SookMee LAI

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Kakegawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive material
- Patent number 9,012,126
- Issue date Apr 21, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working thick film photoresist
- Patent number 8,906,594
- Issue date Dec 9, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive material
- Patent number 8,841,062
- Issue date Sep 23, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20140154624
- Publication date Jun 5, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE MATERIAL
- Publication number 20130337380
- Publication date Dec 19, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-WORKING THICK FILM PHOTORESIST
- Publication number 20130337381
- Publication date Dec 19, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Chunwei CHEN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...