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Stefan Wurm
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Austin, TX, US
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Patents Grants
last 30 patents
Information
Patent Grant
Dense seed layer and method of formation
Patent number
8,766,447
Issue date
Jul 1, 2014
Infineon Technologies AG
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Passivation of multi-layer mirror for extreme ultraviolet lithography
Patent number
8,501,373
Issue date
Aug 6, 2013
Infineon Technologies AG
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Dense seed layer and method of formation
Patent number
8,148,821
Issue date
Apr 3, 2012
Infineon Technologies AG
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Passivation of multi-layer mirror for extreme ultraviolet lithography
Patent number
8,076,055
Issue date
Dec 13, 2011
Infineon Technologies AG
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Passivation of multi-layer mirror for extreme ultraviolet lithography
Patent number
7,859,648
Issue date
Dec 28, 2010
Infineon Technologies AG
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Systems and methods for in-situ reflectivity degradation monitoring...
Patent number
7,760,341
Issue date
Jul 20, 2010
Sematech, Inc.
Vivek Bakshi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Systems and methods for monitoring and controlling the operation of...
Patent number
7,709,816
Issue date
May 4, 2010
Sematech, Inc.
Vivek Bakshi
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Reticle stages for lithography systems and lithography methods
Patent number
7,626,682
Issue date
Dec 1, 2009
Infineon Technologies AG
Stefan Wurm
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithography mask substrate labeling system
Patent number
7,586,059
Issue date
Sep 8, 2009
Infineon Technologies AG
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dense seed layer and method of formation
Patent number
7,576,005
Issue date
Aug 18, 2009
Infineon Technologies AG
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods of forming capping layers on reflective materials
Patent number
7,547,505
Issue date
Jun 16, 2009
Infineon Technologies AG
Stefan Wurm
G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information
Patent Grant
Method for determining a radiation power and an exposure apparatus
Patent number
7,417,736
Issue date
Aug 26, 2008
Infineon Technologies AG
Siegfried Schwarzl
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
EUV magnetic contrast lithography mask and manufacture thereof
Patent number
7,407,729
Issue date
Aug 5, 2008
Infineon Technologies AG
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Device for generating and/or influencing electromagnetic radiation...
Patent number
7,323,821
Issue date
Jan 29, 2008
Qimonda AG
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Dense seed layer and method of formation
Patent number
7,294,851
Issue date
Nov 13, 2007
Infineon Technologies AG
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
EUV lithography filter
Patent number
7,250,620
Issue date
Jul 31, 2007
Infineon Technologies AG
Stefan Wurm
G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information
Patent Grant
Photolithographic mask having a structure region covered by a thin...
Patent number
7,078,134
Issue date
Jul 18, 2006
Infineon Technologies AG
Stefan Wurm
G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information
Patent Grant
Photosensitive coating material for a substrate and process for exp...
Patent number
7,029,808
Issue date
Apr 18, 2006
Infineon Technologies AG
Jenspeter Rau
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Reflection mask for EUV-lithography and method for fabricating the...
Patent number
6,849,365
Issue date
Feb 1, 2005
Infineon Technologies AG
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Patents Applications
last 30 patents
Information
Patent Application
Dense Seed Layer and Method of Formation
Publication number
20120139117
Publication date
Jun 7, 2012
INFINEON TECHNOLOGIES AG
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
Publication number
20120069311
Publication date
Mar 22, 2012
INFINEON TECHNOLOGIES AG
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Application
Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
Publication number
20100119981
Publication date
May 13, 2010
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Application
Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
Publication number
20100066991
Publication date
Mar 18, 2010
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Application
Reticle Stages for Lithography Systems and Lithography Methods
Publication number
20100035431
Publication date
Feb 11, 2010
Stefan Wurm
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Dense Seed Layer and Method of Formation
Publication number
20090224406
Publication date
Sep 10, 2009
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Systems and Methods for In-Situ Reflectivity Degradation Monitoring...
Publication number
20090059196
Publication date
Mar 5, 2009
Vivek Bakshi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Systems and Methods for Monitoring and Controlling the Operation of...
Publication number
20090046273
Publication date
Feb 19, 2009
Vivek Bakshi
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
EUV Lithography System and Chuck for Releasing Reticle in a Vacuum...
Publication number
20080204695
Publication date
Aug 28, 2008
Siegfried Schwarzl
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Systems and methods of measuring power in lithography systems
Publication number
20080073572
Publication date
Mar 27, 2008
Siegfried Schwarzl
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Fluids and methods of forming thereof
Publication number
20080063982
Publication date
Mar 13, 2008
Stefan Wurm
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for Determining a Radiation Power and an Exposure Apparatus
Publication number
20080037000
Publication date
Feb 14, 2008
Siegfried Schwarzl
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Dense Seed Layer and Method of Formation
Publication number
20080020571
Publication date
Jan 24, 2008
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Reticle stages for lithography systems and lithography methods
Publication number
20070242257
Publication date
Oct 18, 2007
Stefan Wurm
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Semiconductor memory device and operating method for a semiconducto...
Publication number
20060275928
Publication date
Dec 7, 2006
Stefan Wurm
G11 - INFORMATION STORAGE
Information
Patent Application
Methods of forming capping layers on reflective materials
Publication number
20060160034
Publication date
Jul 20, 2006
Stefan Wurm
B82 - NANO-TECHNOLOGY
Information
Patent Application
EUV lithography filter
Publication number
20060160031
Publication date
Jul 20, 2006
Stefan Wurm
G02 - OPTICS
Information
Patent Application
Photosensitive coating material for a substrate
Publication number
20060147839
Publication date
Jul 6, 2006
Infineon Technologies AG
Jenspeter Rau
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Device for generating and/or influencing electromagnetic radiation...
Publication number
20060132046
Publication date
Jun 22, 2006
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Application
Con-focal imaging system and method using destructive interference...
Publication number
20060091334
Publication date
May 4, 2006
Jan-Peter Urbach
G02 - OPTICS
Information
Patent Application
Dense seed layer and method of formation
Publication number
20060094239
Publication date
May 4, 2006
Stefan Wurm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Substrate labeling system
Publication number
20060044385
Publication date
Mar 2, 2006
Infineon Technologies North America Corp.
Stefan Wurm
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Application
EUV magnetic contrast lithography mask and manufacture thereof
Publication number
20060029866
Publication date
Feb 9, 2006
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Application
Passivation of multi-layer mirror for extreme ultraviolet lithography
Publication number
20060024589
Publication date
Feb 2, 2006
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY
Information
Patent Application
EUV lithography system and chuck for releasing reticle in a vacuum...
Publication number
20050223973
Publication date
Oct 13, 2005
Infineon Technologies AG
Siegfried Schwarzl
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photosensitive coating material for a substrate and process for exp...
Publication number
20040115563
Publication date
Jun 17, 2004
Jenspeter Rau
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photolithographic mask and methods for the fabrication of the mask
Publication number
20030232256
Publication date
Dec 18, 2003
Stefan Wurm
B82 - NANO-TECHNOLOGY
Information
Patent Application
Reflection mask for EUV-lithography and method for fabricating the...
Publication number
20030091910
Publication date
May 15, 2003
Siegfried Schwarzl
B82 - NANO-TECHNOLOGY