Shunichi Endo

Person

Sagamihara, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Process for the production of semiconductor device
- Patent number 6,727,182
- Issue date Apr 27, 2004
- Tokyo Electron Limited
- Takashi Akahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma film forming method utilizing varying bias electric power
- Patent number 6,468,603
- Issue date Oct 22, 2002
- Tokyo Electron Limited
- Shunichi Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having a fluorine-added carbon film as an inte...
- Patent number 6,429,518
- Issue date Aug 6, 2002
- Tokyo Electron Ltd.
- Shunichi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma film forming method and plasma film forming apparatus
- Patent number 6,355,902
- Issue date Mar 12, 2002
- Tokyo Electron Limited
- Takashi Akahori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for producing the same
- Patent number 6,218,299
- Issue date Apr 17, 2001
- Tokyo Electron Limited
- Takashi Akahori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma film forming method and plasma film forming apparatus
- Patent number 6,215,087
- Issue date Apr 10, 2001
- Tokyo Electron Limited
- Takashi Akahori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Plasma film forming method and plasma film forming apparatus
- Publication number 20010020608
- Publication date Sep 13, 2001
- Takashi Akahori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR THE PRODUCTION OF SEMICONDUCTOR DEVICE
- Publication number 20010001741
- Publication date May 24, 2001
- TAKASHI AKAHORI
- H01 - BASIC ELECTRIC ELEMENTS

Shunichi Endo

Person

Patents Grantslast 30 patents

Process for the production of semiconductor device

Plasma film forming method utilizing varying bias electric power

Semiconductor device having a fluorine-added carbon film as an inte...

Plasma film forming method and plasma film forming apparatus

Semiconductor device and method for producing the same

Plasma film forming method and plasma film forming apparatus

Patents Applicationslast 30 patents

Plasma film forming method and plasma film forming apparatus

PROCESS FOR THE PRODUCTION OF SEMICONDUCTOR DEVICE