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Shuuichi Ishizuka
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Nirasaki, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Process chamber cleaning method in substrate processing apparatus,...
Patent number
8,608,901
Issue date
Dec 17, 2013
Tokyo Electron Limited
Shuuichi Ishizuka
B08 - CLEANING
Information
Patent Grant
Plasma process device and plasma process method
Patent number
8,394,231
Issue date
Mar 12, 2013
Tokyo Electron Limited
Koichi Takatsuki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming gate insulation film, semiconductor device, and c...
Patent number
7,915,177
Issue date
Mar 29, 2011
Toyko Electron Limited
Tatsuo Nishita
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of measuring nitrogen concentration, method of forming silic...
Patent number
7,842,621
Issue date
Nov 30, 2010
Tokyo Electron Limited
Jiro Katsuki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for cleaning process chamber of substrate processing apparat...
Patent number
7,695,763
Issue date
Apr 13, 2010
Tokyo Electron Limited
Shuuichi Ishizuka
B08 - CLEANING
Information
Patent Grant
Method of forming gate insulating film, semiconductor device and co...
Patent number
7,674,722
Issue date
Mar 9, 2010
Tokyo Electron Limited
Tatsuo Nishita
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PROCESS CHAMBER CLEANING METHOD IN SUBSTRATE PROCESSING APPARATUS,...
Publication number
20100154707
Publication date
Jun 24, 2010
TOKYO ELECTRON LIMITED
Shuuichi Ishizuka
B08 - CLEANING
Information
Patent Application
METHOD OF FORMING GATE INSULATION FILM, SEMICONDUCTOR DEVICE, AND C...
Publication number
20100130023
Publication date
May 27, 2010
TOKYO ELECTRON LIMITED
Tatsuo Nishita
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF MEASURING NITROGEN CONTENT, METHOD OF FORMING SILICON OXY...
Publication number
20090253221
Publication date
Oct 8, 2009
TOKYO ELECTRON LIMITED
Jiro Katsuki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...
Publication number
20090239364
Publication date
Sep 24, 2009
TOKYO ELECTRON LIMITED
Tatsuo Nishita
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of Forming Gate Insulating Film, Semiconductor Device and Co...
Publication number
20070290247
Publication date
Dec 20, 2007
Tatsuo Nishita
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for cleaning process chamber of substrate processing apparat...
Publication number
20070181145
Publication date
Aug 9, 2007
TOKYO ELECTRON LIMITED
Shuuichi Ishizuka
B08 - CLEANING
Information
Patent Application
Plasma process device and plasma process method
Publication number
20070131171
Publication date
Jun 14, 2007
TOKYO ELECTRON LIMITED
Koichi Takatsuki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing device and plasma processing method
Publication number
20040127033
Publication date
Jul 1, 2004
Koichi Takatsuki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Processing apparatus and cleaning method
Publication number
20040065344
Publication date
Apr 8, 2004
Shinsuke Oka
B08 - CLEANING