Stefan Schmitz

Person

Malta, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for selectively etching with reduced aspect ratio dependence
- Patent number 10,541,141
- Issue date Jan 21, 2020
- Lam Research Corporation
- Adarsh Basavalingappa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively etching with reduced aspect ratio dependence
- Patent number 10,037,890
- Issue date Jul 31, 2018
- Lam Research Corporation
- Adarsh Basavalingappa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for performing in-situ deposition of sidewall i...
- Patent number 9,972,502
- Issue date May 15, 2018
- Lam Research Corporation
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate finFET
- Patent number 9,530,651
- Issue date Dec 27, 2016
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate
- Patent number 9,515,070
- Issue date Dec 6, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate FinFET
- Patent number 9,472,407
- Issue date Oct 18, 2016
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate FinFET
- Patent number 9,437,436
- Issue date Sep 6, 2016
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform finFET gate height
- Patent number 9,245,965
- Issue date Jan 26, 2016
- GLOBALFOUNDRIES Inc.
- Balasubramanian S. Haran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate
- Patent number 9,231,080
- Issue date Jan 5, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method to modulate threshold voltage for high-K metal...
- Patent number 9,214,397
- Issue date Dec 15, 2015
- GLOBALFOUNDRIES Inc.
- Bruce B. Doris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate FinFET
- Patent number 9,153,447
- Issue date Oct 6, 2015
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate FinFET
- Patent number 9,093,376
- Issue date Jul 28, 2015
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method to modulate threshold voltage for high-K metal...
- Patent number 9,041,116
- Issue date May 26, 2015
- International Business Machines Corporation
- Bruce B. Doris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Robust isolation for thin-box ETSOI MOSFETS
- Patent number 8,927,387
- Issue date Jan 6, 2015
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform finFET gate height
- Patent number 8,829,617
- Issue date Sep 9, 2014
- International Business Machines Corporation
- Balasubramanian S. Haran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure having NFET extension last implants
- Patent number 8,673,699
- Issue date Mar 18, 2014
- International Business Machines Corporation
- Thomas N. Adam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cut-very-last dual-EPI flow
- Patent number 8,592,290
- Issue date Nov 26, 2013
- International Business Machines Corporation
- Veeraraghavan S. Basker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stack including metal hardmask layer for sidewall image transf...
- Patent number 8,586,482
- Issue date Nov 19, 2013
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stack including metal hardmask layer for sidewall image transf...
- Patent number 8,580,692
- Issue date Nov 12, 2013
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cut-very-last dual-epi flow
- Patent number 8,569,152
- Issue date Oct 29, 2013
- International Business Machines Corporation
- Veeraraghavan S. Basker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure having NFET extension last implants
- Patent number 8,546,203
- Issue date Oct 1, 2013
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor devices and methods of making
- Patent number 8,536,630
- Issue date Sep 17, 2013
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor devices and methods of making
- Patent number 8,084,329
- Issue date Dec 27, 2011
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of manufacturing a DRAM cell capacitor having increased tre...
- Patent number 6,440,813
- Issue date Aug 27, 2002
- International Business Machines Corporation
- Christopher N. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Universal cleaning wafer for a plasma chamber
- Patent number 6,328,041
- Issue date Dec 11, 2001
- International Business Machines Corporation
- Jeffrey J. Brown
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
DRAM cell capacitor having increased trench capacitance
- Patent number 6,188,096
- Issue date Feb 13, 2001
- International Business Machines Corporation
- Christopher N. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a bottle shaped trench
- Patent number 5,891,807
- Issue date Apr 6, 1999
- Siemens Aktiengesellschaft
- K. Paul Muller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cryogenic aerosol separator
- Patent number 5,699,679
- Issue date Dec 23, 1997
- International Business Machines Corporation
- Jin Jwang Wu
- B07 - SEPARATING SOLIDS FROM SOLIDS SORTING

Patents Applicationslast 30 patents

Information Patent Application
GRAPHENE-CAPPED COPPER IN DUAL DAMASCENE INTERCONNECT
- Publication number 20240213159
- Publication date Jun 27, 2024
- LAM RESEARCH CORPORATION
- Asish Parbatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE
- Publication number 20180330959
- Publication date Nov 15, 2018
- LAM RESEARCH CORPORATION
- Adarsh BASAVALINGAPPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL IMAGE TRANSFE...
- Publication number 20180247828
- Publication date Aug 30, 2018
- LAM RESEARCH CORPORATION
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE
- Publication number 20180102253
- Publication date Apr 12, 2018
- LAM RESEARCH CORPORATION
- Adarsh BASAVALINGAPPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL I...
- Publication number 20170076957
- Publication date Mar 16, 2017
- LAM RESEARCH CORPORATION
- Jae Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE
- Publication number 20160086944
- Publication date Mar 24, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE
- Publication number 20150270373
- Publication date Sep 24, 2015
- Intemational Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE FINFET
- Publication number 20150137243
- Publication date May 21, 2015
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE FINFET
- Publication number 20150137245
- Publication date May 21, 2015
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE FINFET
- Publication number 20150137244
- Publication date May 21, 2015
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM FINFET GATE HEIGHT
- Publication number 20140319611
- Publication date Oct 30, 2014
- Balasubramanian S. Haran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM FINFET GATE HEIGHT
- Publication number 20140151801
- Publication date Jun 5, 2014
- International Business Machines Corporation
- Balasubramanian S. Haran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE FINFET
- Publication number 20140110784
- Publication date Apr 24, 2014
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE FINFET
- Publication number 20140110785
- Publication date Apr 24, 2014
- International Business Machines Corporation
- Hemanth Jagannathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE HAVING NFET EXTENSION LAST IMPLANTS
- Publication number 20140024181
- Publication date Jan 23, 2014
- International Business Machines Corporation
- Thomas N. Adam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOLATION STRUCTURE FOR SEMICONDUCTOR DEVICES
- Publication number 20130334603
- Publication date Dec 19, 2013
- International Business Machines Corporation
- Kangguo CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUT-VERY-LAST DUAL-EPI FLOW
- Publication number 20130319613
- Publication date Dec 5, 2013
- International Business Machines Corporation
- Veeraraghavan S. Basker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure and Method to Modulate Threshold Voltage For High-K Metal...
- Publication number 20130313643
- Publication date Nov 28, 2013
- International Business Machines Corporation
- Bruce B. Doris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD TO MODULATE THRESHOLD VOLTAGE FOR HIGH-K METAL...
- Publication number 20130316503
- Publication date Nov 28, 2013
- International Business Machines Corporation
- Bruce B. Doris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROBUST ISOLATION FOR THIN-BOX ETSOI MOSFETS
- Publication number 20130264641
- Publication date Oct 10, 2013
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STACK INCLUDING METAL HARDMASK LAYER FOR SIDEWALL IMAGE TRANSF...
- Publication number 20130001750
- Publication date Jan 3, 2013
- International Business Machines Corporation
- JOHN C. ARNOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STACK INCLUDING METAL HARDMASK LAYER FOR SIDEWALL IMAGE TRANSF...
- Publication number 20130001749
- Publication date Jan 3, 2013
- International Business Machines Corporation
- JOHN C. ARNOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR DEVICES AND METHODS OF MAKING
- Publication number 20120061684
- Publication date Mar 15, 2012
- International Business Machines Corporation
- JOHN C. ARNOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR DEVICES AND METHODS OF MAKING
- Publication number 20100187579
- Publication date Jul 29, 2010
- International Business Machines Corporation
- JOHN C. ARNOLD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process of manufacturing a dram cell capacitor having increased tre...
- Publication number 20010023956
- Publication date Sep 27, 2001
- Christopher N. Collins
- H01 - BASIC ELECTRIC ELEMENTS

Stefan Schmitz

Person

Patents Grantslast 30 patents

Method for selectively etching with reduced aspect ratio dependence

Method for selectively etching with reduced aspect ratio dependence

Systems and methods for performing in-situ deposition of sidewall i...

Replacement metal gate finFET

Replacement metal gate

Replacement metal gate FinFET

Replacement metal gate FinFET

Uniform finFET gate height

Replacement metal gate

Structure and method to modulate threshold voltage for high-K metal...

Replacement metal gate FinFET

Replacement metal gate FinFET

Structure and method to modulate threshold voltage for high-K metal...

Robust isolation for thin-box ETSOI MOSFETS

Uniform finFET gate height

Semiconductor structure having NFET extension last implants

Cut-very-last dual-EPI flow

Film stack including metal hardmask layer for sidewall image transf...

Film stack including metal hardmask layer for sidewall image transf...

Cut-very-last dual-epi flow

Semiconductor structure having NFET extension last implants

Transistor devices and methods of making

Transistor devices and methods of making

Process of manufacturing a DRAM cell capacitor having increased tre...

Universal cleaning wafer for a plasma chamber

DRAM cell capacitor having increased trench capacitance

Formation of a bottle shaped trench

Cryogenic aerosol separator

Patents Applicationslast 30 patents

GRAPHENE-CAPPED COPPER IN DUAL DAMASCENE INTERCONNECT

METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE

SYSTEMS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL IMAGE TRANSFE...

METHOD FOR SELECTIVELY ETCHING WITH REDUCED ASPECT RATIO DEPENDENCE

SYSTEMS AND METHODS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL I...

REPLACEMENT METAL GATE

REPLACEMENT METAL GATE

REPLACEMENT METAL GATE FINFET

REPLACEMENT METAL GATE FINFET

REPLACEMENT METAL GATE FINFET

UNIFORM FINFET GATE HEIGHT

UNIFORM FINFET GATE HEIGHT

REPLACEMENT METAL GATE FINFET

REPLACEMENT METAL GATE FINFET

SEMICONDUCTOR STRUCTURE HAVING NFET EXTENSION LAST IMPLANTS

ISOLATION STRUCTURE FOR SEMICONDUCTOR DEVICES

CUT-VERY-LAST DUAL-EPI FLOW

Structure and Method to Modulate Threshold Voltage For High-K Metal...

STRUCTURE AND METHOD TO MODULATE THRESHOLD VOLTAGE FOR HIGH-K METAL...

ROBUST ISOLATION FOR THIN-BOX ETSOI MOSFETS

FILM STACK INCLUDING METAL HARDMASK LAYER FOR SIDEWALL IMAGE TRANSF...

FILM STACK INCLUDING METAL HARDMASK LAYER FOR SIDEWALL IMAGE TRANSF...

TRANSISTOR DEVICES AND METHODS OF MAKING

TRANSISTOR DEVICES AND METHODS OF MAKING

Process of manufacturing a dram cell capacitor having increased tre...