Shuto MORI

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Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming method and composition for resist pattern-refinement
- Patent number 10,216,090
- Issue date Feb 26, 2019
- JSR Corporation
- Kanako Meya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20220260908
- Publication date Aug 18, 2022
- JSR Corporation
- Tetsurou KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210389671
- Publication date Dec 16, 2021
- JSR Corporation
- Tetsurou KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20210364918
- Publication date Nov 25, 2021
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
- Publication number 20190155162
- Publication date May 23, 2019
- JSR Corporation
- Kanako MEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
- Publication number 20160291462
- Publication date Oct 6, 2016
- JSR Corporation
- Kanako MEYA
- H01 - BASIC ELECTRIC ELEMENTS