Siva Kanakasabapathy

Person

Hopewell Junction, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Bubble defect reduction
- Patent number 12,248,252
- Issue date Mar 11, 2025
- Lam Research Corporation
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removing metal contamination from surfaces of a processing chamber
- Patent number 12,191,125
- Issue date Jan 7, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal cut patterning and etching to minimize interlayer dielectric...
- Patent number 11,990,342
- Issue date May 21, 2024
- International Business Machines Corporation
- Kisup Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removing metal contamination from surfaces of a processing chamber
- Patent number 11,842,888
- Issue date Dec 12, 2023
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal cut patterning and etching to minimize interlayer dielectric...
- Patent number 11,133,189
- Issue date Sep 28, 2021
- International Business Machines Corporation
- Kisup Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-channel overlay metrology
- Patent number 11,054,250
- Issue date Jul 6, 2021
- International Business Machines Corporation
- Gangadhara Raja Muthinti
- G01 - MEASURING TESTING
Information Patent Grant
FinFET gate cut after dummy gate removal
- Patent number 11,024,715
- Issue date Jun 1, 2021
- Tessera, Inc.
- John R. Sporre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosheet single gate (SG) and extra gate (EG) field effect transis...
- Patent number 10,741,660
- Issue date Aug 11, 2020
- International Business Machines Corporation
- Nicolas J. Loubet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal cut patterning and etching to minimize interlayer dielectric...
- Patent number 10,734,234
- Issue date Aug 4, 2020
- International Business Machines Corporation
- Kisup Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut in RMG
- Patent number 10,692,990
- Issue date Jun 23, 2020
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut in RMG
- Patent number 10,644,129
- Issue date May 5, 2020
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut using selective deposition to prevent oxide loss
- Patent number 10,622,482
- Issue date Apr 14, 2020
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET gate cut after dummy gate removal
- Patent number 10,600,868
- Issue date Mar 24, 2020
- Tessera, Inc.
- John R. Sporre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut in RMG
- Patent number 10,553,700
- Issue date Feb 4, 2020
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut in replacement metal gate process
- Patent number 10,504,798
- Issue date Dec 10, 2019
- GLOBALFOUNDRIES Inc.
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut using selective deposition to prevent oxide loss
- Patent number 10,347,540
- Issue date Jul 9, 2019
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET gate cut after dummy gate removal
- Patent number 10,229,854
- Issue date Mar 12, 2019
- International Business Machines Corporation
- John R. Sporre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shifted gas delivery for high throughput and cost effectivene...
- Patent number 10,167,558
- Issue date Jan 1, 2019
- International Business Machines Corporation
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stop layer through ion implantation for etch stop
- Patent number 9,627,263
- Issue date Apr 18, 2017
- International Business Machines Corporation
- Hong He
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced high-k gate stack patterning and structure containing a pa...
- Patent number 7,820,552
- Issue date Oct 26, 2010
- International Business Machines Corporation
- Siva Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER
- Publication number 20240112896
- Publication date Apr 4, 2024
- LAM RESEARCH CORPORATION
- Jengyi YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER
- Publication number 20230148265
- Publication date May 11, 2023
- LAM RESEARCH CORPORATION
- Jengyi YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER
- Publication number 20220037132
- Publication date Feb 3, 2022
- LAM RESEARCH CORPORATION
- Jengyi YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL CUT PATTERNING AND ETCHING TO MINIMIZE INTERLAYER DIELECTRIC...
- Publication number 20220005698
- Publication date Jan 6, 2022
- International Business Machines Corporation
- Kisup Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BUBBLE DEFECT REDUCTION
- Publication number 20220004103
- Publication date Jan 6, 2022
- LAM RESEARCH CORPORATION
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET GATE CUT AFTER DUMMY GATE REMOVAL
- Publication number 20200243648
- Publication date Jul 30, 2020
- Tessera, Inc.
- John R. Sporre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT IN RMG
- Publication number 20200044051
- Publication date Feb 6, 2020
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT IN RMG
- Publication number 20200044052
- Publication date Feb 6, 2020
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSHEET SINGLE GATE (SG) AND EXTRA GATE (EG) FIELD EFFECT TRANSIS...
- Publication number 20190378906
- Publication date Dec 12, 2019
- International Business Machines Corporation
- Nicolas J. Loubet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT IN RMG
- Publication number 20190371912
- Publication date Dec 5, 2019
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHANNEL OVERLAY METROLOGY
- Publication number 20190316900
- Publication date Oct 17, 2019
- International Business Machines Corporation
- Gangadhara Raja Muthinti
- G01 - MEASURING TESTING
Information Patent Application
GATE CUT USING SELECTIVE DEPOSITION TO PREVENT OXIDE LOSS
- Publication number 20190259665
- Publication date Aug 22, 2019
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT IN REPLACEMENT METAL GATE PROCESS
- Publication number 20190252268
- Publication date Aug 15, 2019
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STOPLAYER
- Publication number 20190206864
- Publication date Jul 4, 2019
- International Business Machines Corporation
- Hong HE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL CUT PATTERNING AND ETCHING TO MINIMIZE INTERLAYER DIELECTRIC...
- Publication number 20190198327
- Publication date Jun 27, 2019
- International Business Machines Corporation
- Kisup Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT USING SELECTIVE DEPOSITION TO PREVENT OXIDE LOSS
- Publication number 20190189782
- Publication date Jun 20, 2019
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL CUT PATTERNING AND ETCHING TO MINIMIZE INTERLAYER DIELECTRIC...
- Publication number 20190189452
- Publication date Jun 20, 2019
- International Business Machines Corporation
- Kisup Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET GATE CUT AFTER DUMMY GATE REMOVAL
- Publication number 20190189517
- Publication date Jun 20, 2019
- International Business Machines Corporation
- John R. Sporre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stop Layer Through Ion Implantation For Etch Stop
- Publication number 20170148790
- Publication date May 25, 2017
- International Business Machines Corporation
- Hong HE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED HIGH-k GATE STACK PATTERNING AND STRUCTURE CONTAINING A PA...
- Publication number 20080224238
- Publication date Sep 18, 2008
- International Business Machines Corporation
- Siva Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS

Siva Kanakasabapathy

Person

Patents Grantslast 30 patents

Bubble defect reduction

Removing metal contamination from surfaces of a processing chamber

Metal cut patterning and etching to minimize interlayer dielectric...

Removing metal contamination from surfaces of a processing chamber

Metal cut patterning and etching to minimize interlayer dielectric...

Multi-channel overlay metrology

FinFET gate cut after dummy gate removal

Nanosheet single gate (SG) and extra gate (EG) field effect transis...

Metal cut patterning and etching to minimize interlayer dielectric...

Gate cut in RMG

Gate cut in RMG

Gate cut using selective deposition to prevent oxide loss

FinFET gate cut after dummy gate removal

Gate cut in RMG

Gate cut in replacement metal gate process

Gate cut using selective deposition to prevent oxide loss

FinFET gate cut after dummy gate removal

Phase shifted gas delivery for high throughput and cost effectivene...

Stop layer through ion implantation for etch stop

Advanced high-k gate stack patterning and structure containing a pa...

Patents Applicationslast 30 patents

REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER

REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER

REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER

METAL CUT PATTERNING AND ETCHING TO MINIMIZE INTERLAYER DIELECTRIC...

BUBBLE DEFECT REDUCTION

FINFET GATE CUT AFTER DUMMY GATE REMOVAL

GATE CUT IN RMG

GATE CUT IN RMG

NANOSHEET SINGLE GATE (SG) AND EXTRA GATE (EG) FIELD EFFECT TRANSIS...

GATE CUT IN RMG

MULTI-CHANNEL OVERLAY METROLOGY

GATE CUT USING SELECTIVE DEPOSITION TO PREVENT OXIDE LOSS

GATE CUT IN REPLACEMENT METAL GATE PROCESS

STOPLAYER

METAL CUT PATTERNING AND ETCHING TO MINIMIZE INTERLAYER DIELECTRIC...

GATE CUT USING SELECTIVE DEPOSITION TO PREVENT OXIDE LOSS

METAL CUT PATTERNING AND ETCHING TO MINIMIZE INTERLAYER DIELECTRIC...

FINFET GATE CUT AFTER DUMMY GATE REMOVAL

Stop Layer Through Ion Implantation For Etch Stop

ADVANCED HIGH-k GATE STACK PATTERNING AND STRUCTURE CONTAINING A PA...