Song GUO

Person

Jiangsu, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Rotatable faraday cleaning apparatus and plasma processing system
- Patent number 12,009,188
- Issue date Jun 11, 2024
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang Liu
- B08 - CLEANING
Information Patent Grant
Device for blocking plasma backflow in process chamber to protect a...
- Patent number 11,955,323
- Issue date Apr 9, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma treatment system
- Patent number 11,837,439
- Issue date Dec 5, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faraday cleaning device and plasma processing system
- Patent number 11,735,400
- Issue date Aug 22, 2023
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang Liu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HANDOVER PROCESSING METHOD AND APPARATUS, AND COMMUNICATION DEVICE
- Publication number 20230403611
- Publication date Dec 14, 2023
- CHINA MOBILE COMMUNICATION CO., LTD RESEARCH INSTITUTE
- Yuexia FU
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE T...
- Publication number 20230326709
- Publication date Oct 12, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM AND MULTI-SECTION FARADAY SHIELDING DEVICE...
- Publication number 20230274918
- Publication date Aug 31, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW
- Publication number 20230238218
- Publication date Jul 27, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...
- Publication number 20230207284
- Publication date Jun 29, 2023
- BEIJING LEUVEN SEMICONDUCTOR TECHNOLOGY CO. LTD
- Song GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-BREAKDOWN ION SOURCE DISCHARGE APPARATUS
- Publication number 20230207260
- Publication date Jun 29, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...
- Publication number 20230207283
- Publication date Jun 29, 2023
- BEIJING LEUVEN SEMICONDUCTOR TECHNOLOGY CO. LTD
- Song GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FARADAY CLEANING DEVICE AND PLASMA PROCESSING SYSTEM
- Publication number 20220375733
- Publication date Nov 24, 2022
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEM
- Publication number 20220319816
- Publication date Oct 6, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATABLE FARADAY CLEANING APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20220297168
- Publication date Sep 22, 2022
- JIANGSU LEUVEN INSTRUMENTS CO., LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR BLOCKING PLASMA BACKFLOW IN PROCESS CHAMBER TO PROTECT A...
- Publication number 20220254615
- Publication date Aug 11, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA TREATMENT SYSTEM
- Publication number 20220254604
- Publication date Aug 11, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Rotatable faraday cleaning apparatus and plasma processing system

Device for blocking plasma backflow in process chamber to protect a...

Inductively coupled plasma treatment system

Faraday cleaning device and plasma processing system

Patents Applicationslast 30 patents

HANDOVER PROCESSING METHOD AND APPARATUS, AND COMMUNICATION DEVICE

ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE T...

PLASMA PROCESSING SYSTEM AND MULTI-SECTION FARADAY SHIELDING DEVICE...

SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW

PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...

ANTI-BREAKDOWN ION SOURCE DISCHARGE APPARATUS

PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...

FARADAY CLEANING DEVICE AND PLASMA PROCESSING SYSTEM

PLASMA ETCHING SYSTEM

ROTATABLE FARADAY CLEANING APPARATUS AND PLASMA PROCESSING SYSTEM

DEVICE FOR BLOCKING PLASMA BACKFLOW IN PROCESS CHAMBER TO PROTECT A...

INDUCTIVELY COUPLED PLASMA TREATMENT SYSTEM