Siddhartha Panda

Person

Kanpur, IN

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for multilayer photoresist dry development
- Patent number 8,048,325
- Issue date Nov 1, 2011
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for detecting endpoint in a dry etching system...
- Patent number 7,754,615
- Issue date Jul 13, 2010
- Tokyo Electron Limited
- Siddhartha Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strained MOS devices using source/drain epitaxy
- Patent number 7,525,161
- Issue date Apr 28, 2009
- International Business Machines Corporation
- Meikei Ieong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-silicide spacer removal
- Patent number 7,393,746
- Issue date Jul 1, 2008
- International Business Machines Corporation
- Thomas W. Dyer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR FORMING NESTED AND ISOLATED LINES IN SEMICONDUCTOR DEVICES
- Publication number 20090104776
- Publication date Apr 23, 2009
- International Business Machines Corporation
- David M. Dobuzinsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Strained MOS devices using source/drain epitaxy
- Publication number 20080179627
- Publication date Jul 31, 2008
- Meikei Ieong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for multilayer photoresist dry development
- Publication number 20080128388
- Publication date Jun 5, 2008
- TOKYO ELECTRON LIMITED
- Vaidyanathan BALASUBRAMANIAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRECISE TEMPERATURE CYCLING IN CHEMICAL / BIOCHEMICAL PR...
- Publication number 20080118955
- Publication date May 22, 2008
- International Business Machines Corporation
- Siddhartha Panda
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Post-silicide spacer removal
- Publication number 20080090370
- Publication date Apr 17, 2008
- Thomas W. Dyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELEVATED TEMPERATURE CHEMICAL OXIDE REMOVAL MODULE AND PROCESS
- Publication number 20080078743
- Publication date Apr 3, 2008
- Andres F. Munoz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for detecting endpoint in a dry etching system...
- Publication number 20080026488
- Publication date Jan 31, 2008
- IBM Corporation
- Siddhartha Panda
- H01 - BASIC ELECTRIC ELEMENTS

Siddhartha Panda

Person

Patents Grantslast 30 patents

Method and apparatus for multilayer photoresist dry development

Method and apparatus for detecting endpoint in a dry etching system...

Strained MOS devices using source/drain epitaxy

Post-silicide spacer removal

Patents Applicationslast 30 patents

METHODS FOR FORMING NESTED AND ISOLATED LINES IN SEMICONDUCTOR DEVICES

Strained MOS devices using source/drain epitaxy

Method and apparatus for multilayer photoresist dry development

METHOD FOR PRECISE TEMPERATURE CYCLING IN CHEMICAL / BIOCHEMICAL PR...

Post-silicide spacer removal

ELEVATED TEMPERATURE CHEMICAL OXIDE REMOVAL MODULE AND PROCESS

Method and apparatus for detecting endpoint in a dry etching system...