Sou Kamimura

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 10,248,019
- Issue date Apr 2, 2019
- FUJIFILM Corporation
- Shohei Kataoka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 10,126,653
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,897,922
- Issue date Feb 20, 2018
- Fujifilm Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and actinic-ray- or radiation-sensitive resi...
- Patent number 9,760,003
- Issue date Sep 12, 2017
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,709,892
- Issue date Jul 18, 2017
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 9,551,935
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,513,547
- Issue date Dec 6, 2016
- FUJIFILM Corporation
- Sou Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,482,958
- Issue date Nov 1, 2016
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,223,219
- Issue date Dec 29, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,128,376
- Issue date Sep 8, 2015
- FUJIFILM Corporation
- Keita Kato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 9,116,437
- Issue date Aug 25, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,097,973
- Issue date Aug 4, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,621
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 8,871,642
- Issue date Oct 28, 2014
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative pattern forming method and resist pattern
- Patent number 8,859,192
- Issue date Oct 14, 2014
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, pattern, chemical amplification resist comp...
- Patent number 8,808,965
- Issue date Aug 19, 2014
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,753,802
- Issue date Jun 17, 2014
- FUJIFILM Corporation
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method using developer containing organic solvent a...
- Patent number 8,709,704
- Issue date Apr 29, 2014
- FUJIFILM Corporation
- Sou Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern
- Patent number 8,663,907
- Issue date Mar 4, 2014
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, pattern forming method using the compo...
- Patent number 8,507,174
- Issue date Aug 13, 2013
- FUJIFILM Corporation
- Hidenori Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition containing novel sulfonium compound, pattern-for...
- Patent number 8,110,333
- Issue date Feb 7, 2012
- FUJIFILM Corporation
- Sou Kamimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 8,092,976
- Issue date Jan 10, 2012
- FUJIFILM Corporation
- Sou Kamimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 7,718,344
- Issue date May 18, 2010
- FUJIFILM Corporation
- Sou Kamimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and pattern-forming method using same
- Patent number 7,695,892
- Issue date Apr 13, 2010
- FUJIFILM Corporation
- Sou Kamimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern formation method using the...
- Patent number 7,615,330
- Issue date Nov 10, 2009
- FUJIFILM Corporation
- Sou Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...
- Publication number 20220252985
- Publication date Aug 11, 2022
- FUJIFILM CORPORATION
- Toshiaki FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20170102618
- Publication date Apr 13, 2017
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20160349620
- Publication date Dec 1, 2016
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHTRAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION...
- Publication number 20160223905
- Publication date Aug 4, 2016
- FUJIFILM CORPORATION
- Keiyu OU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20160004156
- Publication date Jan 7, 2016
- FUJIFILM CORPORATION
- Shinichi SUGIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20150293454
- Publication date Oct 15, 2015
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150147699
- Publication date May 28, 2015
- FUJIFILM CORPORATION
- Sou KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140248556
- Publication date Sep 4, 2014
- FUJIFILM CORPORATION
- Keita KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20140127629
- Publication date May 8, 2014
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PATTERN FORMING METHOD AND RESIST PATTERN
- Publication number 20130266777
- Publication date Oct 10, 2013
- Keita KATO
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20130122427
- Publication date May 16, 2013
- FUJIFILM CORPORATION
- Shohei KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20130113082
- Publication date May 9, 2013
- FUJIFILM Corporation
- Yuichiro Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20130101812
- Publication date Apr 25, 2013
- FUJIFILM CORPORATION
- Sou Kamimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130045365
- Publication date Feb 21, 2013
- FUJIFILM CORPORATION
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN...
- Publication number 20130040096
- Publication date Feb 14, 2013
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20130017377
- Publication date Jan 17, 2013
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20130011785
- Publication date Jan 10, 2013
- FUJIFILM Corporation
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20120322007
- Publication date Dec 20, 2012
- FUJIFILM CORPORATION
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20120321855
- Publication date Dec 20, 2012
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMP...
- Publication number 20120288691
- Publication date Nov 15, 2012
- FUJIFILM CORPORATION
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20120282548
- Publication date Nov 8, 2012
- FUJIFILM CORPORATION
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20120148957
- Publication date Jun 14, 2012
- FUJIFILM CORPORATION
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20120058427
- Publication date Mar 8, 2012
- FUJIFILM CORPORATION
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20120052449
- Publication date Mar 1, 2012
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN...
- Publication number 20120028196
- Publication date Feb 2, 2012
- FUJIFILM CORPORATION
- Sou KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20120003591
- Publication date Jan 5, 2012
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR NEGATIVE-TONE DEVELOPMENT AND PATTERN FORMIN...
- Publication number 20110311914
- Publication date Dec 22, 2011
- FUJIFILM CORPORATION
- Sou Kamimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT A...
- Publication number 20110229832
- Publication date Sep 22, 2011
- FUJIFILM CORPORATION
- Sou Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPO...
- Publication number 20110183258
- Publication date Jul 28, 2011
- FUJIFILM CORPORATION
- Hidenori Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSI...
- Publication number 20100028803
- Publication date Feb 4, 2010
- FUJIFILM CORPORATION
- Naoya SUGIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sou Kamimura

Person

Patents Grantslast 30 patents

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method and resist composition

Method of forming pattern and developer for use in the method

Pattern forming method and actinic-ray- or radiation-sensitive resi...

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method and resist composition

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Method of forming pattern and developer for use in the method

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, chemical amplification resist composition a...

Method of forming pattern and developer for use in the method

Pattern forming method, chemical amplification resist composition a...

Method of forming pattern and developer for use in the method

Negative pattern forming method and resist pattern

Pattern forming method, pattern, chemical amplification resist comp...

Pattern forming method, chemical amplification resist composition a...

Pattern forming method using developer containing organic solvent a...

Method of forming pattern

Positive resist composition, pattern forming method using the compo...

Resist composition containing novel sulfonium compound, pattern-for...

Resist composition and pattern forming method using the same

Resist composition and pattern forming method using the same

Resist composition and pattern-forming method using same

Positive resist composition and pattern formation method using the...

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...

METHOD OF FORMING PATTERN

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

ACTIVE LIGHTRAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

METHOD OF FORMING PATTERN

NEGATIVE PATTERN FORMING METHOD AND RESIST PATTERN

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

METHOD OF FORMING PATTERN

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

PATTERN FORMING METHOD AND RESIST COMPOSITION

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

PATTERN FORMING METHOD AND RESIST COMPOSITION

PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMP...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

METHOD OF FORMING PATTERN

METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN...

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

RESIST COMPOSITION FOR NEGATIVE-TONE DEVELOPMENT AND PATTERN FORMIN...

PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT A...

POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPO...

SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSI...