Sriram P. Anjur

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compositions and methods for polishing silicon nitride materials
- Patent number 8,759,216
- Issue date Jun 24, 2014
- Cabot Microelectronics Corporation
- Jeffrey Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing composition containing polyether amine
- Patent number 8,741,009
- Issue date Jun 3, 2014
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition and method utilizing abrasive particles treat...
- Patent number 7,994,057
- Issue date Aug 9, 2011
- Cabot Microelectronics Corporation
- Jeffrey Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions and methods for CMP of phase change alloys
- Patent number 7,897,061
- Issue date Mar 1, 2011
- Cabot Microelectronics Corporation
- Jeffrey Dysard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and method for damascene CMP
- Patent number 7,837,888
- Issue date Nov 23, 2010
- Cabot Microelectronics Corporation
- Paul M. Feeney
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition containing polyether amine
- Patent number 7,585,340
- Issue date Sep 8, 2009
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- B24 - GRINDING POLISHING
Information Patent Grant
Electrochemical-mechanical polishing system
- Patent number 7,438,795
- Issue date Oct 21, 2008
- Cabot Microelectronics Corp.
- Ian W. Wylie
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad comprising particles with a solid core and polymeric...
- Patent number 6,685,540
- Issue date Feb 3, 2004
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads for a semiconductor substrate
- Patent number 6,126,532
- Issue date Oct 3, 2000
- Cabot Corporation
- Roland K. Sevilla
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for a semiconductor substrate
- Patent number 6,117,000
- Issue date Sep 12, 2000
- Cabot Corporation
- Sriram P. Anjur
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for a semiconductor substrate
- Patent number 6,062,968
- Issue date May 16, 2000
- Cabot Corporation
- Roland K. Sevilla
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Polishing composition containing polyether amine
- Publication number 20090289033
- Publication date Nov 26, 2009
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- B24 - GRINDING POLISHING
Information Patent Application
COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS
- Publication number 20090156006
- Publication date Jun 18, 2009
- Sriram Anjur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREAT...
- Publication number 20090081871
- Publication date Mar 26, 2009
- Cabot Microelectronics Corporation
- Jeffrey Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition and method for damascene CMP
- Publication number 20080113589
- Publication date May 15, 2008
- Cabot Microelectronics Corporation
- Paul Feeney
- B24 - GRINDING POLISHING
Information Patent Application
Compositions and methods for polishing silicon nitride materials
- Publication number 20070298612
- Publication date Dec 27, 2007
- Jeffrey Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing composition containing polyether amine
- Publication number 20070251155
- Publication date Nov 1, 2007
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- B24 - GRINDING POLISHING
Information Patent Application
Compositions and methods for CMP of phase change alloys
- Publication number 20070178700
- Publication date Aug 2, 2007
- Jeffrey Dysard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrochemical-mechanical polishing system
- Publication number 20050274627
- Publication date Dec 15, 2005
- Cabot Microelectronics Corporation
- Ian W. Wylie
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad comprising particles with a solid core and polymeric...
- Publication number 20030100244
- Publication date May 29, 2003
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- B24 - GRINDING POLISHING

Sriram P. Anjur

Person

Patents Grantslast 30 patents

Compositions and methods for polishing silicon nitride materials

Polishing composition containing polyether amine

Polishing composition and method utilizing abrasive particles treat...

Compositions and methods for CMP of phase change alloys

Composition and method for damascene CMP

Polishing composition containing polyether amine

Electrochemical-mechanical polishing system

Polishing pad comprising particles with a solid core and polymeric...

Polishing pads for a semiconductor substrate

Polishing pad for a semiconductor substrate

Polishing pad for a semiconductor substrate

Patents Applicationslast 30 patents

Polishing composition containing polyether amine

COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS

POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREAT...

Composition and method for damascene CMP

Compositions and methods for polishing silicon nitride materials

Polishing composition containing polyether amine

Compositions and methods for CMP of phase change alloys

Electrochemical-mechanical polishing system

Polishing pad comprising particles with a solid core and polymeric...