Souichi FUKAYA

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Halftone phase shift photomask blank
- Patent number 10,747,098
- Issue date Aug 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 10,712,654
- Issue date Jul 14, 2020
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photomask blank and photomask blank
- Patent number 10,120,274
- Issue date Nov 6, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blank for mold production and method for manufacturing mold
- Patent number 10,040,220
- Issue date Aug 7, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Photomask blank, making method, and photomask
- Patent number 9,952,501
- Issue date Apr 24, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 9,880,459
- Issue date Jan 30, 2018
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inorganic material film, photomask blank, and method for manufactur...
- Patent number 9,851,633
- Issue date Dec 26, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 9,798,230
- Issue date Oct 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Designing of photomask blank and photomask blank
- Patent number 9,798,229
- Issue date Oct 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank manufacturing method, photomask blank, photomask, a...
- Patent number 9,689,066
- Issue date Jun 27, 2017
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank
- Patent number 9,618,838
- Issue date Apr 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photomask blank and photomask blank
- Patent number 9,581,892
- Issue date Feb 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 9,541,823
- Issue date Jan 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, process for production of photomask, and chromium-...
- Patent number 9,488,907
- Issue date Nov 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Blank for mold production and method for manufacturing mold
- Patent number 9,440,375
- Issue date Sep 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask blank and method for manufacturing photomask
- Patent number 9,268,212
- Issue date Feb 23, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for manufacturing photomask, and method for...
- Patent number 9,188,852
- Issue date Nov 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Half-tone phase shift mask blank and method for manufacturing half-...
- Patent number 9,158,192
- Issue date Oct 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and manufacturing method thereof
- Patent number 9,063,427
- Issue date Jun 23, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, process for production of photomask, and chromium-...
- Patent number 8,968,972
- Issue date Mar 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Photomask blank, process for production of photomask, and chromium-...
- Patent number 8,709,686
- Issue date Apr 29, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa

Patents Applicationslast 30 patents

Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK
- Publication number 20180259842
- Publication date Sep 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK
- Publication number 20180259843
- Publication date Sep 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTOMASK BLANK AND PHOTOMASK BLANK
- Publication number 20170123306
- Publication date May 4, 2017
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, MAKING METHOD, AND PHOTOMASK
- Publication number 20170082917
- Publication date Mar 23, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK
- Publication number 20170031237
- Publication date Feb 2, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INORGANIC MATERIAL FILM, PHOTOMASK BLANK, AND METHOD FOR MANUFACTUR...
- Publication number 20170003584
- Publication date Jan 5, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD
- Publication number 20160346960
- Publication date Dec 1, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PHOTOMASK BLANK
- Publication number 20160077425
- Publication date Mar 17, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK
- Publication number 20160077424
- Publication date Mar 17, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGNING OF PHOTOMASK BLANK AND PHOTOMASK BLANK
- Publication number 20160033859
- Publication date Feb 4, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...
- Publication number 20150192849
- Publication date Jul 9, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOM...
- Publication number 20150159264
- Publication date Jun 11, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK
- Publication number 20150160549
- Publication date Jun 11, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTOMASK BLANK AND PHOTOMASK BLANK
- Publication number 20150010853
- Publication date Jan 8, 2015
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND MANUFACTURING METHOD THEREOF
- Publication number 20140120460
- Publication date May 1, 2014
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD
- Publication number 20130306596
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK
- Publication number 20130309600
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK MANUFACTURING METHOD, PHOTOMASK BLANK, PHOTOMASK, A...
- Publication number 20130309599
- Publication date Nov 21, 2013
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALF-TONE PHASE SHIFT MASK BLANK AND METHOD FOR MANUFACTURING HALF-...
- Publication number 20130309598
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR...
- Publication number 20130309601
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND MANUFACTURING METHOD THEREOF
- Publication number 20130288163
- Publication date Oct 31, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...
- Publication number 20130230796
- Publication date Sep 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Souichi FUKAYA

Person

Patents Grantslast 30 patents

Halftone phase shift photomask blank

Photomask blank

Method of manufacturing photomask blank and photomask blank

Blank for mold production and method for manufacturing mold

Photomask blank, making method, and photomask

Photomask blank and method for preparing photomask

Inorganic material film, photomask blank, and method for manufactur...

Photomask blank

Designing of photomask blank and photomask blank

Photomask blank manufacturing method, photomask blank, photomask, a...

Photomask blank

Method of manufacturing photomask blank and photomask blank

Photomask blank

Photomask blank, process for production of photomask, and chromium-...

Blank for mold production and method for manufacturing mold

Photomask blank and method for manufacturing photomask

Photomask blank, method for manufacturing photomask, and method for...

Half-tone phase shift mask blank and method for manufacturing half-...

Photomask blank and manufacturing method thereof

Photomask blank, process for production of photomask, and chromium-...

Photomask blank, process for production of photomask, and chromium-...

Patents Applicationslast 30 patents

HALFTONE PHASE SHIFT PHOTOMASK BLANK

PHOTOMASK BLANK

METHOD OF MANUFACTURING PHOTOMASK BLANK AND PHOTOMASK BLANK

PHOTOMASK BLANK, MAKING METHOD, AND PHOTOMASK

PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK

INORGANIC MATERIAL FILM, PHOTOMASK BLANK, AND METHOD FOR MANUFACTUR...

BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD

PHOTOMASK BLANK

PHOTOMASK BLANK

DESIGNING OF PHOTOMASK BLANK AND PHOTOMASK BLANK

PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...

SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOM...

PHOTOMASK BLANK

METHOD OF MANUFACTURING PHOTOMASK BLANK AND PHOTOMASK BLANK

PHOTOMASK BLANK AND MANUFACTURING METHOD THEREOF

BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK

PHOTOMASK BLANK MANUFACTURING METHOD, PHOTOMASK BLANK, PHOTOMASK, A...

HALF-TONE PHASE SHIFT MASK BLANK AND METHOD FOR MANUFACTURING HALF-...

PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR...

PHOTOMASK BLANK AND MANUFACTURING METHOD THEREOF

PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...