Sousuke OOSAWA

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Resist pattern-forming method
- Patent number 10,564,546
- Issue date Feb 18, 2020
- JSR Corporation
- Tomohiko Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION...
- Publication number 20200333707
- Publication date Oct 22, 2020
- JSR Corporation
- Miki Tamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170329228
- Publication date Nov 16, 2017
- JSR Corporation
- Tomohiko SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY