So-Wein Kuo

Person

Hsin-Chu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Self aligned channel implant, elevated S/D process by gate electrod...
- Patent number 6,790,756
- Issue date Sep 14, 2004
- Taiwan Semiconductor Manufacturing Company
- Chu-Wei Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligned channel implant, elevated S/D process by gate electrod...
- Patent number 6,583,017
- Issue date Jun 24, 2003
- Taiwan Semiconductor Manufacturing Company
- Chu-Wei Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ photoresist hot bake in loading chamber of dry etch
- Patent number 6,468,918
- Issue date Oct 22, 2002
- Taiwan Semiconductor Manufacturing Company
- So Wein Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligned channel implant, elevated S/D process by gate electrod...
- Patent number 6,287,926
- Issue date Sep 11, 2001
- Taiwan Semiconductor Manufacturing Company
- Chu-Wei Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-shrinkable passivation scheme for metal em improvement
- Patent number 6,228,780
- Issue date May 8, 2001
- Taiwan Semiconductor Manufacturing Company
- So-Wein Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified process for the fabrication of deep clear laser marks us...
- Patent number 6,063,695
- Issue date May 16, 2000
- Taiwan Semiconductor Manufacturing Company
- Chung-Te Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma method for stripping ion implanted photoresist layers
- Patent number 6,024,887
- Issue date Feb 15, 2000
- Taiwan Semiconductor Manufacturing Company
- So-Wen Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple thermal annealing method for a metal oxide semiconductor f...
- Patent number 5,981,347
- Issue date Nov 9, 1999
- Taiwan Semiconductor Manufacturing Company, Ltd.
- So-Wen Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch method for forming residue free fluorine containing pla...
- Patent number 5,872,061
- Issue date Feb 16, 1999
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shing-Long Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reduction of polycide residues
- Patent number 5,854,137
- Issue date Dec 29, 1998
- Taiwan Semiconductor Manufacturing Company, Ltd.
- So Wein Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for CMP cleaning improvement
- Patent number 5,709,755
- Issue date Jan 20, 1998
- Taiwan Semiconductor Manufacturing Company, Ltd.
- So Wein Kuo
- B08 - CLEANING
Information Patent Grant
Method of maintaining a strong endpoint detection signal for RIE pr...
- Patent number 5,679,214
- Issue date Oct 21, 1997
- Taiwan Semiconductor Manufacturing Company, Ltd.
- So Wen Kuo
- B08 - CLEANING
Information Patent Grant
Method for reducing contact resistance
- Patent number 5,670,426
- Issue date Sep 23, 1997
- Taiwan Semiconductor Manufacturing Company Ltd.
- So Wen Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for contact profile improvement
- Patent number 5,661,084
- Issue date Aug 26, 1997
- Taiwan Semiconductor Manufacturing Company, Ltd.
- So Wein Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buried contact oxide etch with poly mask procedure
- Patent number 5,563,098
- Issue date Oct 8, 1996
- Taiwan Semiconductor Manufacturing Company
- So-Wen Kuo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Novel self aligned channel implant, elevated S/D process by gate el...
- Publication number 20030170957
- Publication date Sep 11, 2003
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chu-Wei Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel self aligned channel implant, elevated S/D process by gate el...
- Publication number 20020182814
- Publication date Dec 5, 2002
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chu-Wei Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel self aligned channel implant, elevated S/D process by gate el...
- Publication number 20020182815
- Publication date Dec 5, 2002
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chu-Wei Hu
- H01 - BASIC ELECTRIC ELEMENTS

So-Wein Kuo

Person

Patents Grantslast 30 patents

Self aligned channel implant, elevated S/D process by gate electrod...

Self aligned channel implant, elevated S/D process by gate electrod...

In situ photoresist hot bake in loading chamber of dry etch

Self aligned channel implant, elevated S/D process by gate electrod...

Non-shrinkable passivation scheme for metal em improvement

Simplified process for the fabrication of deep clear laser marks us...

Plasma method for stripping ion implanted photoresist layers

Multiple thermal annealing method for a metal oxide semiconductor f...

Plasma etch method for forming residue free fluorine containing pla...

Method for reduction of polycide residues

Method for CMP cleaning improvement

Method of maintaining a strong endpoint detection signal for RIE pr...

Method for reducing contact resistance

Method for contact profile improvement

Buried contact oxide etch with poly mask procedure

Patents Applicationslast 30 patents

Novel self aligned channel implant, elevated S/D process by gate el...

Novel self aligned channel implant, elevated S/D process by gate el...

Novel self aligned channel implant, elevated S/D process by gate el...