Songlin XU

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Patents Grantslast 30 patents

Information Patent Grant
ICP source design for plasma uniformity and efficiency enhancement
- Patent number 9,431,216
- Issue date Aug 30, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ICP source design for plasma uniformity and efficiency enhancement
- Patent number 9,095,038
- Issue date Jul 28, 2015
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Shi Gang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
- Publication number 20160322205
- Publication date Nov 3, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
- Publication number 20140120731
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE FOR A VACUUM PROCESSING CHAMBER, METHOD OF GAS SU...
- Publication number 20140083613
- Publication date Mar 27, 2014
- Songlin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
- Publication number 20140083453
- Publication date Mar 27, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Zheyao Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
- Publication number 20130102155
- Publication date Apr 25, 2013
- Shi GANG
- H01 - BASIC ELECTRIC ELEMENTS