Simon Hendrik Celine VAN GORP

Person

Oud-Turnhout, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 12,197,136
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,768,442
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,714,357
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,513,442
- Issue date Nov 29, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for determining a fingerprint of a performance...
- Patent number 11,194,258
- Issue date Dec 7, 2021
- ASML Netherlands B.V.
- Léon Maria Albertus Van Der Logt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining a control parameter for an apparatus utilize...
- Patent number 11,181,829
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,086,229
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a fingerprint of a performance...
- Patent number 10,649,342
- Issue date May 12, 2020
- ASML Netherlands B.V.
- Léon Maria Albertus Van Der Logt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DETERMINING A FOCUS ACTUATION PROFILE FOR ONE OR MORE AC...
- Publication number 20240061353
- Publication date Feb 22, 2024
- ASML NETHERLANDS B.V.
- Simon Hendrik Celine VAN GORP
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20240012337
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
NON-CORRECTABLE ERROR IN METROLOGY
- Publication number 20220365450
- Publication date Nov 17, 2022
- ASML NETHERLANDS B.V.
- Arie VAN DEN BRINK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...
- Publication number 20220146946
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20210325788
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20210149312
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING A CONTROL PARAMETER FOR AN APPARATUS UTILIZE...
- Publication number 20210132508
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Cyrus Emil TABERY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VOLTAGE CONTRAST METROLOGY MARK
- Publication number 20210088917
- Publication date Mar 25, 2021
- ASML NETHERLANDS B.V.
- Cyrus Emil TABERY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A FINGERPRINT OF A PERFORMANCE...
- Publication number 20200233310
- Publication date Jul 23, 2020
- ASML NATHERLANDS B. V.
- Léon Maria Albertus VAN DER LOGT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20200103761
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A FINGERPRINT OF A PERFORMANCE...
- Publication number 20190324371
- Publication date Oct 24, 2019
- ASML NETHERLANDS B.V.
- Léon Maria Albertus VAN DER LOGT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Simon Hendrik Celine VAN GORP

Person

Patents Grantslast 30 patents

Method for controlling a lithographic apparatus and associated appa...

Method of determining control parameters of a device manufacturing...

Voltage contrast metrology mark

Method of determining control parameters of a device manufacturing...

Method to predict yield of a device manufacturing process

Method of determining control parameters of a device manufacturing...

Method and apparatus for determining a fingerprint of a performance...

Method for determining a control parameter for an apparatus utilize...

Method to predict yield of a device manufacturing process

Method and apparatus for determining a fingerprint of a performance...

Patents Applicationslast 30 patents

METHOD FOR DETERMINING A FOCUS ACTUATION PROFILE FOR ONE OR MORE AC...

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

NON-CORRECTABLE ERROR IN METROLOGY

METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

METHOD FOR DETERMINING A CONTROL PARAMETER FOR AN APPARATUS UTILIZE...

VOLTAGE CONTRAST METROLOGY MARK

METHOD AND APPARATUS FOR DETERMINING A FINGERPRINT OF A PERFORMANCE...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD AND APPARATUS FOR DETERMINING A FINGERPRINT OF A PERFORMANCE...