Sosuke OSAWA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing film
- Patent number 11,745,216
- Issue date Sep 5, 2023
- JSR Corporation
- Ryo Kumegawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Negative resist pattern-forming method, and composition for upper l...
- Patent number 11,687,003
- Issue date Jun 27, 2023
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition and method of forming resist pattern
- Patent number 11,603,459
- Issue date Mar 14, 2023
- JSR Corporation
- Tomohiko Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production method of composition for resist top coat layer, method...
- Patent number 11,340,528
- Issue date May 24, 2022
- JSR Corporation
- Sosuke Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition and method of forming resist pattern
- Patent number 11,130,856
- Issue date Sep 28, 2021
- JSR Corporation
- Tomohiko Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist pattern-forming method, and composition for upper l...
- Patent number 10,073,344
- Issue date Sep 11, 2018
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...
- Publication number 20230259032
- Publication date Aug 17, 2023
- JSR Corporation
- Miki TAMADA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...
- Publication number 20230203229
- Publication date Jun 29, 2023
- JSR Corporation
- Miki TAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...
- Publication number 20230103682
- Publication date Apr 6, 2023
- JSR Corporation
- Kazuki KASAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING FILM
- Publication number 20230027151
- Publication date Jan 26, 2023
- JSR Corporation
- Ryo KUMEGAWA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210388197
- Publication date Dec 16, 2021
- JSR Corporation
- Tomohiko SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRODUCTION METHOD OF COMPOSITION FOR RESIST TOP COAT LAYER, METHOD...
- Publication number 20210181630
- Publication date Jun 17, 2021
- JSR Corporation
- Sosuke OSAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190249000
- Publication date Aug 15, 2019
- JSR Corporation
- Tomohiko SAKURAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER L...
- Publication number 20190004426
- Publication date Jan 3, 2019
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER L...
- Publication number 20160299432
- Publication date Oct 13, 2016
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sosuke OSAWA

Person

Patents Grantslast 30 patents

Method for producing film

Negative resist pattern-forming method, and composition for upper l...

Resin composition and method of forming resist pattern

Production method of composition for resist top coat layer, method...

Resin composition and method of forming resist pattern

Negative resist pattern-forming method, and composition for upper l...

Patents Applicationslast 30 patents

COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...

COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...

METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...

METHOD FOR PRODUCING FILM

RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN

PRODUCTION METHOD OF COMPOSITION FOR RESIST TOP COAT LAYER, METHOD...

RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN

NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER L...

NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER L...