Shunichi Iimuro

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Yamanashi, JP

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Patents Grantslast 30 patents

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Plasma etching method
- Patent number 6,589,435
- Issue date Jul 8, 2003
- Tokyo Electron Limited
- Shin Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 6,110,287
- Issue date Aug 29, 2000
- Tokyo Electron Limited
- Izumi Arai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anisotropic etching method and apparatus
- Patent number 5,766,498
- Issue date Jun 16, 1998
- Hitachi, Ltd.
- Masayuki Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching system and plasma etching method
- Patent number 5,593,540
- Issue date Jan 14, 1997
- Hitachi, Ltd.
- Kazushi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anisotropic etching method and apparatus
- Patent number 5,445,709
- Issue date Aug 29, 1995
- Hitachi, Ltd.
- Masayuki Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching system
- Patent number 5,423,936
- Issue date Jun 13, 1995
- Hitachi, Ltd.
- Kazushi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of ashing layers, and apparatus for ashing layers
- Patent number 4,812,201
- Issue date Mar 14, 1989
- Tokyo Electron Limited
- Hiroyuki Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY