Sivananda K. Kanakasabapathy

Person

Niskayuna, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide mandrels in patterning
- Patent number 12,183,589
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Structure and process to tuck fin tips self-aligned to gates
- Patent number RE50174
- Issue date Oct 15, 2024
- TESSERA LLC
- Bruce B. Doris
Information Patent Grant
Self aligned pattern formation post spacer etchback in tight pitch...
- Patent number 12,106,963
- Issue date Oct 1, 2024
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamfer-less via integration scheme
- Patent number 11,987,876
- Issue date May 21, 2024
- Lam Research Corporation
- Sivananda Krishnan Kanakasabapathy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming a sacrificial liner for dual channel devices
- Patent number 11,894,462
- Issue date Feb 6, 2024
- Adeia Semiconductor Solutions LLC
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligned pattern formation post spacer etchback in tight pitch...
- Patent number 11,670,510
- Issue date Jun 6, 2023
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned pattern formation for a semiconductor device
- Patent number 11,646,221
- Issue date May 9, 2023
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide mandrels in patterning
- Patent number 11,355,353
- Issue date Jun 7, 2022
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fin cut to prevent replacement gate collapse on STI
- Patent number 11,315,922
- Issue date Apr 26, 2022
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Additive core subtractive liner for metal cut etch processes
- Patent number 11,276,767
- Issue date Mar 15, 2022
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned pattern formation for a semiconductor device
- Patent number 11,227,793
- Issue date Jan 18, 2022
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a sacrificial liner for dual channel devices
- Patent number 11,189,729
- Issue date Nov 30, 2021
- Tessera, Inc.
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Additive core subtractive liner for metal cut etch processes
- Patent number 11,152,489
- Issue date Oct 19, 2021
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures with deep trench capacitor and methods of...
- Patent number 11,145,658
- Issue date Oct 12, 2021
- International Business Machines Corporation
- Kevin K. Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor structures with deep trench capacitor and methods of...
- Patent number 11,107,821
- Issue date Aug 31, 2021
- International Business Machines Corporation
- Kevin K. Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Forming a sacrificial liner for dual channel devices
- Patent number 11,094,824
- Issue date Aug 17, 2021
- Tessera, Inc.
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts for vertical field effect transistors
- Patent number 11,081,566
- Issue date Aug 3, 2021
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Additive core subtractive liner for metal cut etch processes
- Patent number 11,075,281
- Issue date Jul 27, 2021
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures with deep trench capacitor and methods of...
- Patent number 11,056,493
- Issue date Jul 6, 2021
- International Business Machines Corporation
- Kevin K. Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self aligned pattern formation post spacer etchback in tight pitch...
- Patent number 11,018,007
- Issue date May 25, 2021
- Tessera, Inc.
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial oxide fin segments to prevent strained semiconductor fin...
- Patent number 10,957,694
- Issue date Mar 23, 2021
- International Business Machines Corporation
- Karthik Balakrishnan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned quadruple patterning (SAQP) for routing layouts includ...
- Patent number 10,957,583
- Issue date Mar 23, 2021
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal doping for punch through stopper in fin field effect tran...
- Patent number 10,937,867
- Issue date Mar 2, 2021
- International Business Machines Corporation
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilizing multilayer gate spacer to reduce erosion of semiconductor...
- Patent number 10,790,393
- Issue date Sep 29, 2020
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal doping for punch through stopper in fin field effect tran...
- Patent number 10,741,647
- Issue date Aug 11, 2020
- International Business Machines Corporation
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom contact formation for vertical transistor devices
- Patent number 10,727,317
- Issue date Jul 28, 2020
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio gates
- Patent number 10,707,083
- Issue date Jul 7, 2020
- ELPIS TECHNOLOGIES INC.
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low undercut N-P work function metal patterning in nanosheet replac...
- Patent number 10,629,495
- Issue date Apr 21, 2020
- International Business Machines Corporation
- Indira Seshadri
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUSES FOR RADIATIVE HEATING OF AN EDGE REGION OF A SEMICONDUC...
- Publication number 20250125165
- Publication date Apr 17, 2025
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20250087498
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER
- Publication number 20250068065
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...
- Publication number 20250062126
- Publication date Feb 20, 2025
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES
- Publication number 20240363755
- Publication date Oct 31, 2024
- Adeia Semiconductor Solutions LLC
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEV...
- Publication number 20240355650
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUANTUM EFFICIENT PHOTORESISTS AND METHODS THEREOF
- Publication number 20240302739
- Publication date Sep 12, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHAMFER-LESS VIA INTEGRATION SCHEME
- Publication number 20240263301
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...
- Publication number 20240192590
- Publication date Jun 13, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20240145272
- Publication date May 2, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...
- Publication number 20240096627
- Publication date Mar 21, 2024
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS
- Publication number 20230314946
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Eric Calvin Hansen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20230290657
- Publication date Sep 14, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED SELF ALIGNED MULTIPLE PATTERNING USING TIN OXIDE
- Publication number 20230238238
- Publication date Jul 27, 2023
- LAM RESEARCH CORPORATION
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD TO ACHIEVE POSITIVE TONE DRY DEVELOP BY A HERM...
- Publication number 20230152701
- Publication date May 18, 2023
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CORE REMOVAL
- Publication number 20230066676
- Publication date Mar 2, 2023
- LAM RESEARCH CORPORATION
- Sivananda Krishnan KANAKASABAPATHY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20230045336
- Publication date Feb 9, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES
- Publication number 20220069118
- Publication date Mar 3, 2022
- Tessera, Inc.
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...
- Publication number 20210280422
- Publication date Sep 9, 2021
- Tessera, Inc.
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20210265173
- Publication date Aug 26, 2021
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMFER-LESS VIA INTEGRATION SCHEME
- Publication number 20210017643
- Publication date Jan 21, 2021
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACTS FOR VERTICAL FIELD EFFECT TRANSISTORS
- Publication number 20200295156
- Publication date Sep 17, 2020
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Cut to Prevent Replacement Gate Collapse on STI
- Publication number 20200219874
- Publication date Jul 9, 2020
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM CONTACT FORMATION FOR VERTICAL TRANSISTOR DEVICES
- Publication number 20200111895
- Publication date Apr 9, 2020
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES
- Publication number 20200091336
- Publication date Mar 19, 2020
- International Business Machines Corporation
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED PATTERN FORMATION FOR A SEMICONDUCTOR DEVICE
- Publication number 20200090985
- Publication date Mar 19, 2020
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES
- Publication number 20200083364
- Publication date Mar 12, 2020
- International Business Machines Corporation
- Huiming Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE CORE SUBTRACTIVE LINER FOR METAL CUT ETCH PROCESSES
- Publication number 20200083350
- Publication date Mar 12, 2020
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE CORE SUBTRACTIVE LINER FOR METAL CUT ETCH PROCESSES
- Publication number 20200083349
- Publication date Mar 12, 2020
- International Business Machines Corporation
- Ruqiang Bao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...
- Publication number 20200075336
- Publication date Mar 5, 2020
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS

Sivananda K. Kanakasabapathy

Person

Patents Grantslast 30 patents

Integrated dry processes for patterning radiation photoresist patte...

Integrated dry processes for patterning radiation photoresist patte...

Tin oxide mandrels in patterning

Structure and process to tuck fin tips self-aligned to gates

Self aligned pattern formation post spacer etchback in tight pitch...

Chamfer-less via integration scheme

Forming a sacrificial liner for dual channel devices

Self aligned pattern formation post spacer etchback in tight pitch...

Self-aligned pattern formation for a semiconductor device

Tin oxide mandrels in patterning

Fin cut to prevent replacement gate collapse on STI

Additive core subtractive liner for metal cut etch processes

Self-aligned pattern formation for a semiconductor device

Forming a sacrificial liner for dual channel devices

Additive core subtractive liner for metal cut etch processes

Semiconductor structures with deep trench capacitor and methods of...

Semiconductor structures with deep trench capacitor and methods of...

Forming a sacrificial liner for dual channel devices

Self-aligned contacts for vertical field effect transistors

Additive core subtractive liner for metal cut etch processes

Semiconductor structures with deep trench capacitor and methods of...

Self aligned pattern formation post spacer etchback in tight pitch...

Epitaxial oxide fin segments to prevent strained semiconductor fin...

Self-aligned quadruple patterning (SAQP) for routing layouts includ...

Conformal doping for punch through stopper in fin field effect tran...

Utilizing multilayer gate spacer to reduce erosion of semiconductor...

Conformal doping for punch through stopper in fin field effect tran...

Bottom contact formation for vertical transistor devices

High aspect ratio gates

Low undercut N-P work function metal patterning in nanosheet replac...

Patents Applicationslast 30 patents

APPARATUSES FOR RADIATIVE HEATING OF AN EDGE REGION OF A SEMICONDUC...

TIN OXIDE MANDRELS IN PATTERNING

ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER

SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...

FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES

DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEV...

QUANTUM EFFICIENT PHOTORESISTS AND METHODS THEREOF

CHAMFER-LESS VIA INTEGRATION SCHEME

APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...

METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

ADVANCED SELF ALIGNED MULTIPLE PATTERNING USING TIN OXIDE

STRUCTURE AND METHOD TO ACHIEVE POSITIVE TONE DRY DEVELOP BY A HERM...

CORE REMOVAL

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES

SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...

TIN OXIDE MANDRELS IN PATTERNING

CHAMFER-LESS VIA INTEGRATION SCHEME

SELF-ALIGNED CONTACTS FOR VERTICAL FIELD EFFECT TRANSISTORS

Fin Cut to Prevent Replacement Gate Collapse on STI

BOTTOM CONTACT FORMATION FOR VERTICAL TRANSISTOR DEVICES

FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES

SELF-ALIGNED PATTERN FORMATION FOR A SEMICONDUCTOR DEVICE

FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES

ADDITIVE CORE SUBTRACTIVE LINER FOR METAL CUT ETCH PROCESSES

ADDITIVE CORE SUBTRACTIVE LINER FOR METAL CUT ETCH PROCESSES

SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...