Soichiro OKADA

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate treatment method and substrate treatment system
- Patent number 12,197,129
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Satoru Shimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask forming method
- Patent number 11,205,571
- Issue date Dec 21, 2021
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing target object
- Patent number 9,911,621
- Issue date Mar 6, 2018
- Tokyo Electron Limited
- Toshikatsu Tobana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method, computer storage medium, and substrate...
- Patent number 9,748,101
- Issue date Aug 29, 2017
- Tokyo Electron Limited
- Makoto Muramatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid processing apparatus, liquid processing method, and storage...
- Patent number 9,165,797
- Issue date Oct 20, 2015
- Tokyo Electron Limited
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240295821
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Hiroyuki Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...
- Publication number 20240288775
- Publication date Aug 29, 2024
- Tokyo Electron Limited
- Soichiro OKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM
- Publication number 20210318618
- Publication date Oct 14, 2021
- Tokyo Electron Limited
- Satoru SHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK FORMING METHOD
- Publication number 20200090927
- Publication date Mar 19, 2020
- TOKYO ELECTRON LIMITED
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PROCESSING TARGET OBJECT
- Publication number 20170148641
- Publication date May 25, 2017
- TOKYO ELECTRON LIMITED
- Toshikatsu TOBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE...
- Publication number 20150255271
- Publication date Sep 10, 2015
- TOKYO ELECTRON LIMITED
- Makoto Muramatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...
- Publication number 20130189852
- Publication date Jul 25, 2013
- TOKYO ELECTRON LIMITED
- Kousuke Yoshihara
- H01 - BASIC ELECTRIC ELEMENTS

Soichiro OKADA

Person

Patents Grantslast 30 patents

Substrate treatment method and substrate treatment system

Mask forming method

Method for processing target object

Substrate treatment method, computer storage medium, and substrate...

Liquid processing apparatus, liquid processing method, and storage...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM

MASK FORMING METHOD

METHOD FOR PROCESSING TARGET OBJECT

SUBSTRATE TREATMENT METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE...

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...