Shuichiro Uda

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method and etching device
- Patent number 11,443,952
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Akitaka Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method
- Patent number 10,910,229
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Koichi Nagakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower head, plasma processing apparatus and plasma processing method
- Patent number 9,466,468
- Issue date Oct 11, 2016
- Tokyo Electron Limited
- Nobuyuki Okayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 9,048,191
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,716,144
- Issue date May 6, 2014
- Tokyo Electron Limited
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210384038
- Publication date Dec 9, 2021
- TOKYO ELECTRON LIMITED
- Shuichiro UDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Method and Etching Device
- Publication number 20210151326
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Akitaka SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD
- Publication number 20180366334
- Publication date Dec 20, 2018
- TOKYO ELECTRON LIMITED
- Koichi NAGAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140291286
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Nobuyuki OKAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20140113450
- Publication date Apr 24, 2014
- TOKYO ELECTRON LIMITED
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120238098
- Publication date Sep 20, 2012
- TOKYO ELECTRON LIMITED
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READAB...
- Publication number 20090221148
- Publication date Sep 3, 2009
- TOKYO ELECTRON LIMITED
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS

Shuichiro Uda

Person

Patents Grantslast 30 patents

Etching method and etching device

Substrate treatment method

Shower head, plasma processing apparatus and plasma processing method

Plasma etching method

Method for manufacturing semiconductor device

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Etching Method and Etching Device

SUBSTRATE TREATMENT METHOD

SHOWER HEAD, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READAB...