Si Yi Li

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Milpitas, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Atomic layer deposition and etch for reducing roughness
- Patent number 11,170,997
- Issue date Nov 9, 2021
- Lam Research Corporation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition and etch for reducing roughness
- Patent number 10,658,174
- Issue date May 19, 2020
- Lam Research Corporation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching low-k dielectric materials
- Patent number 7,311,852
- Issue date Dec 25, 2007
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of silicon carbide
- Patent number 7,166,535
- Issue date Jan 23, 2007
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching silicon carbide
- Patent number 6,919,278
- Issue date Jul 19, 2005
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for patterning multilevel interconnects
- Patent number 6,875,699
- Issue date Apr 5, 2005
- Lam Research Corporation
- Stephan Lassig
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of silicon carbide
- Patent number 6,670,278
- Issue date Dec 30, 2003
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER DEPOSITION AND ETCH FOR REDUCING ROUGHNESS
- Publication number 20200243326
- Publication date Jul 30, 2020
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION AND ETCH FOR REDUCING ROUGHNESS
- Publication number 20190157066
- Publication date May 23, 2019
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching of silicon carbide
- Publication number 20030199170
- Publication date Oct 23, 2003
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching silicon carbide
- Publication number 20030087531
- Publication date May 8, 2003
- LAM RESEARCH CORPORATION
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching low-k dielectric materials
- Publication number 20030024902
- Publication date Feb 6, 2003
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching of silicon carbide
- Publication number 20020177321
- Publication date Nov 28, 2002
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching of silicon carbide
- Publication number 20020177322
- Publication date Nov 28, 2002
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS