Stan Chen

Person

Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Gate formation with varying work function layers
- Patent number 11,830,936
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Loading effect reduction through multiple coat-etch processes
- Patent number 11,387,105
- Issue date Jul 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,316,033
- Issue date Apr 26, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate formation with varying work function layers
- Patent number 11,239,345
- Issue date Feb 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Loading effect reduction through multiple coat-etch processes
- Patent number 10,755,936
- Issue date Aug 25, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate formation with varying work function layers
- Patent number 10,644,134
- Issue date May 5, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Loading effect reduction through multiple coat-etch processes
- Patent number 10,276,392
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Loading effect reduction through multiple coat-etch processes
- Patent number 9,711,604
- Issue date Jul 18, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Gate Formation with Varying Work Function Layers
- Publication number 20220157973
- Publication date May 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20210391442
- Publication date Dec 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jin-Dah CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Loading Effect Reduction Through Multiple Coat-Etch Processes
- Publication number 20200388497
- Publication date Dec 10, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Formation with Varying Work Function Layers
- Publication number 20200251578
- Publication date Aug 6, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOADING EFFECT REDUCTION THROUGH MULTIPLE COAT-ETCH PROCESSES
- Publication number 20190252193
- Publication date Aug 15, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE FORMATION WITH VARYING WORK FUNCTION LAYERS
- Publication number 20180350955
- Publication date Dec 6, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOADING EFFECT REDUCTION THROUGH MULTIPLE COAT-ETCH PROCESSES
- Publication number 20170309718
- Publication date Oct 26, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOADING EFFECT REDUCTION THROUGH MULTIPLE COAT-ETCH PROCESSES
- Publication number 20170194443
- Publication date Jul 6, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Jin-Dah Chen
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Gate formation with varying work function layers

Loading effect reduction through multiple coat-etch processes

Semiconductor device and manufacturing method thereof

Gate formation with varying work function layers

Loading effect reduction through multiple coat-etch processes

Gate formation with varying work function layers

Loading effect reduction through multiple coat-etch processes

Loading effect reduction through multiple coat-etch processes

Patents Applicationslast 30 patents

Gate Formation with Varying Work Function Layers

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Loading Effect Reduction Through Multiple Coat-Etch Processes

Gate Formation with Varying Work Function Layers

LOADING EFFECT REDUCTION THROUGH MULTIPLE COAT-ETCH PROCESSES

GATE FORMATION WITH VARYING WORK FUNCTION LAYERS

LOADING EFFECT REDUCTION THROUGH MULTIPLE COAT-ETCH PROCESSES

LOADING EFFECT REDUCTION THROUGH MULTIPLE COAT-ETCH PROCESSES