Stefan SCHMIDT

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for operating an optical apparatus, and optical apparatus
- Patent number 11,307,505
- Issue date Apr 19, 2022
- Carl Zeiss SMT GmbH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly with a protective element and optical arrangement...
- Patent number 11,022,893
- Issue date Jun 1, 2021
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Projection exposure system for semiconductor lithography, comprisin...
- Patent number 10,712,677
- Issue date Jul 14, 2020
- Carl Zeiss SMT GmbH
- Irene Ament
- B08 - CLEANING
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 10,649,340
- Issue date May 12, 2020
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV lithography system and operating method
- Patent number 10,073,361
- Issue date Sep 11, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly with suppression of degradation
- Patent number 9,632,436
- Issue date Apr 25, 2017
- Carl Zeiss SMT GmbH
- Stefan-Wolfgang Schmidt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical hollow waveguide assembly
- Patent number 9,535,210
- Issue date Jan 3, 2017
- Carl Zeiss SMT GmbH
- Stefan Wolfgang Schmidt
- G02 - OPTICS
Information Patent Grant
Arrangement for use in a projection exposure tool for microlithogra...
- Patent number 9,354,529
- Issue date May 31, 2016
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G01 - MEASURING TESTING
Information Patent Grant
Cleaning module, EUV lithography device and method for the cleaning...
- Patent number 9,046,794
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement, in particular in a projection exposure apparat...
- Patent number 9,041,905
- Issue date May 26, 2015
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection of contaminating substances in an EUV lithography apparatus
- Patent number 8,953,145
- Issue date Feb 10, 2015
- Carl Zeiss SMT GmbH
- Dieter Kraus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography device and method for processing an optical element
- Patent number 8,885,141
- Issue date Nov 11, 2014
- Carl Zeiss SMT GmbH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 8,339,576
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G02 - OPTICS
Information Patent Grant
Method for examining a wafer with regard to a contamination limit a...
- Patent number 8,288,064
- Issue date Oct 16, 2012
- Carl Zeiss SMT GmbH
- Andreas Dorsel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography apparatus and method for determining the contaminat...
- Patent number 8,054,446
- Issue date Nov 8, 2011
- Carl Zeiss SMT GmbH
- Dieter Kraus
- G01 - MEASURING TESTING
Information Patent Grant
Method for examining a wafer with regard to a contamination limit a...
- Patent number 7,955,767
- Issue date Jun 7, 2011
- Carl Zeiss SMT GmbH
- Andreas Dorsel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for cleaning an EUV lithography device, method for measuring...
- Patent number 7,911,598
- Issue date Mar 22, 2011
- Carl Zeiss SMT AG
- Dieter Kraus
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
MULTI-MIRROR ARRAY
- Publication number 20240248408
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR DEPOSITION OF AN OUTER LAYER, REFLECTIVE OPTICAL ELEMEN...
- Publication number 20240111216
- Publication date Apr 4, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS
- Publication number 20200183292
- Publication date Jun 11, 2020
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...
- Publication number 20190243258
- Publication date Aug 8, 2019
- Carl Zeiss SMT GMBH
- Irene AMENT
- B08 - CLEANING
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20190171108
- Publication date Jun 6, 2019
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT...
- Publication number 20180246413
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS
Information Patent Application
EUV Lithography System And Operating Method
- Publication number 20170212433
- Publication date Jul 27, 2017
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL HOLLOW WAVEGUIDE ASSEMBLY
- Publication number 20160124142
- Publication date May 5, 2016
- Carl Zeiss SMT GMBH
- Stefan Wolfgang SCHMIDT
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY WITH SUPPRESSION OF DEGRADATION
- Publication number 20140176921
- Publication date Jun 26, 2014
- Carl Zeiss SMT GMBH
- Stefan-Wolfgang SCHMIDT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRA...
- Publication number 20130077064
- Publication date Mar 28, 2013
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20120281196
- Publication date Nov 8, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARAT...
- Publication number 20120224153
- Publication date Sep 6, 2012
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM
- Publication number 20120086925
- Publication date Apr 12, 2012
- Carl Zeiss SMT GMBH
- Dieter KRAUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Device and Method For Processing An Optical Element
- Publication number 20110279799
- Publication date Nov 17, 2011
- Carl Zeiss SMT GMBH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT A...
- Publication number 20110236809
- Publication date Sep 29, 2011
- Carl Zeiss SMT GMBH
- Andreas DORSEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS
- Publication number 20110211179
- Publication date Sep 1, 2011
- Carl Zeiss SMT GMBH
- Dieter KRAUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
- Publication number 20110058147
- Publication date Mar 10, 2011
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING...
- Publication number 20110043774
- Publication date Feb 24, 2011
- Carl Zeiss SMT AG
- Stefan HEMBACHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT A...
- Publication number 20100183962
- Publication date Jul 22, 2010
- Carl Zeiss SMT AG
- Andreas DORSEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE
- Publication number 20100071720
- Publication date Mar 25, 2010
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING THE CONTAMINAT...
- Publication number 20100045948
- Publication date Feb 25, 2010
- Carl Zeiss SMT AG
- Dieter KRAUS
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CLEANING AN EUV LITHOGRAPHY DEVICE, METHOD FOR MEASURING...
- Publication number 20100034349
- Publication date Feb 11, 2010
- Carl Zeiss SMT AG
- Dieter KRAUS
- G01 - MEASURING TESTING

Stefan SCHMIDT

Person

Patents Grantslast 30 patents

Method for operating an optical apparatus, and optical apparatus

Optical assembly with a protective element and optical arrangement...

Projection exposure system for semiconductor lithography, comprisin...

Reflective optical element for EUV lithography

EUV lithography system and operating method

Optical assembly with suppression of degradation

Optical hollow waveguide assembly

Arrangement for use in a projection exposure tool for microlithogra...

Cleaning module, EUV lithography device and method for the cleaning...

Optical arrangement, in particular in a projection exposure apparat...

Detection of contaminating substances in an EUV lithography apparatus

EUV lithography device and method for processing an optical element

Projection objective of a microlithographic projection exposure app...

Method for examining a wafer with regard to a contamination limit a...

EUV lithography apparatus and method for determining the contaminat...

Method for examining a wafer with regard to a contamination limit a...

Method for cleaning an EUV lithography device, method for measuring...

Patents Applicationslast 30 patents

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

MULTI-MIRROR ARRAY

PROCESS FOR DEPOSITION OF AN OUTER LAYER, REFLECTIVE OPTICAL ELEMEN...

METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS

PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT...

EUV Lithography System And Operating Method

OPTICAL HOLLOW WAVEGUIDE ASSEMBLY

OPTICAL ASSEMBLY WITH SUPPRESSION OF DEGRADATION

ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRA...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARAT...

METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM

EUV Lithography Device and Method For Processing An Optical Element

METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT A...

DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS

CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE

CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING...

METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT A...

METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE

EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING THE CONTAMINAT...

METHOD FOR CLEANING AN EUV LITHOGRAPHY DEVICE, METHOD FOR MEASURING...