Shunichiro Uchimura

Person

Hitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive polyimide precursor and its use for pattern formation
- Patent number 6,319,656
- Issue date Nov 20, 2001
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitve polymide precursor and its use for pattern formation
- Patent number 6,025,113
- Issue date Feb 15, 2000
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low dielectric resin composition
- Patent number 5,905,117
- Issue date May 18, 1999
- Asahi Glass Company Ltd.
- Shunsuke Yokotsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating resin composition and semiconductor device using the same
- Patent number 5,132,386
- Issue date Jul 21, 1992
- Hitachi Chemical Co., Ltd.
- Hiroshi Suzuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compositions of materials for forming protective film in semiconduc...
- Patent number 4,497,922
- Issue date Feb 5, 1985
- Hitachi Chemical Company, Ltd.
- Hidetaka Sato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Intermediate, copolymer resin and production thereof
- Patent number 4,338,426
- Issue date Jul 6, 1982
- Hitachi Chemical Company, Ltd.
- Hidetaka Sato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Photosensitive polyimide precursor and its use for pattern formation
- Publication number 20020048726
- Publication date Apr 25, 2002
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Shunichiro Uchimura

Person

Patents Grantslast 30 patents

Photosensitive polyimide precursor and its use for pattern formation

Photosensitve polymide precursor and its use for pattern formation

Low dielectric resin composition

Insulating resin composition and semiconductor device using the same

Compositions of materials for forming protective film in semiconduc...

Intermediate, copolymer resin and production thereof

Patents Applicationslast 30 patents

Photosensitive polyimide precursor and its use for pattern formation