Shun-Der Wu

Person

Tainan, TW

People

Patents Grantslast 30 patents

Information Patent Grant
EUV lithography system and method with optimized throughput and sta...
- Patent number 10,520,823
- Issue date Dec 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography system and method with optimized throughput and sta...
- Patent number 10,156,790
- Issue date Dec 18, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography system and method with optimized throughput and sta...
- Patent number 9,678,431
- Issue date Jun 13, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography collector contamination reduction
- Patent number 9,625,824
- Issue date Apr 18, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for photomask particle detection
- Patent number 9,607,833
- Issue date Mar 28, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shang-Chieh Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EUV Lithography System and Method with Optimized Throughput and Sta...
- Publication number 20190121241
- Publication date Apr 25, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography System and Method with Optimized Throughput and Sta...
- Publication number 20170277040
- Publication date Sep 28, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Lithography Collector Contamination Reduction
- Publication number 20160320708
- Publication date Nov 3, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV Lithography System and Method with Optimized Throughput and Sta...
- Publication number 20160274465
- Publication date Sep 22, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System And Method For Photomask Particle Detection
- Publication number 20160225610
- Publication date Aug 4, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shang-Chieh Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRODUCTION OF AN ALIGNMENT MARK
- Publication number 20110273685
- Publication date Nov 10, 2011
- ASML NETHERLANDS B.V.
- Chung-Hsun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shun-Der Wu

Person

Patents Grantslast 30 patents

EUV lithography system and method with optimized throughput and sta...

EUV lithography system and method with optimized throughput and sta...

EUV lithography system and method with optimized throughput and sta...

Extreme ultraviolet lithography collector contamination reduction

System and method for photomask particle detection

Patents Applicationslast 30 patents

EUV Lithography System and Method with Optimized Throughput and Sta...

EUV Lithography System and Method with Optimized Throughput and Sta...

Extreme Ultraviolet Lithography Collector Contamination Reduction

EUV Lithography System and Method with Optimized Throughput and Sta...

System And Method For Photomask Particle Detection

PRODUCTION OF AN ALIGNMENT MARK