Simon Reinald HUISMAN

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Overlay measurement system using lock-in amplifier technique
- Patent number 12,124,177
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and lithographic apparatuses
- Patent number 12,025,925
- Issue date Jul 2, 2024
- ASML Netherlands B.V.
- Filippo Alpeggiani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 11,906,906
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology device and phase modulator apparatus therefor comprising...
- Patent number 11,815,675
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase modulators in alignment to decrease mark size
- Patent number 11,803,130
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method
- Patent number 11,762,305
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Sergei Sokolov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection system for an alignment sensor
- Patent number 11,556,068
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G02 - OPTICS
Information Patent Grant
Metrology sensor, illumination system and method of generating meas...
- Patent number 11,474,435
- Issue date Oct 18, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method and apparatus
- Patent number 11,409,206
- Issue date Aug 9, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology sensor for position metrology
- Patent number 11,360,399
- Issue date Jun 14, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position sensor
- Patent number 11,333,985
- Issue date May 17, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensor apparatus and method for lithographic measurements
- Patent number 11,300,892
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G01 - MEASURING TESTING
Information Patent Grant
Level sensor and lithographic apparatus
- Patent number 11,221,565
- Issue date Jan 11, 2022
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 11,181,835
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G01 - MEASURING TESTING
Information Patent Grant
Alignment sensor apparatus for process sensitivity compensation
- Patent number 11,175,593
- Issue date Nov 16, 2021
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 11,086,240
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment measurement system
- Patent number 11,042,096
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment measurement system
- Patent number 10,942,461
- Issue date Mar 9, 2021
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a structure on a substrate
- Patent number 10,788,765
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G01 - MEASURING TESTING
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 10,788,766
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G01 - MEASURING TESTING
Information Patent Grant
Radiation source
- Patent number 10,690,995
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Nitish Kumar
- G02 - OPTICS
Information Patent Grant
Alignment system
- Patent number 10,585,363
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position sensor, lithographic apparatus and method for manufacturin...
- Patent number 10,527,959
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a parameter and apparatus
- Patent number 10,508,906
- Issue date Dec 17, 2019
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position sensing arrangement and lithographic apparatus including s...
- Patent number 10,317,808
- Issue date Jun 11, 2019
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
AN OPTICAL SYSTEM IMPLEMENTED IN A SYSTEM FOR FAST OPTICAL INSPECTI...
- Publication number 20250060684
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCED ALIGNMENT FOR A PHOTOLITHOGRAPHIC APPARATUS
- Publication number 20250053106
- Publication date Feb 13, 2025
- ASML Netherlands B,V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...
- Publication number 20250036031
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Aniruddha Ramakrishna SONDE
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD
- Publication number 20240353761
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240241454
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTENSITY ORDER DIFFERENCE BASED METROLOGY SYSTEM, LITHOGRAPHIC APP...
- Publication number 20240094641
- Publication date Mar 21, 2024
- ASML Holding N.V.
- Justin Lloyd KREUZER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240094643
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Filippo ALPEGGIANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND COHERENCE ADJUSTERS
- Publication number 20240027913
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Sergei SOKOLOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20230418168
- Publication date Dec 28, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
- Publication number 20230341785
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...
- Publication number 20230229094
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING M...
- Publication number 20230213871
- Publication date Jul 6, 2023
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY MEASUREMENT SYSTEM USING LOCK-IN AMPLIFIER TECHNIQUE
- Publication number 20230008139
- Publication date Jan 12, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND LITHOGRAPHIC APPARATUSES
- Publication number 20220397832
- Publication date Dec 15, 2022
- ASML NETHERLANDS B.V.
- Filippo ALPEGGIANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE
- Publication number 20220397833
- Publication date Dec 15, 2022
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK S...
- Publication number 20220350268
- Publication date Nov 3, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY DEVICE AND PHASE MODULATOR APPARATUS THEREFOR
- Publication number 20220299751
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND METHOD
- Publication number 20220283515
- Publication date Sep 8, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20220121128
- Publication date Apr 21, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF SIMULTANEOUSLY ACQUIRING PARALLEL ALIGN...
- Publication number 20220100109
- Publication date Mar 31, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SENSOR, ILLUMINATION SYSTEM AND METHOD OF GENERATING MEAS...
- Publication number 20220057718
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G02 - OPTICS
Information Patent Application
METROLOGY SENSOR FOR POSITION METROLOGY
- Publication number 20220035257
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION SYSTEM FOR AN ALIGNMENT SENSOR
- Publication number 20210382404
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G02 - OPTICS
Information Patent Application
Sensor Apparatus and Method for Lithographic Measurements
- Publication number 20210271178
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G01 - MEASURING TESTING
Information Patent Application
Alignment Method and Apparatus
- Publication number 20210240091
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Sensor, Lithographic Apparatus and Method for Manufacturi...
- Publication number 20210157248
- Publication date May 27, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
Alignment Sensor Apparatus for Process Sensivity Compensation
- Publication number 20210132509
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION SENSOR
- Publication number 20210124276
- Publication date Apr 29, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Level Sensor and Lithographic Apparatus
- Publication number 20210072652
- Publication date Mar 11, 2021
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Measurement System
- Publication number 20200241433
- Publication date Jul 30, 2020
- ASML Netherlands B,V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Simon Reinald HUISMAN

Person

Patents Grantslast 30 patents

Overlay measurement system using lock-in amplifier technique

Metrology method and lithographic apparatuses

Metrology method and associated metrology and lithographic apparatuses

Metrology device and phase modulator apparatus therefor comprising...

Phase modulators in alignment to decrease mark size

Alignment method

Detection system for an alignment sensor

Metrology sensor, illumination system and method of generating meas...

Alignment method and apparatus

Metrology sensor for position metrology

Position sensor

Sensor apparatus and method for lithographic measurements

Level sensor and lithographic apparatus

Metrology sensor, lithographic apparatus and method for manufacturi...

Alignment sensor apparatus for process sensitivity compensation

Metrology sensor, lithographic apparatus and method for manufacturi...

Alignment measurement system

Alignment measurement system

Method and apparatus for measuring a structure on a substrate

Metrology sensor, lithographic apparatus and method for manufacturi...

Radiation source

Alignment system

Position sensor, lithographic apparatus and method for manufacturin...

Method of measuring a parameter and apparatus

Position sensing arrangement and lithographic apparatus including s...

Patents Applicationslast 30 patents

AN OPTICAL SYSTEM IMPLEMENTED IN A SYSTEM FOR FAST OPTICAL INSPECTI...

ENHANCED ALIGNMENT FOR A PHOTOLITHOGRAPHIC APPARATUS

TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...

METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

INTENSITY ORDER DIFFERENCE BASED METROLOGY SYSTEM, LITHOGRAPHIC APP...

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

METROLOGY SYSTEM AND COHERENCE ADJUSTERS

METROLOGY SYSTEM AND LITHOGRAPHIC SYSTEM

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF

ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...

LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING M...

OVERLAY MEASUREMENT SYSTEM USING LOCK-IN AMPLIFIER TECHNIQUE

METROLOGY METHOD AND LITHOGRAPHIC APPARATUSES

PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE

METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK S...

METROLOGY DEVICE AND PHASE MODULATOR APPARATUS THEREFOR

METROLOGY SYSTEM AND METHOD

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

APPARATUS FOR AND METHOD OF SIMULTANEOUSLY ACQUIRING PARALLEL ALIGN...

METROLOGY SENSOR, ILLUMINATION SYSTEM AND METHOD OF GENERATING MEAS...

METROLOGY SENSOR FOR POSITION METROLOGY

DETECTION SYSTEM FOR AN ALIGNMENT SENSOR

Sensor Apparatus and Method for Lithographic Measurements

Alignment Method and Apparatus

Metrology Sensor, Lithographic Apparatus and Method for Manufacturi...

Alignment Sensor Apparatus for Process Sensivity Compensation

POSITION SENSOR

Level Sensor and Lithographic Apparatus

Alignment Measurement System