Soichiro Arai

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,646,275
- Issue date Nov 11, 2003
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,486,479
- Issue date Nov 26, 2002
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 6,188,074
- Issue date Feb 13, 2001
- Advantest Corporation
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for exposing an exposure pattern on an object by...
- Patent number 6,118,129
- Issue date Sep 12, 2000
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and method capable of high-sp...
- Patent number 6,072,185
- Issue date Jun 6, 2000
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam exposure system and method
- Patent number 6,064,807
- Issue date May 16, 2000
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 6,057,907
- Issue date May 2, 2000
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,977,548
- Issue date Nov 2, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of providing changed particle beam exposure in which represe...
- Patent number 5,965,895
- Issue date Oct 12, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system
- Patent number 5,920,077
- Issue date Jul 6, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for changed particle beam exposure
- Patent number 5,910,658
- Issue date Jun 8, 1999
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 5,866,300
- Issue date Feb 2, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 5,841,145
- Issue date Nov 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,721,432
- Issue date Feb 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,719,402
- Issue date Feb 17, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,614,725
- Issue date Mar 25, 1997
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,546,319
- Issue date Aug 13, 1996
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,528,048
- Issue date Jun 18, 1996
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure apparatus and method of cleaning the...
- Patent number 5,401,974
- Issue date Mar 28, 1995
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam exposure method
- Patent number 5,399,872
- Issue date Mar 21, 1995
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure method and system for exposing a pattern on...
- Patent number 5,369,282
- Issue date Nov 29, 1994
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Charged particle beam exposure system and method
- Publication number 20030025088
- Publication date Feb 6, 2003
- FUJITSU LIMITED
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY

Soichiro Arai

Person

Patents Grantslast 30 patents

Charged particle beam exposure system and method

Charged particle beam exposure system and method

Charged particle beam exposure apparatus

Method and system for exposing an exposure pattern on an object by...

Charged-particle-beam exposure device and method capable of high-sp...

Charged-particle beam exposure system and method

Method of and system for exposing pattern on object by charged part...

Charged particle beam exposure system and method

Method of providing changed particle beam exposure in which represe...

Charged particle beam exposure system

Method and system for changed particle beam exposure

Method of and system for exposing pattern on object by charged part...

Method of and system for exposing pattern on object by charged part...

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Charged particle beam exposure system and method

Method of and system for charged particle beam exposure

Charged particle beam exposure system and method

Charged particle beam exposure apparatus and method of cleaning the...

Charged-particle beam exposure method

Electron beam exposure method and system for exposing a pattern on...

Patents Applicationslast 30 patents

Charged particle beam exposure system and method