Shuogang Huang

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chamber for patterning non-volatile metals
- Patent number 9,953,843
- Issue date Apr 24, 2018
- Lam Research Corporation
- Meihua Shen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to etch copper barrier film
- Patent number 9,570,320
- Issue date Feb 14, 2017
- Lam Research Corporation
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for preventing native oxide regrowth
- Patent number 9,373,518
- Issue date Jun 21, 2016
- Intermolecular, Inc.
- Edwin Adhiprakasha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical concentration in etching doped poly silicon with HF/HNO3
- Patent number 8,716,145
- Issue date May 6, 2014
- Intermolecular, Inc.
- Shuogang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for preventing native oxide regrowth
- Patent number 8,632,690
- Issue date Jan 21, 2014
- Intermolecular, Inc.
- Edwin Adhiprakasha
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MOVABLE DISK WITH APERTURE FOR ETCH CONTROL
- Publication number 20230245865
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Chih-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING WITH GAS TREATMENT AND PULSING
- Publication number 20220102624
- Publication date Mar 31, 2022
- LAM RESEARCH CORPORATION
- Seokmin YUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Anisotropic Pattern Etching and Treatment
- Publication number 20210151290
- Publication date May 20, 2021
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Anisotropic Pattern Etching and Treatment
- Publication number 20190148109
- Publication date May 16, 2019
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER FOR PATTERNING NON-VOLATILE METALS
- Publication number 20180204738
- Publication date Jul 19, 2018
- LAM RESEARCH CORPORATION
- Meihua Shen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER FOR PATTERNING NON-VOLATILE METALS
- Publication number 20170229317
- Publication date Aug 10, 2017
- LAM RESEARCH CORPORATION
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL METHOD TO ETCH COPPER BARRIER FILM
- Publication number 20160104630
- Publication date Apr 14, 2016
- LAM RESEARCH CORPORATION
- Meihua SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Screening of Surface Passivation Processes for Germanium Channels
- Publication number 20140315331
- Publication date Oct 23, 2014
- Intermolecular, Inc.
- Sandip Niyogi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Customizing Etch Selectivity with Sequential Multi-Stage Etches wit...
- Publication number 20140170857
- Publication date Jun 19, 2014
- Intermolecular, Inc.
- Chi-I Lang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Preventing Native Oxide Regrowth
- Publication number 20140094037
- Publication date Apr 3, 2014
- Intermolecular, Inc.
- Edwin Adhiprakasha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Layer Thickness Measurement
- Publication number 20130162995
- Publication date Jun 27, 2013
- Intermolecular, Inc.
- Shuogang Huang
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR PREVENTING NATIVE OXIDE REGROWTH
- Publication number 20130137276
- Publication date May 30, 2013
- Intermolecular, Inc.
- Edwin Adhiprakasha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Critical Concentration in Etching Doped Poly Silicon With HF/HNO3
- Publication number 20130137277
- Publication date May 30, 2013
- Intermolecular, Inc.
- Shuogang Huang
- H01 - BASIC ELECTRIC ELEMENTS

Shuogang Huang

Person

Patents Grantslast 30 patents

Chamber for patterning non-volatile metals

Method to etch copper barrier film

Method and apparatus for preventing native oxide regrowth

Critical concentration in etching doped poly silicon with HF/HNO3

Method and apparatus for preventing native oxide regrowth

Patents Applicationslast 30 patents

MOVABLE DISK WITH APERTURE FOR ETCH CONTROL

ION BEAM ETCHING WITH GAS TREATMENT AND PULSING

Method and Apparatus for Anisotropic Pattern Etching and Treatment

Method and Apparatus for Anisotropic Pattern Etching and Treatment

CHAMBER FOR PATTERNING NON-VOLATILE METALS

CHAMBER FOR PATTERNING NON-VOLATILE METALS

NOVEL METHOD TO ETCH COPPER BARRIER FILM

Screening of Surface Passivation Processes for Germanium Channels

Customizing Etch Selectivity with Sequential Multi-Stage Etches wit...

Method and Apparatus for Preventing Native Oxide Regrowth

Layer Thickness Measurement

METHOD AND APPARATUS FOR PREVENTING NATIVE OXIDE REGROWTH

Critical Concentration in Etching Doped Poly Silicon With HF/HNO3