Shun-Yi Lin

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 11,854,816
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ling Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,735,426
- Issue date Aug 22, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchant for etching a cobalt-containing member in a semiconductor s...
- Patent number 11,476,124
- Issue date Oct 18, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ren-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,101,135
- Issue date Aug 24, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etch chemistry for selective silicon etch
- Patent number 10,676,668
- Issue date Jun 9, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Neng-Jye Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 10,529,572
- Issue date Jan 7, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etch chemistry for selective silicon etch
- Patent number 10,179,878
- Issue date Jan 15, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Neng-Jye Yang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of patterning a metal gate of semiconductor device
- Patent number 9,362,124
- Issue date Jun 7, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning a metal gate of semiconductor device
- Patent number 8,993,452
- Issue date Mar 31, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing dummy poly in a gate last process
- Patent number 8,415,254
- Issue date Apr 9, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning a metal gate of semiconductor device
- Patent number 8,357,617
- Issue date Jan 22, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming metal gate transistors
- Patent number 8,268,085
- Issue date Sep 18, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating gate electrode using a treated hard mask
- Patent number 8,173,504
- Issue date May 8, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling gate thickness in forming FinFET devices
- Patent number 8,114,721
- Issue date Feb 14, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shun Wu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for metal gate N/P patterning
- Patent number 8,048,810
- Issue date Nov 1, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fang Wen Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning a metal gate
- Patent number 7,915,105
- Issue date Mar 29, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity etching process for metal gate N/P patterning
- Patent number 7,732,344
- Issue date Jun 8, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fang Wen Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface preparation for gate oxide formation that avoids chemical o...
- Patent number 7,727,900
- Issue date Jun 1, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure applied to a photolithographic process
- Patent number 7,683,487
- Issue date Mar 23, 2010
- Macronix International Co., Ltd.
- Shun-Li Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for analyzing overlay errors
- Patent number 7,586,609
- Issue date Sep 8, 2009
- Macronix International Co., Ltd.
- Shun-Li Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist with adjustable polarized light reaction and photolitho...
- Patent number 7,157,215
- Issue date Jan 2, 2007
- Macronix International Co., Ltd.
- Shun-Li Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of code programming a mask ROM device
- Patent number 7,132,334
- Issue date Nov 7, 2006
- Macronix International Co., Ltd.
- Shun Li Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing an epitaxial layer of SiGe subsequent to a pla...
- Patent number 7,129,184
- Issue date Oct 31, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chien Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure applied to a photolithographic process and method for fab...
- Patent number 7,008,870
- Issue date Mar 7, 2006
- Macronix International Co., Ltd.
- Shun-Li Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay error model, sampling strategy and associated equipment for...
- Patent number 6,975,974
- Issue date Dec 13, 2005
- Macronix International Co., Ltd.
- Chen-Fu Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask with extended mask clear-out window and method of dummy exposu...
- Patent number 6,960,411
- Issue date Nov 1, 2005
- Macronix International Co., Ltd.
- Yu-Lin Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of optical proximity correction
- Patent number 6,660,458
- Issue date Dec 9, 2003
- Macronix International Co., Ltd.
- Shun-Li Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reducing roughness of photoresist through cross-linking...
- Patent number 6,627,388
- Issue date Sep 30, 2003
- Macronix International Co., Ltd.
- Shun-Li Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of improving astigmatism of a photoresist layer
- Patent number 6,576,407
- Issue date Jun 10, 2003
- Macronix International Co. Ltd.
- Shun-Li Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using organic polymer as covering layer for device lightl...
- Patent number 6,348,384
- Issue date Feb 19, 2002
- Macronix International Co., Ltd.
- Shun Li Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240387182
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ling Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DIE PACKAGES AND METHODS OF FORMATION
- Publication number 20240153895
- Publication date May 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-HakLay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240014043
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ling Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHARED PAD/BRIDGE LAYOUT FOR A 3D IC
- Publication number 20230170328
- Publication date Jun 1, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20230067984
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Ling Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHANT FOR ETCHING A COBALT-CONTAINING MEMBER IN A SEMICONDUCTOR S...
- Publication number 20220367206
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- REN-KAI CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices Including Backside Power Rails and Methods of...
- Publication number 20220310785
- Publication date Sep 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHANT FOR ETCHING A COBALT-CONTAINING MEMBER IN A SEMICONDUCTOR S...
- Publication number 20220216066
- Publication date Jul 7, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- REN-KAI CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20210384034
- Publication date Dec 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20200161137
- Publication date May 21, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20190333770
- Publication date Oct 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCH CHEMISTRY FOR SELECTIVE SILICON ETCH
- Publication number 20190119570
- Publication date Apr 25, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Neng-Jye YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCH CHEMISTRY FOR SELECTIVE SILICON ETCH
- Publication number 20180171226
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Neng-Jye YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A METAL GATE OF SEMICONDUCTOR DEVICE
- Publication number 20150206755
- Publication date Jul 23, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Patterning a Metal Gate of Semiconductor Device
- Publication number 20130130488
- Publication date May 23, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING GATE ELECTRODE USING A TREATED HARD MASK
- Publication number 20110250725
- Publication date Oct 13, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt YEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR METAL GATE N/P PATTERNING
- Publication number 20110189847
- Publication date Aug 4, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fang Wen Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING GATE THICKNESS IN FORMING FINFET DEVICES
- Publication number 20110143510
- Publication date Jun 16, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shun Wu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING GATE THICKNESSES IN FORMING FUSI GATES
- Publication number 20110097867
- Publication date Apr 28, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shun Wu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING METAL GATE TRANSISTORS
- Publication number 20100240204
- Publication date Sep 23, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt YEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL METHOD FOR REMOVING DUMMY POLY IN A GATE LAST PROCESS
- Publication number 20100124823
- Publication date May 20, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PATTERNING A METAL GATE
- Publication number 20100112811
- Publication date May 6, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A METAL GATE OF SEMICONDUCTOR DEVICE
- Publication number 20100048011
- Publication date Feb 25, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE SPM TREATMENT FOR PHOTORESIST STRIPPING
- Publication number 20080060682
- Publication date Mar 13, 2008
- Taiwan Semiconductor Manufacturing Co., LTD
- Matt Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Surface preparation for gate oxide formation that avoids chemical o...
- Publication number 20070197037
- Publication date Aug 23, 2007
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for analyzing overlay errors
- Publication number 20060238761
- Publication date Oct 26, 2006
- Shun-Li Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE APPLIED TO A PHOTOLITHOGRAPHIC PROCESS
- Publication number 20060199375
- Publication date Sep 7, 2006
- SHUN-LI LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of depositing an epitaxial layer of SiGe subsequent to a pla...
- Publication number 20060113282
- Publication date Jun 1, 2006
- Chih-Chien Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
[STRUCTURE APPLIED TO A PHOTOLITHOGRAPHIC PROCESS AND METHOD FOR FA...
- Publication number 20050148166
- Publication date Jul 7, 2005
- SHUN-LI LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of code programming a mask ROM device
- Publication number 20050064668
- Publication date Mar 24, 2005
- Shun Li Lin
- H01 - BASIC ELECTRIC ELEMENTS

Shun-Yi Lin

Person

Patents Grantslast 30 patents

Semiconductor devices and methods of manufacturing thereof

Semiconductor device and method of manufacture

Etchant for etching a cobalt-containing member in a semiconductor s...

Semiconductor device and method of manufacture

Wet etch chemistry for selective silicon etch

Semiconductor device and method of manufacture

Wet etch chemistry for selective silicon etch

Method of patterning a metal gate of semiconductor device

Method of patterning a metal gate of semiconductor device

Method for removing dummy poly in a gate last process

Method of patterning a metal gate of semiconductor device

Methods for forming metal gate transistors

Method of fabricating gate electrode using a treated hard mask

Method of controlling gate thickness in forming FinFET devices

Method for metal gate N/P patterning

Method for patterning a metal gate

High selectivity etching process for metal gate N/P patterning

Surface preparation for gate oxide formation that avoids chemical o...

Structure applied to a photolithographic process

Method for analyzing overlay errors

Photoresist with adjustable polarized light reaction and photolitho...

Methods of code programming a mask ROM device

Method of depositing an epitaxial layer of SiGe subsequent to a pla...

Structure applied to a photolithographic process and method for fab...

Overlay error model, sampling strategy and associated equipment for...

Mask with extended mask clear-out window and method of dummy exposu...

Method of optical proximity correction

Method for reducing roughness of photoresist through cross-linking...

Method of improving astigmatism of a photoresist layer

Method of using organic polymer as covering layer for device lightl...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

SEMICONDUCTOR DIE PACKAGES AND METHODS OF FORMATION

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

SHARED PAD/BRIDGE LAYOUT FOR A 3D IC

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

ETCHANT FOR ETCHING A COBALT-CONTAINING MEMBER IN A SEMICONDUCTOR S...

Semiconductor Devices Including Backside Power Rails and Methods of...

ETCHANT FOR ETCHING A COBALT-CONTAINING MEMBER IN A SEMICONDUCTOR S...

Semiconductor Device and Method of Manufacture

Semiconductor Device and Method of Manufacture

Semiconductor Device and Method of Manufacture

WET ETCH CHEMISTRY FOR SELECTIVE SILICON ETCH

WET ETCH CHEMISTRY FOR SELECTIVE SILICON ETCH

METHOD OF PATTERNING A METAL GATE OF SEMICONDUCTOR DEVICE

Method of Patterning a Metal Gate of Semiconductor Device

METHOD OF FABRICATING GATE ELECTRODE USING A TREATED HARD MASK

METHOD FOR METAL GATE N/P PATTERNING

METHOD OF CONTROLLING GATE THICKNESS IN FORMING FINFET DEVICES

METHOD OF CONTROLLING GATE THICKNESSES IN FORMING FUSI GATES

METHODS FOR FORMING METAL GATE TRANSISTORS

NOVEL METHOD FOR REMOVING DUMMY POLY IN A GATE LAST PROCESS

METHOD FOR PATTERNING A METAL GATE

METHOD OF PATTERNING A METAL GATE OF SEMICONDUCTOR DEVICE

HIGH TEMPERATURE SPM TREATMENT FOR PHOTORESIST STRIPPING

Surface preparation for gate oxide formation that avoids chemical o...

Method for analyzing overlay errors

STRUCTURE APPLIED TO A PHOTOLITHOGRAPHIC PROCESS

Method of depositing an epitaxial layer of SiGe subsequent to a pla...

[STRUCTURE APPLIED TO A PHOTOLITHOGRAPHIC PROCESS AND METHOD FOR FA...

Methods of code programming a mask ROM device