Soichi Inoue

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming method
- Patent number 10,811,252
- Issue date Oct 20, 2020
- TOSHIBA MEMORY CORPORATION
- Ryosuke Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method for manufacturing same
- Patent number 9,922,991
- Issue date Mar 20, 2018
- TOSHIBA MEMORY CORPORATION
- Tetsuya Kamigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern shape determining method, pattern shape verifying method, a...
- Patent number 8,885,949
- Issue date Nov 11, 2014
- Kabushiki Kaisha Toshiba
- Shigeki Nojima
- G01 - MEASURING TESTING
Information Patent Grant
Exposing method and method of manufacturing semiconductor device
- Patent number 8,654,313
- Issue date Feb 18, 2014
- Kabushiki Kaisha Toshiba
- Masanori Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure determining method, method of manufacturing semiconductor...
- Patent number 8,440,376
- Issue date May 14, 2013
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making a design layout of a semiconductor integrated cir...
- Patent number RE43659
- Issue date Sep 11, 2012
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- 716 - Computer-aided design and analysis of circuits and semiconductor masks
Information Patent Grant
Pattern layout creation method, program product, and semiconductor...
- Patent number 8,261,214
- Issue date Sep 4, 2012
- Kabushiki Kaisha Toshiba
- Shimon Maeda
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Semiconductor device fabrication method using multiple mask patterns
- Patent number 8,183,119
- Issue date May 22, 2012
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device fabrication method and semiconductor device
- Patent number 8,163,611
- Issue date Apr 24, 2012
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device fabrication method using multiple resist patterns
- Patent number 8,158,527
- Issue date Apr 17, 2012
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correcting method, mask pattern inspecting method, pho...
- Patent number 8,142,961
- Issue date Mar 27, 2012
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask pattern verifying method
- Patent number 8,121,387
- Issue date Feb 21, 2012
- Kabushiki Kaisha Toshiba
- Mitsuyo Asano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern management method and pattern management program
- Patent number 8,086,973
- Issue date Dec 27, 2011
- Kabushiki Kaisha Toshiba
- Kenji Yoshida
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for correcting a mask pattern, system for correcting a mask...
- Patent number 8,046,722
- Issue date Oct 25, 2011
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-producing method for semiconductor device
- Patent number 7,966,584
- Issue date Jun 21, 2011
- Kabushiki Kaisha Toshiba
- Suigen Kyoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parameter adjustment method, semiconductor device manufacturing met...
- Patent number 7,934,175
- Issue date Apr 26, 2011
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making a design layout and mask
- Patent number RE42302
- Issue date Apr 19, 2011
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- 716 - Computer-aided design and analysis of circuits and semiconductor masks
Information Patent Grant
Semiconductor integrated circuit designing method and system using...
- Patent number RE42294
- Issue date Apr 12, 2011
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- 716 - Computer-aided design and analysis of circuits and semiconductor masks
Information Patent Grant
Semiconductor device fabrication method and semiconductor device
- Patent number 7,824,996
- Issue date Nov 2, 2010
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect inspection computer program product
- Patent number 7,821,628
- Issue date Oct 26, 2010
- Kabushiki Kaisha Toshiba
- Shinji Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correcting method, mask pattern inspecting method, pho...
- Patent number 7,794,897
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern data correction method, pattern checking method, pattern ch...
- Patent number 7,788,626
- Issue date Aug 31, 2010
- Kabushiki Kaisha Toshiba
- Shigeki Nojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light intensity distribution simulation method and computer program...
- Patent number 7,596,776
- Issue date Sep 29, 2009
- Kabushiki Kaisha Toshiba
- Satoshi Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for forming a mask pattern, method of manufacturi...
- Patent number 7,594,216
- Issue date Sep 22, 2009
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and photomask
- Patent number 7,556,896
- Issue date Jul 7, 2009
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, manufacturing method for mask, and manufacturing method for s...
- Patent number 7,541,136
- Issue date Jun 2, 2009
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design pattern data preparing method, mask pattern data preparing m...
- Patent number 7,526,748
- Issue date Apr 28, 2009
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-producing method for semiconductor device
- Patent number 7,523,437
- Issue date Apr 21, 2009
- Kabushiki Kaisha Toshiba
- Suigen Kyoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting a mask pattern, system for correcting a mask...
- Patent number 7,506,301
- Issue date Mar 17, 2009
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for inspecting a defect in a photomask, method for manufactu...
- Patent number 7,499,582
- Issue date Mar 3, 2009
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MEASUREMENT APPARATUS AND MEASUREMENT METHOD
- Publication number 20230251582
- Publication date Aug 10, 2023
- KIOXIA Corporation
- Kentaro KASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20190259606
- Publication date Aug 22, 2019
- Toshiba Memory Corporation
- Ryosuke YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20170271363
- Publication date Sep 21, 2017
- KABUSHIKI KAISHA TOSHIBA
- Tetsuya Kamigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN SHAPE DETERMINING METHOD, PATTERN SHAPE VERIFYING METHOD, A...
- Publication number 20120076424
- Publication date Mar 29, 2012
- Shigeki NOJIMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE DETERMINING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20110177458
- Publication date Jul 21, 2011
- Toshiya KOTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND...
- Publication number 20110122390
- Publication date May 26, 2011
- Masanori TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE FABRICATION METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20110086512
- Publication date Apr 14, 2011
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN GENERATING METHOD, MANUFACTURING METHOD OF MASK, AND MANUFA...
- Publication number 20110065028
- Publication date Mar 17, 2011
- Katsuyoshi KODERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN EVALUATING METHOD, PATTERN GENERATING METHOD, AND COMPUTER...
- Publication number 20110029937
- Publication date Feb 3, 2011
- Katsuyoshi KODERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20100261121
- Publication date Oct 14, 2010
- Masanori TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN CORRECTING APPARATUS, MASK-PATTERN FORMING METHOD, AND METH...
- Publication number 20100233598
- Publication date Sep 16, 2010
- Tetsuaki MATSUNAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE FABRICATION METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20100196809
- Publication date Aug 5, 2010
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE FABRICATION METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20100196829
- Publication date Aug 5, 2010
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN LAYOUT CREATION METHOD, PROGRAM PRODUCT, AND SEMICONDUCTOR...
- Publication number 20100191357
- Publication date Jul 29, 2010
- Shimon Maeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK PATTERN CORRECTING METHOD, MASK PATTERN INSPECTING METHOD, PHO...
- Publication number 20100159709
- Publication date Jun 24, 2010
- Kabushiki Kaisha Toshiba
- Toshiya KOTANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EVALUATION PATTERN GENERATING METHOD, COMPUTER PROGRAM PRODUCT, AND...
- Publication number 20100067777
- Publication date Mar 18, 2010
- Katsuyoshi Kodera
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AN...
- Publication number 20090233189
- Publication date Sep 17, 2009
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern-producing method for semiconductor device
- Publication number 20090199148
- Publication date Aug 6, 2009
- Kabushiki Kaisha Toshiba
- Suigen Kyoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for correcting a mask pattern, system for correcting a mask...
- Publication number 20090186429
- Publication date Jul 23, 2009
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PATTERN FORMATION METHOD, MASK PATTERN FORMATION APPARATUS, AN...
- Publication number 20090031262
- Publication date Jan 29, 2009
- Shimon Maeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF INSPECTING EXPOSURE SYSTEM AND EXPOSURE SYSTEM
- Publication number 20090021711
- Publication date Jan 22, 2009
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD USING TWO LAYERS OF RESIST PATTERNS STACKED...
- Publication number 20090011370
- Publication date Jan 8, 2009
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARAMETER ADJUSTMENT METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MET...
- Publication number 20080250381
- Publication date Oct 9, 2008
- Toshiya KOTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PATTERN VERIFYING METHOD
- Publication number 20080232671
- Publication date Sep 25, 2008
- Mitsuyo ASANO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN MANAGEMENT METHOD AND PATTERN MANAGEMENT PROGRAM
- Publication number 20080216046
- Publication date Sep 4, 2008
- Kenji YOSHIDA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask defect inspecting method, semiconductor device manufacturing m...
- Publication number 20080072208
- Publication date Mar 20, 2008
- Kabushiki Kaisha Toshiba
- Shinji Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, exposure control method and method of manufacturing a se...
- Publication number 20070259280
- Publication date Nov 8, 2007
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus inspection method and exposure apparatus
- Publication number 20070236691
- Publication date Oct 11, 2007
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Light intensity distribution simulation method and computer program...
- Publication number 20070234269
- Publication date Oct 4, 2007
- Satoshi Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Wafer flatness evaluation method, wafer flatness evaluation apparat...
- Publication number 20070177126
- Publication date Aug 2, 2007
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G01 - MEASURING TESTING

Soichi Inoue

Person

Patents Grantslast 30 patents

Pattern-forming method

Semiconductor memory device and method for manufacturing same

Pattern shape determining method, pattern shape verifying method, a...

Exposing method and method of manufacturing semiconductor device

Exposure determining method, method of manufacturing semiconductor...

Method for making a design layout of a semiconductor integrated cir...

Pattern layout creation method, program product, and semiconductor...

Semiconductor device fabrication method using multiple mask patterns

Semiconductor device fabrication method and semiconductor device

Semiconductor device fabrication method using multiple resist patterns

Mask pattern correcting method, mask pattern inspecting method, pho...

Mask pattern verifying method

Pattern management method and pattern management program

Method for correcting a mask pattern, system for correcting a mask...

Pattern-producing method for semiconductor device

Parameter adjustment method, semiconductor device manufacturing met...

Method for making a design layout and mask

Semiconductor integrated circuit designing method and system using...

Semiconductor device fabrication method and semiconductor device

Mask defect inspection computer program product

Mask pattern correcting method, mask pattern inspecting method, pho...

Pattern data correction method, pattern checking method, pattern ch...

Light intensity distribution simulation method and computer program...

Method and system for forming a mask pattern, method of manufacturi...

Inspection method and photomask

Mask, manufacturing method for mask, and manufacturing method for s...

Design pattern data preparing method, mask pattern data preparing m...

Pattern-producing method for semiconductor device

Method for correcting a mask pattern, system for correcting a mask...

Method for inspecting a defect in a photomask, method for manufactu...

Patents Applicationslast 30 patents

MEASUREMENT APPARATUS AND MEASUREMENT METHOD

PATTERN-FORMING METHOD

SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME

PATTERN SHAPE DETERMINING METHOD, PATTERN SHAPE VERIFYING METHOD, A...

EXPOSURE DETERMINING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

EXPOSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND...

SEMICONDUCTOR DEVICE FABRICATION METHOD AND SEMICONDUCTOR DEVICE

PATTERN GENERATING METHOD, MANUFACTURING METHOD OF MASK, AND MANUFA...

PATTERN EVALUATING METHOD, PATTERN GENERATING METHOD, AND COMPUTER...

PATTERN FORMING METHOD

PATTERN CORRECTING APPARATUS, MASK-PATTERN FORMING METHOD, AND METH...

SEMICONDUCTOR DEVICE FABRICATION METHOD AND SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE FABRICATION METHOD AND SEMICONDUCTOR DEVICE

PATTERN LAYOUT CREATION METHOD, PROGRAM PRODUCT, AND SEMICONDUCTOR...

MASK PATTERN CORRECTING METHOD, MASK PATTERN INSPECTING METHOD, PHO...

EVALUATION PATTERN GENERATING METHOD, COMPUTER PROGRAM PRODUCT, AND...

DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AN...

Pattern-producing method for semiconductor device

Method for correcting a mask pattern, system for correcting a mask...

MASK PATTERN FORMATION METHOD, MASK PATTERN FORMATION APPARATUS, AN...

METHOD OF INSPECTING EXPOSURE SYSTEM AND EXPOSURE SYSTEM

PATTERN FORMING METHOD USING TWO LAYERS OF RESIST PATTERNS STACKED...

PARAMETER ADJUSTMENT METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MET...

MASK PATTERN VERIFYING METHOD

PATTERN MANAGEMENT METHOD AND PATTERN MANAGEMENT PROGRAM

Mask defect inspecting method, semiconductor device manufacturing m...

Photomask, exposure control method and method of manufacturing a se...

Exposure apparatus inspection method and exposure apparatus

Light intensity distribution simulation method and computer program...

Wafer flatness evaluation method, wafer flatness evaluation apparat...