TREA

Stefan J. Caporale

Follow

Person

  • Summit, NJ, US
People

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PATTERN FORMATION METHODS
    • Publication number 20190204742
    • Publication date Jul 4, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • Choong-Bong LEE
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PATTERN FORMATION METHODS
    • Publication number 20160124309
    • Publication date May 5, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • Choong-Bong LEE
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST OVERCOAT COMPOSITIONS
    • Publication number 20160122574
    • Publication date May 5, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • Choong-Bong LEE
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    DIELECTRIC MATERIALS
    • Publication number 20150147463
    • Publication date May 28, 2015
    • Rohm and Haas Electronic Materials L.L.C.
    • Christopher D. Gilmore
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    PHOTORESISTS AND METHODS FOR USE THEREOF
    • Publication number 20120199957
    • Publication date Aug 9, 2012
    • Rohm and Haas Electronic Materials L.L.C.
    • Gerd POHLERS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Compositions and processes for immersion lithography
    • Publication number 20080193872
    • Publication date Aug 14, 2008
    • Rohm and Haas Electronic Materials L.L.C.
    • Stefan J. Caporale
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Novel polymers, processes for polymer synthesis and photoresist com...
    • Publication number 20040259025
    • Publication date Dec 23, 2004
    • Shipley Company, L.L.C.
    • George G. Barclay
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Novel copolymers and photoresist compositions comprising same
    • Publication number 20030215742
    • Publication date Nov 20, 2003
    • George G. Barclay
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Novel polymers and photoresist compositions comprising same
    • Publication number 20030031949
    • Publication date Feb 13, 2003
    • Shipley Company, L.L.C.
    • George G. Barclay
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Novel polymers, processes for polymer synthesis and photoresist com...
    • Publication number 20030027075
    • Publication date Feb 6, 2003
    • George G. Barclay
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC