Stefan Hembacher

Person

Bobingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Compensation of creep effects in an imaging device
- Patent number 11,526,089
- Issue date Dec 13, 2022
- Carl Zeiss SMT GmbH
- Marwène Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for semiconductor lithography
- Patent number 11,281,114
- Issue date Mar 22, 2022
- Carl Zeiss SMT GmbH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for positioning a component of an optical system
- Patent number 11,169,359
- Issue date Nov 9, 2021
- Carl Zeiss SMT GmbH
- Pascal Marsollek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a mirror as an optical component for an optica...
- Patent number 11,092,897
- Issue date Aug 17, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical element for the beam guidance of imaging light in projectio...
- Patent number 10,989,897
- Issue date Apr 27, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G02 - OPTICS
Information Patent Grant
Optical imaging arrangement with actively adjustable metrology supp...
- Patent number 10,890,850
- Issue date Jan 12, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection exposure apparatus, and method for reducing deformations...
- Patent number 10,599,051
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with a piezoelectric device
- Patent number 10,416,570
- Issue date Sep 17, 2019
- Carl Zeiss SMT GmbH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV imaging apparatus
- Patent number 9,904,175
- Issue date Feb 27, 2018
- Carl Zeiss SMT GmbH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device and method for reducing dynamic fluctuations...
- Patent number 9,817,322
- Issue date Nov 14, 2017
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device with thermal attenuation
- Patent number 9,810,996
- Issue date Nov 7, 2017
- Carl Zeiss SMT GmbH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuators and microlithography projection exposure systems and meth...
- Patent number 9,766,550
- Issue date Sep 19, 2017
- Carl Zeiss SMT GmbH
- Ulrich Weber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Position manipulator for an optical component
- Patent number 9,696,518
- Issue date Jul 4, 2017
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical arrangement in a microlithographic projection exposure appa...
- Patent number 9,250,417
- Issue date Feb 2, 2016
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Grant
Optical module with a measuring device
- Patent number 9,175,948
- Issue date Nov 3, 2015
- Carl Zeiss SMT GmbH
- Armin Schoeppach
- G01 - MEASURING TESTING
Information Patent Grant
Cleaning module, EUV lithography device and method for the cleaning...
- Patent number 9,046,794
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device with thermal attenuation
- Patent number 8,902,401
- Issue date Dec 2, 2014
- Carl Zeiss SMT GmbH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,659,745
- Issue date Feb 25, 2014
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,542,346
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Optical imaging device with thermal attenuation
- Patent number 8,363,206
- Issue date Jan 29, 2013
- Carl Zeiss SMT GmbH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical apparatus and method for modifying the imaging behavior of...
- Patent number 8,169,595
- Issue date May 1, 2012
- Carl Zeiss SMT GmbH
- Martin Schriever
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device and method for reducing dynamic fluctuations...
- Patent number 8,027,023
- Issue date Sep 27, 2011
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Holding device for optical element
- Patent number 7,869,147
- Issue date Jan 11, 2011
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT, OPTICAL ARRANGEMENT AND INSERT COMPONENT
- Publication number 20240004160
- Publication date Jan 4, 2024
- Carl Zeiss SMT GMBH
- Eduard Schweigert
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20230367227
- Publication date Nov 16, 2023
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT, OPTICAL ARRANGEMENT, AND METHOD FOR MANUFACTURING...
- Publication number 20230185080
- Publication date Jun 15, 2023
- Carl Zeiss SMT GMBH
- Marwene Nefzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DAMPING ARRANGEMENT FOR VIBRATION DAMPING OF AN ELEMENT IN AN OPTIC...
- Publication number 20230104921
- Publication date Apr 6, 2023
- Carl Zeiss SMT GMBH
- Marwene Nefzi
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE
- Publication number 20210405543
- Publication date Dec 30, 2021
- Carl Zeiss SMT GMBH
- Marwène Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20210080841
- Publication date Mar 18, 2021
- Carl Zeiss SMT GMBH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELMENT FOR THE BEAM GUIDANCE OF IMAGING LIGHT IN PROJECTION...
- Publication number 20200333557
- Publication date Oct 22, 2020
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A MIRROR AS AN OPTICAL COMPONENT FOR AN OPTICA...
- Publication number 20200206855
- Publication date Jul 2, 2020
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
METHOD FOR POSITIONING A COMPONENT OF AN OPTICAL SYSTEM
- Publication number 20190302402
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Pascal Marsollek
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS, AND METHOD FOR REDUCING DEFORMATIONS...
- Publication number 20190219926
- Publication date Jul 18, 2019
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE
- Publication number 20190094705
- Publication date Mar 28, 2019
- Carl Zeiss SMT GMBH
- Jens Kugler
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL IMAGING ARRANGEMENT WITH ACTIVELY ADJUSTABLE METROLOGY SUPP...
- Publication number 20180275527
- Publication date Sep 27, 2018
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
- Publication number 20180181007
- Publication date Jun 28, 2018
- Carl Zeiss SMT GMBH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING DEVICE
- Publication number 20160147159
- Publication date May 26, 2016
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV IMAGING APPARATUS
- Publication number 20160077441
- Publication date Mar 17, 2016
- Carl Zeiss SMT GMBH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METH...
- Publication number 20150370176
- Publication date Dec 24, 2015
- Carl Zeiss SMT GMBH
- Ulrich Weber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
- Publication number 20150109591
- Publication date Apr 23, 2015
- Carl Zeiss SMT GMBH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL MODULE WITH A MEASURING DEVICE
- Publication number 20140125995
- Publication date May 8, 2014
- Armin Schoeppach
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20130278911
- Publication date Oct 24, 2013
- Guido Limbach
- G02 - OPTICS
Information Patent Application
POSITION MANIPULATOR FOR AN OPTICAL COMPONENT
- Publication number 20130242282
- Publication date Sep 19, 2013
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G02 - OPTICS
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
- Publication number 20130114057
- Publication date May 9, 2013
- Carl Zeiss SMT GMBH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120300183
- Publication date Nov 29, 2012
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METH...
- Publication number 20120147344
- Publication date Jun 14, 2012
- Carl Zeiss SMT GMBH
- Ulrich Weber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING DEVICE AND METHOD FOR REDUCING DYNAMIC FLUCTUATIONS...
- Publication number 20120026479
- Publication date Feb 2, 2012
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METH...
- Publication number 20110128521
- Publication date Jun 2, 2011
- Carl Zeiss SMT GMBH
- Ulrich Weber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Stefan Hembacher

Person

Patents Grantslast 30 patents

Compensation of creep effects in an imaging device

Projection exposure apparatus for semiconductor lithography

Method for positioning a component of an optical system

Method for producing a mirror as an optical component for an optica...

Optical element for the beam guidance of imaging light in projectio...

Optical imaging arrangement with actively adjustable metrology supp...

EUV exposure apparatus with reflective elements having reduced infl...

Projection exposure apparatus, and method for reducing deformations...

Optical imaging arrangement with a piezoelectric device

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

EUV imaging apparatus

Optical imaging device and method for reducing dynamic fluctuations...

Optical imaging device with thermal attenuation

Actuators and microlithography projection exposure systems and meth...

EUV exposure apparatus with reflective elements having reduced infl...

Position manipulator for an optical component

EUV exposure apparatus with reflective elements having reduced infl...

Optical arrangement in a microlithographic projection exposure appa...

Optical module with a measuring device

Cleaning module, EUV lithography device and method for the cleaning...

Optical imaging device with thermal attenuation

Optical system with an exchangeable, manipulable correction arrange...

Optical system with an exchangeable, manipulable correction arrange...

Optical imaging device with thermal attenuation

Optical apparatus and method for modifying the imaging behavior of...

Optical imaging device and method for reducing dynamic fluctuations...

Holding device for optical element

Patents Applicationslast 30 patents

OPTICAL ELEMENT, OPTICAL ARRANGEMENT AND INSERT COMPONENT

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

OPTICAL ELEMENT, OPTICAL ARRANGEMENT, AND METHOD FOR MANUFACTURING...

DAMPING ARRANGEMENT FOR VIBRATION DAMPING OF AN ELEMENT IN AN OPTIC...

COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

OPTICAL ELMENT FOR THE BEAM GUIDANCE OF IMAGING LIGHT IN PROJECTION...

METHOD FOR PRODUCING A MIRROR AS AN OPTICAL COMPONENT FOR AN OPTICA...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

METHOD FOR POSITIONING A COMPONENT OF AN OPTICAL SYSTEM

PROJECTION EXPOSURE APPARATUS, AND METHOD FOR REDUCING DEFORMATIONS...

OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

OPTICAL IMAGING ARRANGEMENT WITH ACTIVELY ADJUSTABLE METROLOGY SUPP...

OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

OPTICAL IMAGING DEVICE

EUV IMAGING APPARATUS

ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METH...

OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION

OPTICAL MODULE WITH A MEASURING DEVICE

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

POSITION MANIPULATOR FOR AN OPTICAL COMPONENT

EUV Exposure Apparatus

OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION

OPTICAL ARRANGEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METH...

OPTICAL IMAGING DEVICE AND METHOD FOR REDUCING DYNAMIC FLUCTUATIONS...

ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METH...