Simon Philip Spencer HASTINGS

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 12,055,904
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing devices
- Patent number 12,044,980
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Abraham Slachter
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,947,266
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Nicolaas Petrus Marcus Brantjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining root cause affecting yield in a semiconducto...
- Patent number 11,803,127
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Chenxi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,714,357
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods using fingerprint and evolution analysis
- Patent number 11,281,110
- Issue date Mar 22, 2022
- ASML Netherlands B.V.
- Jeroen Van Dongen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,086,229
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DETERMINING CORRECTIONS FOR LITHOGRAPHIC APPARATUS
- Publication number 20220252988
- Publication date Aug 11, 2022
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...
- Publication number 20220026810
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Nicolaas Petrus Marcus BRANTJES
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20220011728
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF MANUFACTURING DEVICES
- Publication number 20210397172
- Publication date Dec 23, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR DETERMINING ROOT CAUSE AFFECTING YIELD IN A SEMICONDUCTO...
- Publication number 20210389677
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Chenxi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20210325788
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VOLTAGE CONTRAST METROLOGY MARK
- Publication number 20210088917
- Publication date Mar 25, 2021
- ASML NETHERLANDS B.V.
- Cyrus Emil TABERY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20200103761
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Simon Philip Spencer HASTINGS

Person

Patents Grantslast 30 patents

Voltage contrast metrology mark

Method to predict yield of a device manufacturing process

Method of manufacturing devices

Method for controlling a manufacturing process and associated appar...

Method for determining root cause affecting yield in a semiconducto...

Method to predict yield of a device manufacturing process

Methods using fingerprint and evolution analysis

Method to predict yield of a device manufacturing process

Patents Applicationslast 30 patents

METHOD FOR DETERMINING CORRECTIONS FOR LITHOGRAPHIC APPARATUS

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD OF MANUFACTURING DEVICES

METHOD FOR DETERMINING ROOT CAUSE AFFECTING YIELD IN A SEMICONDUCTO...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

VOLTAGE CONTRAST METROLOGY MARK

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS