Shusuke Yoshitake

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask inspection apparatus, electron beam inspection apparatus, mask...
- Patent number 11,475,557
- Issue date Oct 18, 2022
- NuFlare Technology, Inc.
- Shusuke Yoshitake
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern inspection apparatus, pattern position measurement apparatu...
- Patent number 10,572,990
- Issue date Feb 25, 2020
- NuFlare Technology, Inc.
- Shusuke Yoshitake
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam writing apparatus and method therefor
- Patent number 9,552,963
- Issue date Jan 24, 2017
- Nuflare Technology, Inc.
- Shusuke Yoshitake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam writing apparatus and position displacement amount co...
- Patent number 8,718,972
- Issue date May 6, 2014
- Nuflare Technology, Inc.
- Shusuke Yoshitake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing method, method for detecting position...
- Patent number 8,399,833
- Issue date Mar 19, 2013
- Nuflare Technology, Inc.
- Shusuke Yoshitake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Correcting substrate for charged particle beam lithography apparatus
- Patent number 8,183,544
- Issue date May 22, 2012
- Nuflare Technology, Inc.
- Kaoru Tsuruta
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Position measuring apparatus and positional deviation measuring method
- Patent number 7,643,130
- Issue date Jan 5, 2010
- Nuflare Technology, Inc.
- Shusuke Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Writing method and writing apparatus of charged particle beam, posi...
- Patent number 7,554,107
- Issue date Jun 30, 2009
- Nuflare Technology, Inc.
- Shusuke Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measuring method in pattern drawing apparatus
- Patent number 6,676,289
- Issue date Jan 13, 2004
- Kabushiki Kaisha Toshiba
- Ryoichi Hirano
- G01 - MEASURING TESTING
Information Patent Grant
Sample transferring method and sample transfer supporting apparatus
- Patent number 6,281,510
- Issue date Aug 28, 2001
- Kabushiki Kaisha Toshiba
- Shusuke Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming apparatus
- Patent number 6,182,369
- Issue date Feb 6, 2001
- Kabushiki Kaisha Toshiba
- Ryoichi Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam irradiation apparatus
- Patent number 6,172,364
- Issue date Jan 9, 2001
- Kabushiki Kaisha Toshiba
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample transferring method and sample transfer supporting apparatus
- Patent number 6,090,176
- Issue date Jul 18, 2000
- Kabushiki Kaisha Toshiba
- Shusuke Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic deflecting electrode unit for use in charged beam lit...
- Patent number 5,929,452
- Issue date Jul 27, 1999
- Kabushiki Kaisha Toshiba
- Shusuke Yoshitake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system
- Patent number 5,912,468
- Issue date Jun 15, 1999
- Kabushiki Kaisha Toshiba
- Ryoichi Hirano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern transfer apparatus, an operation management system thereof,...
- Patent number 5,909,030
- Issue date Jun 1, 1999
- Kabushiki Kaisha Toshiba
- Shusuke Yoshitake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam lithograph apparatus
- Patent number 5,850,083
- Issue date Dec 15, 1998
- Kabushiki Kaisha Toshiba
- Souji Koikari
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MASK INSPECTION APPARATUS, ELECTRON BEAM INSPECTION APPARATUS, MASK...
- Publication number 20200394778
- Publication date Dec 17, 2020
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN INSPECTION APPARATUS, PATTERN POSITION MEASUREMENT APPARATU...
- Publication number 20180293720
- Publication date Oct 11, 2018
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREFOR
- Publication number 20110231134
- Publication date Sep 22, 2011
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, METHOD FOR DETECTING POSITION...
- Publication number 20100237256
- Publication date Sep 23, 2010
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM WRITING APPARATUS AND POSITION DISPLACEMENT AMOUNT CO...
- Publication number 20090259431
- Publication date Oct 15, 2009
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS
- Publication number 20090242807
- Publication date Oct 1, 2009
- NuFlare Technology, Inc.
- Kaoru TSURUTA
- B82 - NANO-TECHNOLOGY
Information Patent Application
POSITION MEASURING APPARATUS AND POSITIONAL DEVIATION MEASURING METHOD
- Publication number 20070103657
- Publication date May 10, 2007
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
WRITING METHOD AND WRITING APPARATUS OF CHARGED PARTICLE BEAM, POSI...
- Publication number 20070103659
- Publication date May 10, 2007
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
Temperature measuring method in pattern drawing apparatus
- Publication number 20020027945
- Publication date Mar 7, 2002
- Ryoichi Hirano
- G01 - MEASURING TESTING

Shusuke Yoshitake

Person

Patents Grantslast 30 patents

Mask inspection apparatus, electron beam inspection apparatus, mask...

Pattern inspection apparatus, pattern position measurement apparatu...

Charged particle beam writing apparatus and method therefor

Electron beam writing apparatus and position displacement amount co...

Charged particle beam writing method, method for detecting position...

Correcting substrate for charged particle beam lithography apparatus

Position measuring apparatus and positional deviation measuring method

Writing method and writing apparatus of charged particle beam, posi...

Temperature measuring method in pattern drawing apparatus

Sample transferring method and sample transfer supporting apparatus

Pattern forming apparatus

Charged particle beam irradiation apparatus

Sample transferring method and sample transfer supporting apparatus

Electrostatic deflecting electrode unit for use in charged beam lit...

Charged particle beam exposure system

Pattern transfer apparatus, an operation management system thereof,...

Charged particle beam lithograph apparatus

Patents Applicationslast 30 patents

MASK INSPECTION APPARATUS, ELECTRON BEAM INSPECTION APPARATUS, MASK...

PATTERN INSPECTION APPARATUS, PATTERN POSITION MEASUREMENT APPARATU...

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREFOR

CHARGED PARTICLE BEAM WRITING METHOD, METHOD FOR DETECTING POSITION...

ELECTRON BEAM WRITING APPARATUS AND POSITION DISPLACEMENT AMOUNT CO...

CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

POSITION MEASURING APPARATUS AND POSITIONAL DEVIATION MEASURING METHOD

WRITING METHOD AND WRITING APPARATUS OF CHARGED PARTICLE BEAM, POSI...

Temperature measuring method in pattern drawing apparatus