Shuwei Liu

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,860,533
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,815,809
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded interface in Bragg reflector
- Patent number 11,720,013
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Wen Xiao
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,675,263
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,644,741
- Issue date May 9, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,640,109
- Issue date May 2, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,630,385
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,609,490
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,592,738
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank hard mask materials
- Patent number 11,556,053
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank hard mask materials
- Patent number 11,537,040
- Issue date Dec 27, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,513,437
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Physical vapor deposition chamber cleaning processes
- Patent number 11,365,475
- Issue date Jun 21, 2022
- Applied Materials Inc.
- Vibhu Jindal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Graded interface in bragg reflector
- Patent number 11,327,394
- Issue date May 10, 2022
- Applied Materials Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,300,872
- Issue date Apr 12, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,300,871
- Issue date Apr 12, 2022
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,275,302
- Issue date Mar 15, 2022
- Applied Materials Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber matertals
- Patent number 11,275,303
- Issue date Mar 15, 2022
- Applied Materials Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank defect reduction
- Patent number 11,275,300
- Issue date Mar 15, 2022
- Applied Materials Inc.
- Sai Abhinand
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber matertals
- Patent number 11,275,304
- Issue date Mar 15, 2022
- Applied Materials Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,249,390
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,249,388
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,249,389
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ta—Cu alloy material for extreme ultraviolet mask absorber
- Patent number 11,209,727
- Issue date Dec 28, 2021
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber and processes for manufacture
- Patent number 11,194,244
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20230176468
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20220350233
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank Structure
- Publication number 20220252971
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20220236634
- Publication date Jul 28, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded Interface In Bragg Reflector
- Publication number 20220221786
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20220221783
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Shiyu Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20220107556
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Shuwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20220011663
- Publication date Jan 13, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20210341828
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20210325771
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Shuwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210302826
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank Hard Mask Materials
- Publication number 20210232040
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Extreme Ultraviolet Mask Blank Hard Mask Materials
- Publication number 20210232041
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210232042
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210232039
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS
- Publication number 20210124253
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Physical Vapor Deposition Chamber Cleaning Processes
- Publication number 20210032742
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Vibhu Jindal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200371424
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200371427
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200371429
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200371422
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200371428
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200371430
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200371423
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Shuwei Liu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Graded Interface In Bragg Reflector
- Publication number 20200333700
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200249560
- Publication date Aug 6, 2020
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200249557
- Publication date Aug 6, 2020
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200249559
- Publication date Aug 6, 2020
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Physical Vapor Deposition Target Assembly
- Publication number 20200241409
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Extreme Ultraviolet Mask Absorber And Processes For Manufacture
- Publication number 20200201167
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Graded interface in Bragg reflector

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask blank hard mask materials

Extreme ultraviolet mask blank hard mask materials

Extreme ultraviolet mask absorber materials

Physical vapor deposition chamber cleaning processes

Graded interface in bragg reflector

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber matertals

Extreme ultraviolet mask blank defect reduction

Extreme ultraviolet mask absorber matertals

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Ta—Cu alloy material for extreme ultraviolet mask absorber

Extreme ultraviolet mask absorber and processes for manufacture

Patents Applicationslast 30 patents

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Extreme Ultraviolet Mask Blank Structure

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Graded Interface In Bragg Reflector

Extreme Ultraviolet Mask Absorber Materials

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Extreme Ultraviolet Mask Absorber Materials

Extreme Ultraviolet Mask Blank Hard Mask Materials

Extreme Ultraviolet Mask Blank Hard Mask Materials

Extreme Ultraviolet Mask Absorber Materials

Extreme Ultraviolet Mask Absorber Materials

EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS

Physical Vapor Deposition Chamber Cleaning Processes

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Graded Interface In Bragg Reflector

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Physical Vapor Deposition Target Assembly

Extreme Ultraviolet Mask Absorber And Processes For Manufacture