Stefan Hunsche

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 12,228,862
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology data correction using image quality metric
- Patent number 12,189,307
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Fuming Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window optimizer
- Patent number 12,141,507
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Stefan Hunsche
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window based on defect probability
- Patent number 11,822,255
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for image analysis
- Patent number 11,720,029
- Issue date Aug 8, 2023
- ASML NETHERLANDS B.V.
- Scott Anderson Middlebrooks
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 11,681,229
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for pattern fidelity control
- Patent number 11,669,020
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Tanbir Hasan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Identification of hot spots or defects by machine learning
- Patent number 11,443,083
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window optimizer
- Patent number 11,238,189
- Issue date Feb 1, 2022
- ASML Netherlands B.V.
- Stefan Hunsche
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for image analysis
- Patent number 11,143,970
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Focus and overlay improvement by modifying a patterning device
- Patent number 11,126,093
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window based on defect probability
- Patent number 11,079,687
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and methods, substrates having metrology targe...
- Patent number 11,022,900
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 11,003,093
- Issue date May 11, 2021
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 10,962,886
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for pattern fidelity control
- Patent number 10,908,515
- Issue date Feb 2, 2021
- ASML Netherlands B.V.
- Tanbir Hasan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for defect validation
- Patent number 10,859,926
- Issue date Dec 8, 2020
- ASML Netherlands B.V.
- Stefan Hunsche
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Displacement based overlay or alignment
- Patent number 10,852,646
- Issue date Dec 1, 2020
- ASML Netherlands B.V.
- Marinus Jochemsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and methods, substrates having metrology targe...
- Patent number 10,761,432
- Issue date Sep 1, 2020
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for image analysis
- Patent number 10,732,513
- Issue date Aug 4, 2020
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of predicting patterning defects caused by overlay error
- Patent number 10,712,672
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Marinus Jochemsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for image analysis
- Patent number 10,607,334
- Issue date Mar 31, 2020
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 10,514,614
- Issue date Dec 24, 2019
- ASML Netherlands B.V.
- Venugopal Vellanki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus-dose co-optimization based on overlapping process window
- Patent number 10,459,345
- Issue date Oct 29, 2019
- ASML Netherlands B.V.
- Stefan Hunsche
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for image analysis
- Patent number 10,437,157
- Issue date Oct 8, 2019
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window optimizer
- Patent number 9,990,451
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Stefan Hunsche
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and methods, substrates having metrology targe...
- Patent number 9,958,791
- Issue date May 1, 2018
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanner model representation with transmission cross coefficients
- Patent number 9,645,509
- Issue date May 9, 2017
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for process window optimized optical proximity correction
- Patent number 8,832,610
- Issue date Sep 9, 2014
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
PROCESS WINDOW OPTIMIZER
- Publication number 20250053702
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION DATA FILTERING SYSTEMS AND METHODS
- Publication number 20240264539
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Lingling LU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20240126181
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20230333481
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CALIBRATING SIMULATION PROCESS BASED ON DEFECT-BASED PRO...
- Publication number 20230076218
- Publication date Mar 9, 2023
- ASML NETHERLANDS B.V.
- Koenraad VAN INGEN SCHENAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE GEOMETRY METHOD AND SYSTEM
- Publication number 20220327364
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING
- Publication number 20220277116
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Jing SU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR PREDICTING SUBSTRATE IMAGE
- Publication number 20220187713
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS WINDOW OPTIMIZER
- Publication number 20220147665
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR IMAGE ANALYSIS
- Publication number 20220026811
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20210356874
- Publication date Nov 18, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS VARIABILITY AWARE ADAPTIVE INSPECTION AND METROLOGY
- Publication number 20210255548
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Venugopal VELLANKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY DATA CORRECTION USING IMAGE QUALITY METRIC
- Publication number 20210241449
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Fuming WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20210216017
- Publication date Jul 15, 2021
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL
- Publication number 20210181642
- Publication date Jun 17, 2021
- ASML NETHERLANDS B.V.
- Tanbir HASAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20210018850
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IMAGE ANALYSIS
- Publication number 20200356009
- Publication date Nov 12, 2020
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inspection Apparatus and Methods, Substrates Having Metrology Targe...
- Publication number 20200348605
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE
- Publication number 20200310242
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS VARIABILITY AWARE ADAPTIVE INSPECTION AND METROLOGY
- Publication number 20200096871
- Publication date Mar 26, 2020
- ASML NETHERLANDS B.V.
- Venugopal VELLANKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL
- Publication number 20200019069
- Publication date Jan 16, 2020
- ASML NETHERLANDS B.V.
- Tanbir HASAN
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS FOR IMAGE ANALYSIS
- Publication number 20190391498
- Publication date Dec 26, 2019
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF PREDICTING PATTERNING DEFECTS CAUSED BY OVERLAY ERROR
- Publication number 20190310553
- Publication date Oct 10, 2019
- ASML NETHERLANDS B.V.
- Marinus JOCHEMSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING
- Publication number 20190147127
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Jing SU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DISPLACEMENT BASED OVERLAY OR ALIGNMENT
- Publication number 20190146358
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Marinus JOCHEMSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20190025705
- Publication date Jan 24, 2019
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS WINDOW OPTIMIZER
- Publication number 20180330030
- Publication date Nov 15, 2018
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus and Methods, Substrates Having Metrology Targe...
- Publication number 20180239263
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DEFECT VALIDATION
- Publication number 20180173104
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FOCUS-DOSE CO-OPTIMIZATION BASED ON OVERLAPPING PROCESS WINDOW
- Publication number 20180074413
- Publication date Mar 15, 2018
- Stefan HUNSCHE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Stefan Hunsche

Person

Patents Grantslast 30 patents

Selection of measurement locations for patterning processes

Metrology data correction using image quality metric

Process window optimizer

Process variability aware adaptive inspection and metrology

Process window based on defect probability

Method and apparatus for image analysis

Selection of measurement locations for patterning processes

Method and apparatus for pattern fidelity control

Identification of hot spots or defects by machine learning

Process window optimizer

Method and apparatus for image analysis

Focus and overlay improvement by modifying a patterning device

Process window based on defect probability

Inspection apparatus and methods, substrates having metrology targe...

Process variability aware adaptive inspection and metrology

Selection of measurement locations for patterning processes

Method and apparatus for pattern fidelity control

Methods for defect validation

Displacement based overlay or alignment

Inspection apparatus and methods, substrates having metrology targe...

Method and apparatus for image analysis

Method of predicting patterning defects caused by overlay error

Method and apparatus for image analysis

Process variability aware adaptive inspection and metrology

Focus-dose co-optimization based on overlapping process window

Method and apparatus for image analysis

Process window optimizer

Inspection apparatus and methods, substrates having metrology targe...

Scanner model representation with transmission cross coefficients

Method for process window optimized optical proximity correction

Patents Applicationslast 30 patents

PROCESS WINDOW OPTIMIZER

INSPECTION DATA FILTERING SYSTEMS AND METHODS

PROCESS WINDOW BASED ON DEFECT PROBABILITY

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

METHOD FOR CALIBRATING SIMULATION PROCESS BASED ON DEFECT-BASED PRO...

SEMICONDUCTOR DEVICE GEOMETRY METHOD AND SYSTEM

IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING

METHOD AND APPARATUS FOR PREDICTING SUBSTRATE IMAGE

PROCESS WINDOW OPTIMIZER

METHOD AND APPARATUS FOR IMAGE ANALYSIS

PROCESS WINDOW BASED ON DEFECT PROBABILITY

PROCESS VARIABILITY AWARE ADAPTIVE INSPECTION AND METROLOGY

METROLOGY DATA CORRECTION USING IMAGE QUALITY METRIC

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL

PROCESS WINDOW BASED ON DEFECT PROBABILITY

METHOD AND APPARATUS FOR IMAGE ANALYSIS

Inspection Apparatus and Methods, Substrates Having Metrology Targe...

FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE

PROCESS VARIABILITY AWARE ADAPTIVE INSPECTION AND METROLOGY

METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL

METHOD AND APPARATUS FOR IMAGE ANALYSIS

METHOD OF PREDICTING PATTERNING DEFECTS CAUSED BY OVERLAY ERROR

IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING

DISPLACEMENT BASED OVERLAY OR ALIGNMENT

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

PROCESS WINDOW OPTIMIZER

Inspection Apparatus and Methods, Substrates Having Metrology Targe...

METHODS FOR DEFECT VALIDATION

FOCUS-DOSE CO-OPTIMIZATION BASED ON OVERLAPPING PROCESS WINDOW