Srinivas Gandikota

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Treatments to enhance material structures
- Patent number 11,961,734
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 11,955,332
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lids and lid assembly kits for atomic layer deposition chambers
- Patent number 11,932,939
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming semiconductor structures
- Patent number 11,908,914
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Ria Someshwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dipole flow for transistor
- Patent number 11,888,045
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced spatial ALD of metals through controlled precursor mixing
- Patent number 11,887,856
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing fluorine/carbon-free conformal tungsten
- Patent number 11,887,855
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming molybdenum contacts
- Patent number 11,869,806
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD based oxide-metal multi structure for 3D NAND memory devices
- Patent number 11,817,320
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for reflector film growth
- Patent number 11,776,980
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Luping Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature chemical vapor deposition lid
- Patent number 11,732,358
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,705,335
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-type dipole for p-FET
- Patent number 11,658,218
- Issue date May 23, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of tuning film properties of metal nitride using plasma
- Patent number 11,646,226
- Issue date May 9, 2023
- Applied Materials, Inc.
- Wenyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped and undoped vanadium oxides for low-k spacer applications
- Patent number 11,621,160
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphene diffusion barrier
- Patent number 11,621,226
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic housing systems
- Patent number 11,587,764
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low resistivity DRAM buried word line stack
- Patent number 11,587,936
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ high power implant to relieve stress of a thin film
- Patent number 11,557,478
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PMOS high-K metal gates
- Patent number 11,552,177
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ film annealing with spatial atomic layer deposition
- Patent number 11,515,144
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Keiichi Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming metal chalcogenide pillars
- Patent number 11,515,207
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Amrita B. Mullick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for gapfill in high aspect ratio structures
- Patent number 11,488,856
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner for V-NAND word line stack
- Patent number 11,476,267
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Volumetric expansion of metal-containing films by silicidation
- Patent number 11,462,438
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature chemical vapor deposition lid
- Patent number 11,447,866
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Seamless gap fill
- Patent number 11,437,271
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 11,417,517
- Issue date Aug 16, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned structures from sub-oxides
- Patent number 11,414,751
- Issue date Aug 16, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition chamber with funnel-shaped gas dispersion c...
- Patent number 11,384,432
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES
- Publication number 20240154018
- Publication date May 9, 2024
- Applied Materials, Inc.
- Ria Someshwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL TREATMENT FOR METAL GATE STACK
- Publication number 20240087899
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Zhihui Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL MOLYBDENUM DEPOSITION
- Publication number 20240060175
- Publication date Feb 22, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED DIPOLE REGION FOR TRANSISTOR
- Publication number 20240063064
- Publication date Feb 22, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL MOLYBDENUM DEPOSITION
- Publication number 20240026529
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION OF HIGH DIELECTRIC CONSTANT MATERIALS
- Publication number 20230420486
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMATION OF CONFORMAL ALD SIO2 FILMS
- Publication number 20230416909
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Geetika BAJAJ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION USING NOVEL OXYGEN-CONTAINING PRECURSORS
- Publication number 20230416915
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Geetika Bajaj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR PATTERNING SUBSTRATES TO ADJUST VOLTAGE PROPERTIES
- Publication number 20230402291
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Steven C. H. HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER LAYER FOR PREVENTING ALUMINUM DIFFUSION
- Publication number 20230377879
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PATTERNING SUBSTRATES TO ADJUST VOLTAGE PROPERTIES
- Publication number 20230377901
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Steven C. H. HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CLEANING AND SELECTIVE MOLYBDENUM DEPOSITION PROCESSES
- Publication number 20230323543
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Tuerxun Ailihumaer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIELD SUPPRESSED METAL GAPFILL
- Publication number 20230326744
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING INTERCONNECT STRUCTURE
- Publication number 20230295804
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED DIPOLE REGION FOR TRANSISTOR
- Publication number 20230260791
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
P-TYPE DIPOLE FOR P-FET
- Publication number 20230253466
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA
- Publication number 20230245925
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Wenyi LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC HOUSING SYSTEMS
- Publication number 20230154726
- Publication date May 18, 2023
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW RESISTIVITY DRAM BURIED WORD LINE STACK
- Publication number 20230141748
- Publication date May 11, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PMOS HIGH-K METAL GATES
- Publication number 20230097400
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES
- Publication number 20230015781
- Publication date Jan 19, 2023
- Applied Materials, Inc.
- Ria Someshwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER FOR V-NAND WORD LINE STACK
- Publication number 20230005945
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Jacqueline S. Wrench
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220403505
- Publication date Dec 22, 2022
- Annamalai LAKSHMANAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Seamless Gapfill Of Metal Nitrides
- Publication number 20220389568
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Subramanian Tamilmani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Temperature Chemical Vapor Deposition Lid
- Publication number 20220389585
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
V-NAND STACKS WITH DIPOLE REGIONS
- Publication number 20220384469
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Yong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING MOLYBDENUM CONTACTS
- Publication number 20220359281
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCING GAPFILL PERFORMANCE OF DRAM WORD LINE
- Publication number 20220359532
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Yong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20220328308
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Resistivity DRAM Buried Word Line Stack
- Publication number 20220278108
- Publication date Sep 1, 2022
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS

Srinivas Gandikota

Person

Patents Grantslast 30 patents

Treatments to enhance material structures

Treatments to enhance material structures

Lids and lid assembly kits for atomic layer deposition chambers

Methods of forming semiconductor structures

Integrated dipole flow for transistor

Enhanced spatial ALD of metals through controlled precursor mixing

Methods for depositing fluorine/carbon-free conformal tungsten

Methods of forming molybdenum contacts

CVD based oxide-metal multi structure for 3D NAND memory devices

Methods for reflector film growth

High temperature chemical vapor deposition lid

Conformal high concentration boron doping of semiconductors

P-type dipole for p-FET

Method of tuning film properties of metal nitride using plasma

Doped and undoped vanadium oxides for low-k spacer applications

Graphene diffusion barrier

Magnetic housing systems

Low resistivity DRAM buried word line stack

In-situ high power implant to relieve stress of a thin film

PMOS high-K metal gates

In-situ film annealing with spatial atomic layer deposition

Methods of forming metal chalcogenide pillars

Methods for gapfill in high aspect ratio structures

Liner for V-NAND word line stack

Volumetric expansion of metal-containing films by silicidation

High temperature chemical vapor deposition lid

Seamless gap fill

Treatments to enhance material structures

Self-aligned structures from sub-oxides

Atomic layer deposition chamber with funnel-shaped gas dispersion c...

Patents Applicationslast 30 patents

METHODS OF FORMING SEMICONDUCTOR STRUCTURES

RADICAL TREATMENT FOR METAL GATE STACK

CONFORMAL MOLYBDENUM DEPOSITION

INTEGRATED DIPOLE REGION FOR TRANSISTOR

CONFORMAL MOLYBDENUM DEPOSITION

ATOMIC LAYER DEPOSITION OF HIGH DIELECTRIC CONSTANT MATERIALS

METHOD FOR FORMATION OF CONFORMAL ALD SIO2 FILMS

ATOMIC LAYER DEPOSITION USING NOVEL OXYGEN-CONTAINING PRECURSORS

METHODS FOR PATTERNING SUBSTRATES TO ADJUST VOLTAGE PROPERTIES

BARRIER LAYER FOR PREVENTING ALUMINUM DIFFUSION

METHODS FOR PATTERNING SUBSTRATES TO ADJUST VOLTAGE PROPERTIES

INTEGRATED CLEANING AND SELECTIVE MOLYBDENUM DEPOSITION PROCESSES

FIELD SUPPRESSED METAL GAPFILL

METHOD OF FORMING INTERCONNECT STRUCTURE

INTEGRATED DIPOLE REGION FOR TRANSISTOR

P-TYPE DIPOLE FOR P-FET

METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA

MAGNETIC HOUSING SYSTEMS

LOW RESISTIVITY DRAM BURIED WORD LINE STACK

PMOS HIGH-K METAL GATES

METHODS OF FORMING SEMICONDUCTOR STRUCTURES

LINER FOR V-NAND WORD LINE STACK

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

Seamless Gapfill Of Metal Nitrides

High Temperature Chemical Vapor Deposition Lid

V-NAND STACKS WITH DIPOLE REGIONS

METHODS OF FORMING MOLYBDENUM CONTACTS

ENHANCING GAPFILL PERFORMANCE OF DRAM WORD LINE

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

Low Resistivity DRAM Buried Word Line Stack