Stefan Eyring

Person

Weilburg, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Design-assisted large field of view metrology
- Patent number 12,085,385
- Issue date Sep 10, 2024
- KLA Corporation
- Stefan Eyring
- G01 - MEASURING TESTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 12,055,859
- Issue date Aug 6, 2024
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection and correction of system responses in real-time
- Patent number 11,894,214
- Issue date Feb 6, 2024
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,862,524
- Issue date Jan 2, 2024
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay design for electron beam and scatterometry overlay measurem...
- Patent number 11,720,031
- Issue date Aug 8, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G01 - MEASURING TESTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,703,767
- Issue date Jul 18, 2023
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection and correction of system responses in real-time
- Patent number 11,508,551
- Issue date Nov 22, 2022
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Online navigational drift correction for metrology measurements
- Patent number 11,481,922
- Issue date Oct 25, 2022
- KLA Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Performance optimized scanning sequence for eBeam metrology and ins...
- Patent number 11,209,737
- Issue date Dec 28, 2021
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for device-correlated overlay metrology
- Patent number 10,474,040
- Issue date Nov 12, 2019
- KLA-Tencor Corporation
- Frank Laske
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurements of overlapping target structures based on symm...
- Patent number 10,473,460
- Issue date Nov 12, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for the measurement of pattern placement and s...
- Patent number 10,185,800
- Issue date Jan 22, 2019
- KLA-Tencor Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting position measurements for optical errors and...
- Patent number 9,704,238
- Issue date Jul 11, 2017
- KLA-Tencor Corporation
- Stefan Eyring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting position measurements for optical errors and...
- Patent number 9,201,312
- Issue date Dec 1, 2015
- KLA-Tencor Corporation
- Stefan Eyring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR ACQUIRING ALIGNMENT MEASUREMENTS OF STRUCTURE...
- Publication number 20240093985
- Publication date Mar 21, 2024
- KLA Corporation
- Nimrod Shuall
- G01 - MEASURING TESTING
Information Patent Application
Image Modeling-Assisted Contour Extraction
- Publication number 20230420278
- Publication date Dec 28, 2023
- KLA Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20230324810
- Publication date Oct 12, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCREENING EDGE PLACEMENT UNIFORMITY WAFER STOCHASTICS
- Publication number 20230326710
- Publication date Oct 12, 2023
- KLA Corporation
- Stefan Eyring
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGN-ASSISTED LARGE FIELD OF VIEW METROLOGY
- Publication number 20230108539
- Publication date Apr 6, 2023
- Stefan Eyring
- G01 - MEASURING TESTING
Information Patent Application
Detection and Correction of System Responses in Real-Time
- Publication number 20230045072
- Publication date Feb 9, 2023
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220415725
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220413395
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...
- Publication number 20220413394
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Performance Optimized Scanning Sequence for eBeam Metrology and Ins...
- Publication number 20210405540
- Publication date Dec 30, 2021
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ONLINE NAVIGATIONAL DRIFT CORRECTION FOR METROLOGY MEASUREMENTS
- Publication number 20210312656
- Publication date Oct 7, 2021
- KLA Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Detection and Correction of System Responses in Real-Time
- Publication number 20200194224
- Publication date Jun 18, 2020
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Overlay Measurements of Overlapping Target Structures Based on Symm...
- Publication number 20190178639
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR DEVICE-CORRELATED OVERLAY METROLOGY
- Publication number 20190179231
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Frank Laske
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and Method for the Measurement of Pattern Placement and S...
- Publication number 20180165404
- Publication date Jun 14, 2018
- KLA-Tencor Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CORRECTING POSITION MEASUREMENTS FOR OPTICAL ERRORS AND...
- Publication number 20160078609
- Publication date Mar 17, 2016
- KLA-Tencor Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CORRECTING POSITION MEASUREMENTS FOR OPTICAL ERRORS AND...
- Publication number 20140307949
- Publication date Oct 16, 2014
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING

Stefan Eyring

Person

Patents Grantslast 30 patents

Design-assisted large field of view metrology

Overlay mark design for electron beam overlay

Detection and correction of system responses in real-time

Overlay mark design for electron beam overlay

Overlay design for electron beam and scatterometry overlay measurem...

Overlay mark design for electron beam overlay

Detection and correction of system responses in real-time

Online navigational drift correction for metrology measurements

Performance optimized scanning sequence for eBeam metrology and ins...

Systems and methods for device-correlated overlay metrology

Overlay measurements of overlapping target structures based on symm...

Apparatus and method for the measurement of pattern placement and s...

Method for correcting position measurements for optical errors and...

Method for correcting position measurements for optical errors and...

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR ACQUIRING ALIGNMENT MEASUREMENTS OF STRUCTURE...

Image Modeling-Assisted Contour Extraction

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

SCREENING EDGE PLACEMENT UNIFORMITY WAFER STOCHASTICS

DESIGN-ASSISTED LARGE FIELD OF VIEW METROLOGY

Detection and Correction of System Responses in Real-Time

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...

Performance Optimized Scanning Sequence for eBeam Metrology and Ins...

ONLINE NAVIGATIONAL DRIFT CORRECTION FOR METROLOGY MEASUREMENTS

Detection and Correction of System Responses in Real-Time

Overlay Measurements of Overlapping Target Structures Based on Symm...

SYSTEMS AND METHODS FOR DEVICE-CORRELATED OVERLAY METROLOGY

Apparatus and Method for the Measurement of Pattern Placement and S...

METHOD FOR CORRECTING POSITION MEASUREMENTS FOR OPTICAL ERRORS AND...

METHOD FOR CORRECTING POSITION MEASUREMENTS FOR OPTICAL ERRORS AND...