Si-Wen LIAO

Person

Hsinchu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for controlling plasma in semiconductor fabrication
- Patent number 10,867,787
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Tsung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and method of forming coating film
- Patent number 10,864,530
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Lan-Hai Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal chemical vapor deposition system and operating method thereof
- Patent number 10,724,140
- Issue date Jul 28, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Chan Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling plasma in semiconductor fabrication
- Patent number 10,395,918
- Issue date Aug 27, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Tsung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal chemical vapor deposition system and operating method thereof
- Patent number 10,161,041
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Chan Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for dielectric deposition process
- Patent number 9,631,273
- Issue date Apr 25, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lan-Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and operation method thereof
- Patent number 9,607,873
- Issue date Mar 28, 2017
- Taiwan Semiconductor Manufacturing Company Ltd.
- Si-Wen Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and method of forming coating film
- Patent number 9,573,144
- Issue date Feb 21, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lan-Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Asymmetrical chamber configuration
- Patent number 9,490,152
- Issue date Nov 8, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lan-Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film deposition apparatus with multi chamber design and film d...
- Patent number 9,324,559
- Issue date Apr 26, 2016
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lan Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR CONTROLLING PLASMA IN SEMICONDUCTOR FABRICATION
- Publication number 20190378714
- Publication date Dec 12, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Tsung WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal Chemical Vapor Deposition System and Operating Method Thereof
- Publication number 20180334747
- Publication date Nov 22, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Chan Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING APPARATUS AND METHOD OF FORMING COATING FILM
- Publication number 20170157625
- Publication date Jun 8, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lan-Hai WANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
THERMAL CHEMICAL VAPOR DEPOSITION SYSTEM AND OPERATING METHOD THEREOF
- Publication number 20170107619
- Publication date Apr 20, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Chan LO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING PLASMA IN SEMICONDUCTOR FABRICATION
- Publication number 20160343625
- Publication date Nov 24, 2016
- Taiwan Semiconductor Manufacturing Co., LTD
- Cheng-Tsung WU
- B08 - CLEANING
Information Patent Application
COATING APPARATUS AND METHOD OF FORMING COATING FILM
- Publication number 20150348779
- Publication date Dec 3, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Lan-Hai WANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS AND OPERATION METHOD THEREOF
- Publication number 20150228516
- Publication date Aug 13, 2015
- Taiwan Semiconductor Manufacturing company Ltd.
- SI-WEN LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM DEPOSITION APPARATUS WITH MULTI CHAMBER DESIGN AND FILM D...
- Publication number 20140377961
- Publication date Dec 25, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- Lan Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for Dielectric Deposition Process
- Publication number 20140026813
- Publication date Jan 30, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lan-Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Asymmetrical Chamber Configuration
- Publication number 20130319543
- Publication date Dec 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lan-Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Si-Wen LIAO

Person

Patents Grantslast 30 patents

Method for controlling plasma in semiconductor fabrication

Coating apparatus and method of forming coating film

Thermal chemical vapor deposition system and operating method thereof

Method and system for controlling plasma in semiconductor fabrication

Thermal chemical vapor deposition system and operating method thereof

Apparatus for dielectric deposition process

Apparatus and operation method thereof

Coating apparatus and method of forming coating film

Asymmetrical chamber configuration

Thin film deposition apparatus with multi chamber design and film d...

Patents Applicationslast 30 patents

METHOD FOR CONTROLLING PLASMA IN SEMICONDUCTOR FABRICATION

Thermal Chemical Vapor Deposition System and Operating Method Thereof

COATING APPARATUS AND METHOD OF FORMING COATING FILM

THERMAL CHEMICAL VAPOR DEPOSITION SYSTEM AND OPERATING METHOD THEREOF

METHOD AND SYSTEM FOR CONTROLLING PLASMA IN SEMICONDUCTOR FABRICATION

COATING APPARATUS AND METHOD OF FORMING COATING FILM

APPARATUS AND OPERATION METHOD THEREOF

THIN FILM DEPOSITION APPARATUS WITH MULTI CHAMBER DESIGN AND FILM D...

Apparatus for Dielectric Deposition Process

Asymmetrical Chamber Configuration