Stanislav S. Todorov

Person

Topsfield, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Techniques to increase CMOS image sensor well depth by cyrogenic io...
- Patent number 11,830,739
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Hans-Joachim L. Gossmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for improved scanned spot beam
- Patent number 10,658,156
- Issue date May 19, 2020
- Applied Materials, Inc.
- Stanislav S. Todorov
- G02 - OPTICS
Information Patent Grant
Selective processing of a workpiece
- Patent number 10,081,861
- Issue date Sep 25, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for controlling implant process
- Patent number 9,738,968
- Issue date Aug 22, 2017
- Varian Semiconductor Equipment Associates, Inc.
- George M. Gammel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implant for defect control
- Patent number 9,299,564
- Issue date Mar 29, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for controlling ion implantation uniformity
- Patent number 9,006,692
- Issue date Apr 14, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and techniques for controlling ion implantation uniformity
- Patent number 8,853,653
- Issue date Oct 7, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
FinFET device fabrication using thermal implantation
- Patent number 8,722,431
- Issue date May 13, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Nilay Anil Pradhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for forming low contact resistance device
- Patent number 8,617,955
- Issue date Dec 31, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to modify the shape of a cavity using angled implantation
- Patent number 8,450,194
- Issue date May 28, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for the production of purified liquids and vapors
- Patent number 7,413,596
- Issue date Aug 19, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Wilhelm P. Platow
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Determining ion beam parallelism using refraction method
- Patent number 7,397,049
- Issue date Jul 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Raymond Callahan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Variable Rotation Rate Batch Implanter
- Publication number 20230287561
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLED ION IMPLANTATION
- Publication number 20230016122
- Publication date Jan 19, 2023
- Applied Materials, Inc.
- Alexander K. Eidukonis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES TO INCREASE CMOS IMAGE SENSOR WELL DEPTH BY CRYOGENIC IO...
- Publication number 20220108893
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Hans-Joachim L. Gossmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING IMPLANT PROCESS
- Publication number 20160312357
- Publication date Oct 27, 2016
- George M. Gammel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Processing Of A Workpiece
- Publication number 20160298229
- Publication date Oct 13, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND TECHNIQUES FOR CONTROLLING ION IMPLANTATION UNIFORMITY
- Publication number 20140326179
- Publication date Nov 6, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ion Implant For Defect Control
- Publication number 20140162435
- Publication date Jun 12, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Finfet Device Fabrication Using Thermal Implantation
- Publication number 20130252349
- Publication date Sep 26, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Nilay Anil Pradhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING LOW CONTACT RESISTANCE DEVICE
- Publication number 20130015528
- Publication date Jan 17, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO MODIFY THE SHAPE OF A CAVITY USING ANGLED IMPLANTATION
- Publication number 20130001698
- Publication date Jan 3, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Andrew Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determining ion beam parallelism using refraction method
- Publication number 20070221871
- Publication date Sep 27, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Raymond Callahan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for the production of purified liquids and vapors
- Publication number 20070056316
- Publication date Mar 15, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Wilhelm P. Platow
- H01 - BASIC ELECTRIC ELEMENTS

Stanislav S. Todorov

Person

Patents Grantslast 30 patents

Techniques to increase CMOS image sensor well depth by cyrogenic io...

System and method for improved scanned spot beam

Selective processing of a workpiece

Apparatus and method for controlling implant process

Ion implant for defect control

Apparatus and techniques for controlling ion implantation uniformity

Apparatus and techniques for controlling ion implantation uniformity

FinFET device fabrication using thermal implantation

Method and system for forming low contact resistance device

Method to modify the shape of a cavity using angled implantation

Method and apparatus for the production of purified liquids and vapors

Determining ion beam parallelism using refraction method

Patents Applicationslast 30 patents

Variable Rotation Rate Batch Implanter

METHOD AND APPARATUS FOR CONTROLLED ION IMPLANTATION

TECHNIQUES TO INCREASE CMOS IMAGE SENSOR WELL DEPTH BY CRYOGENIC IO...

APPARATUS AND METHOD FOR CONTROLLING IMPLANT PROCESS

Selective Processing Of A Workpiece

APPARATUS AND TECHNIQUES FOR CONTROLLING ION IMPLANTATION UNIFORMITY

Ion Implant For Defect Control

Finfet Device Fabrication Using Thermal Implantation

METHOD AND SYSTEM FOR FORMING LOW CONTACT RESISTANCE DEVICE

METHOD TO MODIFY THE SHAPE OF A CAVITY USING ANGLED IMPLANTATION

Determining ion beam parallelism using refraction method

Method and apparatus for the production of purified liquids and vapors