Sonja Schneider

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 12,025,818
- Issue date Jul 2, 2024
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection exposure system for semiconductor lithography having an...
- Patent number 11,415,894
- Issue date Aug 16, 2022
- Carl Zeiss SMT GmbH
- Judith Fingerhuth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 11,112,543
- Issue date Sep 7, 2021
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Imaging optical system for microlithography
- Patent number 10,754,132
- Issue date Aug 25, 2020
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G02 - OPTICS
Information Patent Grant
Projection lens, projection exposure apparatus and projection expos...
- Patent number 10,591,825
- Issue date Mar 17, 2020
- Carl Zeiss SMT GmbH
- Stephan Andre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 10,401,540
- Issue date Sep 3, 2019
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Projection lens with wave front manipulator and related method and...
- Patent number 10,061,206
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Projection lens, projection exposure apparatus and projection expos...
- Patent number 10,048,592
- Issue date Aug 14, 2018
- Carl Zeiss SMT GmbH
- Stephan Andre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a microlithographic projection apparatus
- Patent number 10,018,907
- Issue date Jul 10, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens for EUV microlithography, film element and method f...
- Patent number 10,001,631
- Issue date Jun 19, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Optical assembly
- Patent number 9,939,730
- Issue date Apr 10, 2018
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus including at least one mirror
- Patent number 9,910,364
- Issue date Mar 6, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System correction from long timescales
- Patent number 9,829,800
- Issue date Nov 28, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 9,817,316
- Issue date Nov 14, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror arrangement for an EUV projection exposure apparatus, method...
- Patent number 9,709,770
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element
- Patent number 9,470,872
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G01 - MEASURING TESTING
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 9,372,411
- Issue date Jun 21, 2016
- Carl Zeiss SMT GmbH
- Johannes Zellner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic apparatus
- Patent number 9,348,234
- Issue date May 24, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination and displacement device for a projection exposure appa...
- Patent number 9,134,613
- Issue date Sep 15, 2015
- Carl Zeiss SMT GmbH
- Sonja Schneider
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for microlithography, projection exposure appa...
- Patent number 8,228,483
- Issue date Jul 24, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR...
- Publication number 20230138850
- Publication date May 4, 2023
- Carl Zeiss SMT GMBH
- Johannes Kimling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20210364677
- Publication date Nov 25, 2021
- Carl Zeiss SMT GMBH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY HAVING AN...
- Publication number 20210349399
- Publication date Nov 11, 2021
- Carl Zeiss SMT GMBH
- Judith Fingerhuth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20190377107
- Publication date Dec 12, 2019
- Carl Zeiss SMT GMBH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Projection Lens, Projection Exposure Apparatus and Projection Expos...
- Publication number 20180364583
- Publication date Dec 20, 2018
- Carl Zeiss SMT GMBH
- Stephan Andre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20180136565
- Publication date May 17, 2018
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS WITH WAVE FRONT MANIPULATOR AND RELATED METHOD AND...
- Publication number 20180081281
- Publication date Mar 22, 2018
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20170261730
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOS...
- Publication number 20170168399
- Publication date Jun 15, 2017
- Carl Zeiss SMT GMBH
- Stephan Andre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20170123118
- Publication date May 4, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS INCLUDING AT LEAST ONE MIRROR
- Publication number 20170115576
- Publication date Apr 27, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20160209754
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...
- Publication number 20160161852
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Karl-Heinz SCHUSTER
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY
- Publication number 20160091798
- Publication date Mar 31, 2016
- Carl Zeiss SMT GMBH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC APPARATUS
- Publication number 20160011521
- Publication date Jan 14, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...
- Publication number 20150168674
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
SYSTEM CORRECTION FROM LONG TIMESCALES
- Publication number 20150160562
- Publication date Jun 11, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Optical Element
- Publication number 20150116703
- Publication date Apr 30, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20140347721
- Publication date Nov 27, 2014
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION AND DISPLACEMENT DEVICE FOR A PROJECTION EXPOSURE APPA...
- Publication number 20140239192
- Publication date Aug 28, 2014
- Sonja Schneider
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20140185024
- Publication date Jul 3, 2014
- Johannes Zellner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Imaging Optical System for Microlithography
- Publication number 20130188246
- Publication date Jul 25, 2013
- Carl Zeiss SMT GMBH
- Olaf Rogalsky
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...
- Publication number 20100195070
- Publication date Aug 5, 2010
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sonja Schneider

Person

Patents Grantslast 30 patents

Optical element having a coating for influencing heating radiation...

Projection exposure system for semiconductor lithography having an...

Optical element having a coating for influencing heating radiation...

Imaging optical system for microlithography

Projection lens, projection exposure apparatus and projection expos...

Optical element having a coating for influencing heating radiation...

Projection lens with wave front manipulator and related method and...

Projection lens, projection exposure apparatus and projection expos...

Method of operating a microlithographic projection apparatus

Projection lens for EUV microlithography, film element and method f...

Optical assembly

Projection exposure apparatus including at least one mirror

System correction from long timescales

Projection exposure method and projection exposure apparatus for mi...

Mirror arrangement for an EUV projection exposure apparatus, method...

Reflective optical element

Projection objective of a microlithographic projection exposure app...

Microlithographic apparatus

Illumination and displacement device for a projection exposure appa...

Projection objective for microlithography, projection exposure appa...

Patents Applicationslast 30 patents

OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR...

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...

PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY HAVING AN...

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...

Projection Lens, Projection Exposure Apparatus and Projection Expos...

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

PROJECTION LENS WITH WAVE FRONT MANIPULATOR AND RELATED METHOD AND...

Projection Lens for EUV Microlithography, Film Element and Method f...

PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOS...

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...

PROJECTION EXPOSURE APPARATUS INCLUDING AT LEAST ONE MIRROR

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...

OPTICAL ASSEMBLY

MICROLITHOGRAPHIC APPARATUS

MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...

SYSTEM CORRECTION FROM LONG TIMESCALES

Reflective Optical Element

Projection Lens for EUV Microlithography, Film Element and Method f...

ILLUMINATION AND DISPLACEMENT DEVICE FOR A PROJECTION EXPOSURE APPA...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

Imaging Optical System for Microlithography

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...