Siao-Shan Wang

Person

Hsin-Chu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method composition and methods thereof
- Patent number 12,211,698
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,085,855
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Grafting design for pattern post-treatment in semiconductor manufac...
- Patent number 11,387,104
- Issue date Jul 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post development treatment method and material for shrinking critic...
- Patent number 10,915,027
- Issue date Feb 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process using photoresist material with photosensitive...
- Patent number 10,866,515
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material composition and methods thereof
- Patent number 10,863,630
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocking layer material composition and methods thereof in semicond...
- Patent number 10,747,114
- Issue date Aug 18, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grafting design for pattern post-treatment in semiconductor manufac...
- Patent number 10,672,610
- Issue date Jun 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material composition and methods thereof
- Patent number 10,672,619
- Issue date Jun 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material composition and methods thereof
- Patent number 10,517,179
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocking layer material composition and methods thereof in semicond...
- Patent number 10,394,123
- Issue date Aug 27, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Grafting agent for forming spacer layer
- Patent number 10,114,291
- Issue date Oct 30, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ya-Ling Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post development treatment method and material for shrinking critic...
- Patent number 10,036,957
- Issue date Jul 31, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical treatment for lithography improvement in a negative tone d...
- Patent number 9,810,990
- Issue date Nov 7, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Han Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240377739
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Siao-Shan WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20230393467
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- Siao-Shan WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20210341837
- Publication date Nov 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method Composition and Methods Thereof
- Publication number 20200335349
- Publication date Oct 22, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Siao-Shan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Grafting Design for Pattern Post-Treatment in Semiconductor Manufac...
- Publication number 20200294801
- Publication date Sep 17, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL COMPOSITION AND METHODS THEREOF
- Publication number 20200146154
- Publication date May 7, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan WANG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Blocking Layer Material Composition and Methods Thereof in Semicond...
- Publication number 20190384177
- Publication date Dec 19, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY PROCESS USING PHOTORESIST MATERIAL WITH PHOTOSENSITIVE...
- Publication number 20190157073
- Publication date May 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Grafting Design for Pattern Post-Treatment in Semiconductor Manufac...
- Publication number 20180337044
- Publication date Nov 22, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post Development Treatment Method and Material for Shrinking Critic...
- Publication number 20180335700
- Publication date Nov 22, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Blocking Layer Material Composition and Methods Thereof in Semicond...
- Publication number 20180335697
- Publication date Nov 22, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material Composition and Methods Thereof
- Publication number 20180177055
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL COMPOSITION AND METHODS THEREOF
- Publication number 20180174830
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel Grafting Agent For Forming Spacer Layer
- Publication number 20170256396
- Publication date Sep 7, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Ya-Ling Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post Development Treatment Method and Material For Shrinking Critic...
- Publication number 20170219925
- Publication date Aug 3, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL CHEMICAL TREATMENT FOR LITHOGRAPHY IMPROVEMENT IN A NEGATIVE...
- Publication number 20160274463
- Publication date Sep 22, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Han Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Siao-Shan Wang

Person

Patents Grantslast 30 patents

Method composition and methods thereof

Resin, photoresist composition, and method of manufacturing semicon...

Resin, photoresist composition, and method of manufacturing semicon...

Grafting design for pattern post-treatment in semiconductor manufac...

Post development treatment method and material for shrinking critic...

Lithography process using photoresist material with photosensitive...

Material composition and methods thereof

Blocking layer material composition and methods thereof in semicond...

Grafting design for pattern post-treatment in semiconductor manufac...

Material composition and methods thereof

Material composition and methods thereof

Blocking layer material composition and methods thereof in semicond...

Grafting agent for forming spacer layer

Post development treatment method and material for shrinking critic...

Chemical treatment for lithography improvement in a negative tone d...

Patents Applicationslast 30 patents

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

Method Composition and Methods Thereof

Grafting Design for Pattern Post-Treatment in Semiconductor Manufac...

MATERIAL COMPOSITION AND METHODS THEREOF

Blocking Layer Material Composition and Methods Thereof in Semicond...

LITHOGRAPHY PROCESS USING PHOTORESIST MATERIAL WITH PHOTOSENSITIVE...

Grafting Design for Pattern Post-Treatment in Semiconductor Manufac...

Post Development Treatment Method and Material for Shrinking Critic...

Blocking Layer Material Composition and Methods Thereof in Semicond...

Material Composition and Methods Thereof

MATERIAL COMPOSITION AND METHODS THEREOF

Novel Grafting Agent For Forming Spacer Layer

Post Development Treatment Method and Material For Shrinking Critic...

NOVEL CHEMICAL TREATMENT FOR LITHOGRAPHY IMPROVEMENT IN A NEGATIVE...