORREC...
- Publication number 20110068281
- Publication date Mar 24, 2011
- NuFlare Technology, Inc.
- Shigehiro HARA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography method of electron beam
- Publication number 20100178611
- Publication date Jul 15, 2010
- NuFlare Technology, Inc.
- Hirohito Anze
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK INSPECTION APPARATUS, AND EXPOSURE METHOD AND MASK INSPECTION...
- Publication number 20100074511
- Publication date Mar 25, 2010
- NuFlare Technology, Inc.
- Shuichi TAMAMUSHI
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD
- Publication number 20100074513
- Publication date Mar 25, 2010
- NuFlare Technology, Inc.
- Shuichi TAMAMUSHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHOD FOR PATTERN INSPECTION
- Publication number 20100067778
- Publication date Mar 18, 2010
- NuFlare Technology, Inc.
- Shuichi TAMAMUSHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS
- Publication number 20090242807
- Publication date Oct 1, 2009
- NuFlare Technology, Inc.
- Kaoru TSURUTA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD
- Publication number 20080265174
- Publication date Oct 30, 2008
- NuFlare Technology, Inc.
- Makoto HIRAMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEM AND METHOD FOR CHARGED-PARTICLE BEAM LITHOGRAPHY
- Publication number 20080105827
- Publication date May 8, 2008
- NuFlare Technology, Inc.
- Shuichi Tamamushi
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND METHOD FOR EVALUATING...
- Publication number 20080067338
- Publication date Mar 20, 2008
- NuFlare Technology, Inc.
- Rieko Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...
- Publication number 20070243487
- Publication date Oct 18, 2007
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CALCULATING DEFLECTION ABERRATION CORRECTING VOLTAGE AND...
- Publication number 20070158576
- Publication date Jul 12, 2007
- NuFlare Technology, Inc.
- Takashi Kamikubo
- G01 - MEASURING TESTING
Information Patent Application
Move mechanism for moving target object and charged particle beam w...
- Publication number 20070152169
- Publication date Jul 5, 2007
- NuFLARE TECHNOLOGY, INC.
- Shuichi Tamamushi
- B82 - NANO-TECHNOLOGY
Information Patent Application
POSITION MEASURING APPARATUS AND POSITIONAL DEVIATION MEASURING METHOD
- Publication number 20070103657
- Publication date May 10, 2007
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
WRITING METHOD AND WRITING APPARATUS OF CHARGED PARTICLE BEAM, POSI...
- Publication number 20070103659
- Publication date May 10, 2007
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam writing apparatus and writing method
- Publication number 20070023703
- Publication date Feb 1, 2007
- NuFlare Technology, Inc.
- Hitoshi Sunaoshi
- B82 - NANO-TECHNOLOGY

Shuichi Tamamushi

Person

Patents Grantslast 30 patents

Inspection system and method for inspecting line width and/or posit...

Inspection system and method for inspecting line width and/or posit...

Multi charged particle beam writing apparatus and multi charged par...

Apparatus and method for pattern inspection

Apparatus and method for pattern inspection

Move mechanism for moving target object and charged particle beam w...

Mask inspection apparatus and mask inspection method

Charged particle beam drawing apparatus and proximity effect correc...

Correcting substrate for charged particle beam lithography apparatus

Charged particle beam lithography system and method for evaluating...

System and method for charged-particle beam lithography

Method of calculating deflection aberration correcting voltage and...

Position measuring apparatus and positional deviation measuring method

Writing method and writing apparatus of charged particle beam, posi...

Electron beam writing apparatus and writing method

Electron beam exposure apparatus

Charged beam drawing method

Charged beam lithography method

Charged particle beam lithograph apparatus

Method for correcting astigmatism and focusing in charged particle...

Electron beam lithography apparatus and method

Filter manufacturing apparatus

Projectin exposure apparatus

Projection exposure apparatus

Method of correcting astigmatism of variable shaped beam

Patents Applicationslast 30 patents

INSPECTION SYSTEM AND METHOD FOR INSPECTING LINE WIDTH AND/OR POSIT...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

APPARATUS AND METHOD FOR PATTERN INSPECTION

INSPECTION SYSTEM AND METHOD FOR INSPECTING LINE WIDTH AND/OR POSIT...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORREC...

Lithography method of electron beam

MASK INSPECTION APPARATUS, AND EXPOSURE METHOD AND MASK INSPECTION...

MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD

APPARATUS AND METHOD FOR PATTERN INSPECTION

CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD

SYSTEM AND METHOD FOR CHARGED-PARTICLE BEAM LITHOGRAPHY

CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND METHOD FOR EVALUATING...

FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...

METHOD OF CALCULATING DEFLECTION ABERRATION CORRECTING VOLTAGE AND...

Move mechanism for moving target object and charged particle beam w...

POSITION MEASURING APPARATUS AND POSITIONAL DEVIATION MEASURING METHOD

WRITING METHOD AND WRITING APPARATUS OF CHARGED PARTICLE BEAM, POSI...

Electron beam writing apparatus and writing method